Patents by Inventor Wang S. Yueh

Wang S. Yueh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Basic quencher/developer solutions for photoresists
    Patent number: 7241560
    Abstract: A basic developer/quencher solution formulated to include at least one supercritical fluid or liquid solvent and a base may be used to quench a photo-generated acid within a photoresist as well as develop the photoresist. The supercritical fluid or liquid solvent may be carbon dioxide and the base may be quaternary ammonium salt that has side groups that increase the solubility of the quaternary ammonium salt in carbon dioxide.
    Type: Grant
    Filed: June 1, 2005
    Date of Patent: July 10, 2007
    Assignee: Intel Corporation
    Inventors: Shan C. Clark, Kim-Khanh Ho, James S. Clarke, Ernisse S. Putna, Wang S. Yueh, Robert P. Meagley