Patents by Inventor Wataru NISHINO
Wataru NISHINO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11993671Abstract: A chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, in which the chloroprene-unsaturated nitrile copolymer has a peak at 5.80 to 6.00 ppm in a 1H-NMR spectrum as measured in a deuterochloroform solvent, and a ratio (A/B) of a peak area (A) at 5.80 to 6.00 ppm and a peak area (B) at 4.05 to 6.20 ppm is 0.6/100 to 1.1/100.Type: GrantFiled: November 6, 2019Date of Patent: May 28, 2024Assignee: Denka Company LimitedInventors: Wataru Nishino, Suguru Onuki, Atsunori Kondo, Yuhei Ishigaki, Naoki Kobayashi
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Publication number: 20240158555Abstract: A chloroprene polymer having a structural unit derived from chloroprene and a structural unit derived from an unsaturated nitrile, in which the chloroprene polymer has peak tops at 5.80 to 6.00 ppm and 5.10 to 5.30 ppm in a 1H-NMR spectrum as measured in a deuterochloroform solvent, in the 1H-NMR spectrum, a peak area ratio A/B of a peak area A at 5.80 to 6.00 ppm and a peak area B at 4.05 to 6.20 ppm is 0.9/100 to 1.1/100, and the peak area A, the peak area B, and a peak area C at 5.10 to 5.30 ppm satisfy formula “(C?2A)/B?2.0/100”, and a content of the structural unit derived from an unsaturated nitrile is more than 0% by mass and 23% by mass or less.Type: ApplicationFiled: March 7, 2022Publication date: May 16, 2024Applicant: Denka Company LimitedInventors: Wataru NISHINO, Suguru ONUKI, Ryotaro ANDO
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Publication number: 20240158633Abstract: Provided is a polyamide resin composition that has high electrical resistance in a high temperature range (around 130° C.) and high heat resistance. The polyamide resin composition includes: a polyamide resin that includes a component unit (a) derived from an aromatic dicarboxylic acid or an alicyclic dicarboxylic acid and a component unit (b2) derived from a diamine represented by formula (1); and at least one flame retardant (X) selected from the group consisting of polybrominated styrenes, brominated polystyrenes, and brominated polyphenylenes, or a flame retardant (Y) containing a specific phosphinate compound, a specific bisphosphinate compound, or a polymer of these compounds. In formula (1), n and the two instances of m are each independently 0 or 1, and —X— is a single bond or a divalent group selected from the group consisting of —O—, —S—, —SO2—, —CO—, and —CH2—.Type: ApplicationFiled: March 18, 2022Publication date: May 16, 2024Applicant: MITSUI CHEMICALS, INC.Inventors: Wataru MAKIGUCHI, Haruka DOI, Kohei NISHINO, Isao WASHIO
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Publication number: 20240141165Abstract: Provided is a polyamide resin composition that has a high electrical resistance in a high temperature region (around 130° C.) while having a high heat resistance. This polyamide resin composition comprises polyamide resin that contains a component unit (a) deriving from an aromatic dicarboxylic acid or alicyclic dicarboxylic acid and a component unit (b2) deriving from 1,3-bis(aminomethyl)cyclohexane. The polyamide resin composition further comprises at least one flame retardant (X) selected from the group consisting of polybrominated styrenes, brominated polystyrenes, and brominated polyphenylenes, or a flame retardant (Y) comprising a prescribed phosphinate salt compound or bisphosphinate salt compound or a polymer thereof.Type: ApplicationFiled: March 16, 2022Publication date: May 2, 2024Applicant: MITSUI CHEMICALS, INC.Inventors: Haruka DOI, Wataru MAKIGUCHI, Kohei NISHINO, Isao WASHIO
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Publication number: 20240132649Abstract: A (meth)acrylate-based block copolymer including a polymer block and a (meth)acrylate-based polymer block, wherein: the (meth)acrylate-based block copolymer contains 5 to 30% by mass of the polymeric block and 70 to 95% by mass of the (meth)acrylate-based polymer block with respect to 100% by mass of the (meth)acrylate-based block copolymer; the polymer block has a monomer unit derived from a monomer; when the monomer is polymerized alone, a polymer with a glass transition temperature of 80° C. or higher can be obtained; and a tensile strength at break measured in accordance with JIS K 6251 of a film obtained by immersion-molding a (meth)acrylate-based block copolymer latex containing the (meth)acrylate-based block copolymer and heat-treating at 130° C. for 30 minutes is 14 MPa or more.Type: ApplicationFiled: March 16, 2022Publication date: April 25, 2024Applicant: DENKA COMPANY LIMITEDInventors: Wataru NISHINO, Yushi KUMAGAI, Ibuki SHIMOTOMAI, Yutaka SAITO
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Publication number: 20240132695Abstract: Provided is a polyamide resin composition that, at high temperatures, suppresses reductions in tensile strength due to the addition of a copper-based heat-resistance stabilizer, and maintains a tensile strength over longer periods of time in a hot environment. The composition includes a polyamide resin and a copper-based heat-resistance stabilizer. The polyamide resin includes: a component unit (a) derived from dicarboxylic acid which is derived from an aromatic dicarboxylic acid or an alicyclic dicarboxylic acid; and greater than or equal to 10 mol % and less than 50 mol % of a component unit (b2), which is derived from 1,3-bis(aminomethyl)cyclohexane, with respect to the total number of moles of a component unit (b) derived from diamine. The content of copper included in the copper-based heat-resistance stabilizer is 0.001 parts by mass to 0.050 parts by mass, inclusive, with respect to 100 total parts by mass of the polyamide resin.Type: ApplicationFiled: March 15, 2022Publication date: April 25, 2024Applicant: Mitsui Chemicals, Inc.Inventors: Haruka DOI, Wataru MAKIGUCHI, Kohei NISHINO, Isao WASHIO
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Patent number: 11965078Abstract: A chloroprene-unsaturated nitrile copolymer composition containing 100 parts by mass of a chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, and 0.05 to 2.0 parts by mass of a xanthogen compound.Type: GrantFiled: November 6, 2019Date of Patent: April 23, 2024Assignee: Denka Company LimitedInventors: Suguru Onuki, Wataru Nishino, Atsunori Kondo, Yuhei Ishigaki, Naoki Kobayashi
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Publication number: 20240117161Abstract: A chloroprene-based polymer latex including a chloroprene-based polymer, wherein: an amount of substance of alkali metal cation per unit mass in the chloroprene-based polymer latex is 0.05 to 0.12 mmol/g, when the chloroprene-based polymer latex is freeze-dried to obtain a solid content containing the chloroprene-based polymer, and an ethanol-toluene azeotropic mixture soluble content specified in JIS K 6229 is extracted by refluxing from the solid content to obtain an extract, and the obtained extract is acid treated with hydrochloric acid, an amount of rosin acid of in the solid content measured by gas chromatography is 1.4 to 4.2% by mass with respect to 100% by mass of the chloroprene-based polymer in the solid content, is provided.Type: ApplicationFiled: March 24, 2022Publication date: April 11, 2024Applicant: DENKA COMPANY LIMITEDInventors: Seiya TOMIZAWA, Wataru NISHINO, Misaki TADA
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Publication number: 20240117083Abstract: A chloroprene-based polymer, wherein: a 1H-NMR spectrum of the chloroprene-based polymer measured in a deuterochloroform solvent has a peak at 5.80 to 6.00 ppm; when an area of the peak at 5.80 to 6.00 ppm is A and an area of a peak at 4.05 to 6.00 ppm is B, A/B is 1.20/100 or less; the 1H-NMR spectrum of the chloroprene-based polymer measured in a deuterochloroform solvent has a peak at 5.40 to 5.60 ppm; when an area of the peak at 5.40 to 5.60 ppm is D and the area of the peak at 4.05 to 6.00 ppm is B, D/B is 97.20/100 or less, is provided.Type: ApplicationFiled: March 24, 2022Publication date: April 11, 2024Applicant: DENKA COMPANY LIMITEDInventors: Seiya TOMIZAWA, Wataru NISHINO, Misaki TADA
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Publication number: 20230074040Abstract: A chloroprene-based block copolymer, a latex, a latex composition, and a rubber composition that can produce a product with excellent tensile properties and flexibility without the use of a vulcanizing agent or a vulcanizing accelerator having a chloroprene-based block copolymer, contains 5 to 30% by mass of a polymer block (A) and 70 to 95% by mass of a chloroprene-based polymer block (B), wherein the polymer block (A) is derived from a monomer, when the monomer is polymerized alone, a polymer with a glass transition temperature of 80° C. or higher can be obtained and the chloroprene-based polymer block (B) includes a chloroprene monomer unit and a polyfunctional monomer unit.Type: ApplicationFiled: March 22, 2021Publication date: March 9, 2023Applicant: DENKA COMPANY LIMITEDInventors: Hideharu MORI, Wataru NISHINO, Yushi KUMAGAI, Yutaka SAITO, Naoki KOBAYASHI
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Publication number: 20230055361Abstract: A chloroprene-based block copolymer, a latex, a latex composition, and a rubber composition that can produce a product with excellent flexibility and tensile properties without the use of a vulcanizing agent or a vulcanizing accelerator. A chloroprene-based block copolymer, includes 5 to 30% by mass of a polymer block (A) and 70 to 95% by mass of a chloroprene-based polymer block (B), wherein: the polymer block (A) is derived from a monomer; when the monomer is polymerized alone, a polymer with a glass transition temperature of 80° C. or higher can be obtained; the chloroprene-based polymer block (B) includes a chloroprene monomer; and the chloroprene-based block copolymer has a toluene insoluble content of 20 to 100% by mass with respect to 100% by mass of the chloroprene-based block copolymer.Type: ApplicationFiled: March 22, 2021Publication date: February 23, 2023Applicant: DENKA COMPANY LIMITEDInventors: Yushi KUMAGAI, Wataru NISHINO, Yutaka SAITO, Naoki KOBAYASHI
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Publication number: 20230050436Abstract: A chloroprene-based block copolymer latex, including a chloroprene-based block copolymer, wherein: the chloroprene-based block copolymer contains 5 to 30% by mass of a polymer block (A) and 70 to 95% by mass of a chloroprene-based polymer block (B); the polymer block (A) is derived from a monomer; when the monomer is polymerized alone, a polymer with a glass transition temperature of 80° C. or higher can be obtained; the chloroprene-based polymer block (B) includes a chloroprene monomer unit; and when the chloroprene-based block copolymer latex is molded by immersion molding to obtain a film and then the film is heat-treated at 130° C. for 30 minutes, a tensile strength at break measured in accordance with JIS K6251 of the film is 17 MPa or more is provided.Type: ApplicationFiled: March 22, 2021Publication date: February 16, 2023Applicant: DENKA COMPANY LIMITEDInventors: Yushi KUMAGAI, Wataru NISHINO, Yutaka SAITO, Naoki KOBAYASHI
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Patent number: 11566087Abstract: To provide a statistical copolymer containing a chloroprene monomer unit and an unsaturated nitrile monomer unit which has a satisfactory oil resistance. A method for producing a statistical copolymer containing a chloroprene monomer unit and an unsaturated nitrile monomer unit includes a step for conducting continuous addition or 10 cycles or more of intermittent portionwise addition of the chloroprene monomer after initiation of a polymerization reaction is provided. A rubber composition using a statistical copolymer according to the invention or a vulcanized molded article containing the rubber composition is excellent in terms of oil resistance, mechanical strength, compression set at a low temperature and flex fatigue resistance.Type: GrantFiled: May 11, 2018Date of Patent: January 31, 2023Assignee: DENKA COMPANY LIMITEDInventors: Wataru Nishino, Suguru Onuki, Kosuke Fujimoto, Yuhei Ishigaki, Shogo Hagiwara, Uichiro Yamagishi
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Publication number: 20230025987Abstract: An immersion-molded body, wherein: the immersion-molded body is obtained using a latex; the latex comprises a chloroprene-based block copolymer; the chloroprene-based block copolymer contains 5 to 30% by mass of a polymer block (A) and 70 to 95% by mass of a chloroprene-based polymer block (B); the polymer block (A) is derived from a monomer; when the monomer is polymerized alone, a polymer with a glass transition temperature of 80° C. or higher can be obtained; the chloroprene-based polymer block (B) includes a chloroprene monomer unit; and when the immersion-molded body is heat-treated at 130° C. for 30 minutes, a tensile strength at break of the heat-treated immersion-molded body measured in accordance with JIS K6251 is 17 MPa or more.Type: ApplicationFiled: March 22, 2021Publication date: January 26, 2023Applicant: DENKA COMPANY LIMITEDInventors: Yushi KUMAGAI, Wataru NISHINO, Yutaka SAITO, Naoki KOBAYASHI
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Publication number: 20220325071Abstract: A rubber composition containing: 100 parts by mass of a chloroprene-based rubber; 0.50 to 4.0 parts by mass of a maleimide compound; and 0.10 to 2.0 parts by mass of an organic peroxide, a vulcanizate of this rubber composition, and a vulcanized molded article of this rubber composition.Type: ApplicationFiled: August 12, 2020Publication date: October 13, 2022Inventors: Atsunori KONDO, Wataru NISHINO, Suguru ONUKI
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Patent number: 11365276Abstract: To provide a block copolymer that includes an aromatic vinyl compound polymer and a chloroprene polymer, has a number average molecular weight of 100,000 or more, is preferred for a rubber composition and an adhesive composition, and is suitable for industrial production. A block copolymer includes at least one aromatic vinyl compound polymer block and at least one chloroprene polymer block, has a functional group with a structure represented by Chemical Formula (1) or (2), and has a number average molecular weight of 100,000 or more. The chloroprene polymer block has a number average molecular weight of 80,000 or more in total. (In Chemical Formula (1), R1 is hydrogen, chlorine, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclyl group.Type: GrantFiled: March 29, 2018Date of Patent: June 21, 2022Assignee: DENKA COMPANY LIMITEDInventors: Wataru Nishino, Yuhei Ishigaki, Takashi Aizawa, Shogo Hagiwara, Uichiro Yamagishi
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Patent number: 11254807Abstract: Provided is a chloroprene-based polymer having an industrially applicable sufficient molecular weight and capable of obtaining a vulcanized rubber excellent in durability and fatigue endurance and an adhesive excellent in layer separation resistance. A chloroprene-based polymer having a number average molecular weight Mn of 150000 to 300000 and comprising a functional group of a structure represented by the general formula (1) or (2) below: (wherein in the general formula (1), R1 shows hydrogen, chlorine, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted heterocyclyl group.Type: GrantFiled: July 20, 2018Date of Patent: February 22, 2022Assignee: Denka Company LimitedInventors: Yuhei Ishigaki, Shogo Hagiwara, Uichiro Yamagishi, Suguru Onuki, Kosuke Fujimoto, Wataru Nishino
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Publication number: 20220010097Abstract: A chloroprene-unsaturated nitrile copolymer composition containing 100 parts by mass of a chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, and 0.05 to 2.0 parts by mass of a xanthogen compound.Type: ApplicationFiled: November 6, 2019Publication date: January 13, 2022Applicant: DENKA COMPANY LIMITEDInventors: Suguru ONUKI, Wataru NISHINO, Atsunori KONDO, Yuhei ISHIGAKI, Naoki KOBAYASHI
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Publication number: 20210395422Abstract: A chloroprene-unsaturated nitrile copolymer having 3 to 20% by mass of a structural unit derived from an unsaturated nitrile monomer, in which the chloroprene-unsaturated nitrile copolymer has a peak at 5.80 to 6.00 ppm in a 1H-NMR spectrum as measured in a deuterochloroform solvent, and a ratio (A/B) of a peak area (A) at 5.80 to 6.00 ppm and a peak area (B) at 4.05 to 6.20 ppm is 0.6/100 to 1.1/100.Type: ApplicationFiled: November 6, 2019Publication date: December 23, 2021Applicant: DENKA COMPANY LIMITEDInventors: Wataru NISHINO, Suguru ONUKI, Atsunori KONDO, Yuhei ISHIGAKI, Naoki KOBAYASHI
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Publication number: 20200199260Abstract: To provide a statistical copolymer containing a chloroprene monomer unit and an unsaturated nitrile monomer unit which has a satisfactory oil resistance. A method for producing a statistical copolymer containing a chloroprene monomer unit and an unsaturated nitrile monomer unit includes a step for conducting continuous addition or 10 cycles or more of intermittent portionwise addition of the chloroprene monomer after initiation of a polymerization reaction is provided. A rubber composition using a statistical copolymer according to the invention or a vulcanized molded article containing the rubber composition is excellent in terms of oil resistance, mechanical strength, compression set at a low temperature and flex fatigue resistance.Type: ApplicationFiled: May 11, 2018Publication date: June 25, 2020Inventors: Wataru NISHINO, Suguru ONUKI, Kosuke FUJIMOTO, Yuhei ISHIGAKI, Shogo HAGIWARA, Uichiro YAMAGISHI