Patents by Inventor Wataru Nomura

Wataru Nomura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210187672
    Abstract: A brazing material for brazing aluminum or an aluminum alloy includes fluoride-based flux, a solidifying agent, and an organic viscosity reducing agent and is solid at 25° C.
    Type: Application
    Filed: August 20, 2019
    Publication date: June 24, 2021
    Applicant: Harima Chemicals, Incorporated
    Inventors: Wataru NOMURA, Daigo KIGA, Aoi TAZURU, Satoshi MORIYA
  • Patent number: 9066983
    Abstract: An object of the present invention is to provide an HIV antibody-inducing peptide antigen that is effective in developing an antibody or a vaccine having specificity and binding activity for the three-dimensional structure of a neutralization target, i.e. the mechanism by which HIV invades a target cell; a method for synthesizing the same; a vaccine comprising the peptide antigen, or an HIV three-dimensional structure-recognizing antibody induced by the peptide antigen; and a preventive and/or therapeutic agent for HIV infection comprising the peptide antigen, the vaccine, or the HIV three-dimensional structure-recognizing antibody as an active ingredient.
    Type: Grant
    Filed: May 14, 2010
    Date of Patent: June 30, 2015
    Assignee: NATIONAL UNIVERSITY CORPORATION TOKYO MEDICAL AND DENTAL UNIVERSITY
    Inventors: Hirokazu Tamamura, Toru Nakahara, Wataru Nomura
  • Patent number: 9061964
    Abstract: The present invention discloses the method for producing a tertiary amine, using the column reactor packed with catalyst layers, containing supplying a liquid and a gaseous raw materials from the bottom of the column, reacting these raw materials in the column, and discharging the product from the top of the column, wherein the column reactor includes two or more honeycomb catalyst layers as the catalyst layers, one or more spaces between each honeycomb catalyst layer, and one or more rectifying sections that prevents a partial or whole back flow of the raw materials, arranged in each space without contacting with the honeycomb catalyst layer.
    Type: Grant
    Filed: July 10, 2014
    Date of Patent: June 23, 2015
    Assignee: KAO CORPORATION
    Inventors: Yasumitsu Sakuma, Wataru Nomura, Goshi Yamamoto, Takeshi Narushima
  • Patent number: 8877978
    Abstract: The present invention discloses the method for producing a tertiary amine, using the column reactor packed with catalyst layers, containing supplying a liquid and a gaseous raw materials from the bottom of the column, reacting these raw materials in the column, and discharging the product from the top of the column, wherein the column reactor includes two or more honeycomb catalyst layers as the catalyst layers, one or more spaces between each honeycomb catalyst layer, and one or more rectifying sections that prevents a partial or whole back flow of the raw materials, arranged in each space without contacting with the honeycomb catalyst layer.
    Type: Grant
    Filed: December 19, 2011
    Date of Patent: November 4, 2014
    Assignee: Kao Corporation
    Inventors: Yasumitsu Sakuma, Wataru Nomura, Goshi Yamamoto, Takeshi Narushima
  • Publication number: 20140323764
    Abstract: The present invention discloses the method for producing a tertiary amine, using the column reactor packed with catalyst layers, containing supplying a liquid and a gaseous raw materials from the bottom of the column, reacting these raw materials in the column, and discharging the product from the top of the column, wherein the column reactor includes two or more honeycomb catalyst layers as the catalyst layers, one or more spaces between each honeycomb catalyst layer, and one or more rectifying sections that prevents a partial or whole back flow of the raw materials, arranged in each space without contacting with the honeycomb catalyst layer.
    Type: Application
    Filed: July 10, 2014
    Publication date: October 30, 2014
    Inventors: Yasumitsu SAKUMA, Wataru NOMURA, Goshi YAMAMOTO, Takeshi NARUSHIMA
  • Publication number: 20140056935
    Abstract: An object of the present invention is to provide a peptide capable of inducing a superior or new neutralizing antibody against HIV, so that HIV infectious disease can be prevented and treated or a greater variety of preventive or therapeutic options can be offered. This object is achieved by using a peptide inducing an HIV's three-dimensional structure-recognizing antibody that recognizes a trimer region of C34, wherein three molecules of a derivative of a helical region C34 peptide at C-terminal region of transmembrane protein gp41 of an HIV particle are ligated via a C3-symmetric template compound having three equivalent linker structures.
    Type: Application
    Filed: April 3, 2012
    Publication date: February 27, 2014
    Applicant: NATIONAL UNIVERSITY CORPORATION TOKYO MEDICAL AND DENTAL UNIVERSITY
    Inventors: Hirokazu Tamamura, Tetsuo Narumi, Wataru Nomura, Chie Hashimoto, Jun A. Komano, Kosuke Miyauchi
  • Publication number: 20130289310
    Abstract: The present invention discloses the method for producing a tertiary amine, using the column reactor packed with catalyst layers, containing supplying a liquid and a gaseous raw materials from the bottom of the column, reacting these raw materials in the column, and discharging the product from the top of the column, wherein the column reactor includes two or more honeycomb catalyst layers as the catalyst layers, one or more spaces between each honeycomb catalyst layer, and one or more rectifying sections that prevents a partial or whole back flow of the raw materials, arranged in each space without contacting with the honeycomb catalyst layer.
    Type: Application
    Filed: December 19, 2011
    Publication date: October 31, 2013
    Applicant: KAO CORPORATION
    Inventors: Yasumitsu Sakuma, Wataru Nomura, Goshi Yamamoto, Takeshi Narushima
  • Patent number: 8501974
    Abstract: Disclosed is a process for producing alkyl fatty esters from fats/oils and C1 to C5 lower alcohols by a multistage reaction process, which includes feeding fats and oils to a reactor at an upper stage and then sent to a stage at the downstream side while feeding lower alcohols to a reactor at a lower stage, and simultaneously returning lower alcohols recovered from an outlet of the reactor to a stage at the upstream side, thereby repeating the reaction.
    Type: Grant
    Filed: December 26, 2006
    Date of Patent: August 6, 2013
    Assignee: Kao Corporation
    Inventors: Wataru Nomura, Nobuhiro Tatsumi, Takanobu Katayama
  • Patent number: 8481787
    Abstract: The present invention provides a method for producing a tertiary amine by using a secondary amine and an alcohol as starting materials to obtain a corresponding tertiary amine. The method of the present invention includes reacting a secondary amine with an alcohol in the presence of a catalyst, wherein the catalyst is previously used in the reaction of a primary amine with an alcohol to obtain a tertiary amine.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: July 9, 2013
    Assignee: Kao Corporation
    Inventors: Toru Nishimura, Wataru Nomura, Yushin Takahashi
  • Patent number: 8338647
    Abstract: The present invention provides a method for producing a tertiary amine by reacting an alcohol with a primary or secondary amine in the presence of a film catalyst containing a thermosetting resin and an active metal, wherein the film catalyst is reduced at 100 to 150° C., and a method for activating the film catalyst containing a thermosetting resin and an active metal, including applying a coating agent containing the thermosetting resin and a powder catalyst onto the surface of a support, drying the resultant, curing it at 80 to 170° C., and reducing the catalyst at 100 to 150° C.
    Type: Grant
    Filed: September 18, 2008
    Date of Patent: December 25, 2012
    Assignee: Kao Corporation
    Inventors: Wataru Nomura, Shoji Hasegawa
  • Publication number: 20120277470
    Abstract: The present invention provides a method for producing a tertiary amine by using a secondary amine and an alcohol as starting materials to obtain a corresponding tertiary amine. The method of the present invention includes reacting a secondary amine with an alcohol in the presence of a catalyst, wherein the catalyst is previously used in the reaction of a primary amine with an alcohol to obtain a tertiary amine.
    Type: Application
    Filed: December 20, 2010
    Publication date: November 1, 2012
    Applicant: KAO CORPORATION
    Inventors: Toru Nishimura, Wataru Nomura, Yushin Takahashi
  • Publication number: 20120052090
    Abstract: An object of the present invention is to provide an HIV antibody-inducing peptide antigen that can be used without problems for HIV, which is highly prone to mutation, and is effective in developing an antibody or a vaccine having excellent specificity and binding activity even for the three-dimensional structure of a neutralization target, i.e. the mechanism by which HIV invades a target cell; a method for synthesizing the same; a vaccine comprising the peptide antigen, or an HIV three-dimensional structure-recognizing antibody induced by the peptide antigen; and a preventive and/or therapeutic agent for HIV infection comprising the peptide antigen, the vaccine, or the HIV three-dimensional structure-recognizing antibody as an active ingredient.
    Type: Application
    Filed: May 14, 2010
    Publication date: March 1, 2012
    Applicant: National University Corporation Tokyo Medical and Dental University
    Inventors: Hirokazu Tamamura, Toru Nakahara, Wataru Nomura
  • Publication number: 20100217044
    Abstract: The present invention provides a method for producing a tertiary amine by reacting an alcohol with a primary or secondary amine in the presence of a film catalyst containing a thermosetting resin and an active metal, wherein the film catalyst is reduced at 100 to 150° C., and a method for activating the film catalyst containing a thermosetting resin and an active metal, including applying a coating agent containing the thermosetting resin and a powder catalyst onto the surface of a support, drying the resultant, curing it at 80 to 170° C., and reducing the catalyst at 100 to 150° C.
    Type: Application
    Filed: September 18, 2008
    Publication date: August 26, 2010
    Applicant: Kao Corporation
    Inventors: Wataru Nomura, Shoji Hasegawa
  • Publication number: 20090105492
    Abstract: Disclosed is a process for producing alkyl fatty esters from fats/oils and C1 to C5 lower alcohols by a multistage reaction process, which includes feeding fats and oils to a reactor at an upper stage and then sent to a stage at the downstream side while feeding lower alcohols to a reactor at a lower stage, and simultaneously returning lower alcohols recovered from an outlet of the reactor to a stage at the upstream side, thereby repeating the reaction.
    Type: Application
    Filed: December 26, 2006
    Publication date: April 23, 2009
    Applicant: Kao Corporation
    Inventors: Wataru Nomura, Nobuhiro Tatsumi, Takanobu Katayama
  • Patent number: 5786267
    Abstract: Disclosed is an alignment mark for the X directional alignment of a chip area on a semiconductor wafer, for example. The alignment mark comprises recesses and projections formed on a semiconductor substrate. The recesses or projections are repeatedly arranged in the X direction. The X directional width of the recesses or projections is set smaller than the X directional width of a grain on a metal film formed on the recesses and projections or the average particle size, as viewed from above the semiconductor substrate. The projections may be formed by an insulating layer formed on the semiconductor substrate.
    Type: Grant
    Filed: June 1, 1995
    Date of Patent: July 28, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hiroshi Haraguchi, Masahiro Abe, Wataru Nomura
  • Patent number: 5532520
    Abstract: Disclosed is an alignment mark for the X directional alignment of a chip area on a semiconductor wafer, for example. The alignment mark comprises recesses and projections formed on a semiconductor substrate. The recesses or projections are repeatedly arranged in the X direction. The X directional width of the recesses or projections is set smaller than the X directional width of a grain on a metal film formed on the recesses and projections or the average particle size, as viewed from above the semiconductor substrate. The projections may be formed by a insulating layer formed on the semiconductor substrate.
    Type: Grant
    Filed: June 21, 1994
    Date of Patent: July 2, 1996
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hiroshi Haraguchi, Masahiro Abe, Wataru Nomura
  • Patent number: 5489337
    Abstract: An organic material applying apparatus of the present invention includes a movable organic material discharge nozzle having an organic material discharge port for discharging an organic material at a position facing a semiconductor wafer. The opening width of the discharge port is adjustable. A movement time of the nozzle measured from a predetermined position of the semiconductor wafer at a predetermined velocity of relative movements of the nozzle and semiconductor wafer is detected by a movement time detecting device. A width of that portion of the semiconductor wafer, which the discharge port of the moved nozzle faces, is calculated by a wafer width calculating device on the basis of the movement time of the nozzle detected by the movement time detecting device. The opening width of the discharge port of the nozzle is adjusted by a nozzle discharge port opening width adjusting device in accordance with the wafer width calculated by the wafer width calculating device.
    Type: Grant
    Filed: January 25, 1994
    Date of Patent: February 6, 1996
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Wataru Nomura, Hiroshi Haraguchi, Masahiro Abe