Abstract: A cable clamp (26) is disposed in an upper revolving structure (3) of a hydraulic excavator (1). The cable clamp (26) supports a power feeding cable (91) connected to a power feeding port (12A). The cable clamp (26) is supported on the upper revolving structure (3) via an arm member (23) attached on the upper revolving structure (3). A wire (30) is bridged over between the cable clamp (26) and the arm member (23). A tension sensor (29) detects a load applied to the wire (30). A controller (16) issues an alarm when a tension detection of the tension sensor (29) goes beyond a prescribed threshold value (T1 or T2).

Abstract: A semiconductor circuit includes: a first inductor part configured to connect in series with a source electrode of a first semiconductor element; and a second inductor part configured to connect in series with a source electrode in a second semiconductor element that is configured to connect in parallel with the first semiconductor element; the first inductor part and the second inductor part are arranged to generate an induced electromotive force in the first inductor part and the second inductor part by way of a magnetic interaction so that the currents flowing in the first inductor part and the second inductor part are reinforced in the same direction.

Abstract: An object of the present invention is to provide a catalyst composition that partially oxidizes a hydrocarbon to produce hydrogen and carbon monoxide, the catalytic activity of which is unlikely to deteriorate even when the catalyst composition is exposed to a high temperature, and the present invention provides a catalyst composition that partially oxidizes a hydrocarbon to produce hydrogen and carbon monoxide, including: a carrier that contains ?-alumina; and a supported components that are supported on the carrier, wherein the supported components includes at least one platinum group element, a Ce oxide, and a Zr oxide.

Abstract: An end effector including a processing mechanism and a target-object-positioning mechanism provided at a support member. The target-object-positioning mechanism includes a first contact-and-move member configured to move in a front-rear direction of the end effector and in a first orthogonal direction with respect to the support member, and a second contact-and-move member configured to move in the front-rear direction and in a second orthogonal direction with respect to the support member. The first and second contact-and-move members, while maintaining a position thereof in the front-rear direction with respect to the support member, move in the first orthogonal direction and the second orthogonal direction, respectively, to make contact with the target object in a contact-and-move-member-moving space.

Abstract: An imaging element according to an embodiment of the present disclosure includes: a sensor substrate having a light-receiving region in which a plurality of light-receiving elements are arranged and a peripheral region provided around the light-receiving region; a sealing member disposed to be opposed to one surface of the sensor substrate; a resin layer that attaches the sensor substrate and the sealing member to each other; and an excavated part provided in the peripheral region of the one surface of the sensor substrate, and in which the resin layer is embedded, with the resin layer having one or a plurality of gaps inside the excavated part in a plan view.

Abstract: An air-cooled engine is hung and fixed under a rear part of a backbone of a body frame. The engine is disposed so that the center axis of a cylinder in its cylinder block extends approximately horizontally and so that its cylinder head is directed toward the front. A fuel injection device is located between an intake valve and an intake port in the cylinder head. An injection nozzle of the fuel injection device and an intake valve opening are placed at a short distance. While the vehicle is idling or running at low speed, the vicinity of the tip of an injector of the fuel injection device is cooled by assist air supplied from a throttle body through a secondary passage, and when the vehicle runs normally or at high speed, the fuel injection device is cooled by the wind that hits the cylinder head.

Abstract: An air-cooled engine is hung and fixed under a rear part of a backbone of a body frame. The engine is disposed so that the center axis of a cylinder in its cylinder block extends approximately horizontally and so that its cylinder head is directed toward the front. A fuel injection device is located between an intake valve and an intake port in the cylinder head. An injection nozzle of the fuel injection device and an intake valve opening are placed at a short distance. While the vehicle is idling or running at low speed, the vicinity of the tip of an injector of the fuel injection device is cooled by assist air supplied from a throttle body through a secondary passage, and when the vehicle runs normally or at high speed, the fuel injection device is cooled by the wind that hits the cylinder head.

Abstract: A pair of electrodes are provided through a base. A cap and the base constitute a chamber, and are connected to each other by fitting projections provided on the base, into locking grooves formed in the cap. A fuse element is connected to upper portions of the electrodes, located in the chamber, by appropriate means such as soldering or welding. The base is in the form of a rectangle having long sides and short sides. A pair of semi-elliptic air pass holes are formed in substantially central portions of the base along the respective long sides, and opposed to each other.

Abstract: A pair of electrodes are provided through a base. A cap and the base constitute a chamber, and are connected to each other by fitting projections provided on the base, into locking grooves formed in the cap. A fuse element is connected to upper portions of the electrodes, located in the chamber, by appropriate means such as soldering or welding. The base is in the form of a rectangle having long sides and short sides. A pair of semi-elliptic air pass holes are formed in substantially central portions of the base along the respective long sides, and opposed to each other.

Abstract: A powered seat slide device comprises upper and lower guide rails slidably fitted to each other, and a rail drive mechanism with a reversible motor and a reduction gear box. The drive mechanism includes a screw-threaded shaft being rotatable about its axis through the motor and the gear box and installed on one of the upper and lower guide rails, and a nut member being installed on another rail and screwed into the screw-threaded shaft for a relative axial motion of said screw-threaded shaft with respect to said nut member. An elastic shock-absorbing damper assembly (including essentially annular elastomeric damper) is supported on the screw-threaded shaft in front and in rear of the nut member. The damper assembly includes at least a plastic washer interposed between the nut member and the damper.

Abstract: A positive-working photosensitive composition comprises:(1) an alkali-soluble resin;(2) a quinonediazide compound;(3) an organic phosphoric compound; and(4) at least one of a phenylenediamine compound and a derivative thereof, 2-amino-1-phenylethanol, N-phenyldiethanolamine, N-phenylethanolamine, N-ethyldiethanolamine, and N-ethylethanolamine. The resist composition exhibits so higher an adhesion to a substrate than ever as to provide an enhanced accuracy in processing during etching, enabling subsequent faithful transfer of a finer pattern to the substrate.

Abstract: A micropattern-forming, light sensitive resin composition is disclosed. The composition comprises (a) a novolak resin comprising a condensate between formaldehyde and a mixture of m-cresol and p-cresol with a m-cresol to p-cresol charging weight ratio of from 45/55 to 60/40, wherein the novolak resin has the following characteristics: (i) a dissolving rate of 20 to 800 .ANG./sec in an aqueous solution of tetramethylammonium hydroxide (TMAH) and an alkali activity of 0.131N, (ii) a weight average molecular weight of 1000 to 6000 calculated as polystyrene equivalent, and (iii) a non-exposed dissolving rate of equal to or more than 100 .ANG./sec in an aqueous solution of TMAH with an alkali activity of 0.262N; (b) a light-sensitive substance of 1,2-naphthoquinonediazide-4-sulfonyl ester, and (c) a solvent capable of dissolving the novolak resin and the light-sensitive substance; wherein the novolak resin, the light-sensitive substance, and the solvent are present in such amounts that a 1.

Abstract: The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity.

Abstract: The negative-working photosensitive composition of the invention, which is suitable as a photoresist material in the photolithographic processing of semiconductor devices, comprises (a) a condensation product of a hydroxy-substituted diphenylamine compound such as 4-hydroxy diphenylamine and a methylol melamine or alkoxylated methylol melamine by the reaction in a medium of phosphoric or sulfuric acid and (b) an azide compound capable of strongly absorbing UV or far UV light. The composition gives a photoresist layer having high resistance against heat in the post-baking and the attack of gas plasma encountered in the dry etching for semiconductor processing.

Abstract: The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity.

Abstract: A method for high-fidelity fine patterning of a photoresist layer involving a dry-process development by exposure to a plasma gas. Following irradiation in a pattern with actinic rays, a photoresist layer coated on a substrate is heated in an atmosphere at 200.degree. to 500.degree. C. Subsequent exposure of the photoresist layer to a plasma gas gives a finely patterned resist layer with a very high residual film ratio or very small decrease in the film thickness.

Abstract: A method for high fidelity patterning of a photoresist layer involving a dry-process development by exposure to a plasma gas. A photoresist layer which had been irradiated in a pattern with actinic rays is heated at a temperature in the range from 200.degree. to 500.degree. C. by applying heat to the surface of the substrate opposite to the surface bearing the photoresist layer, for example, by placing the substrate on a hot plate with the uncoated surface in contact with the hot plate. Subsequent exposure to plasma gas gives a patterned resist layer with a very high residual film thickness.