Patents by Inventor Wataru Ozawa

Wataru Ozawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11775413
    Abstract: An information processing system that extracts a specified piece of log data or a specified field that constitutes the specified piece of log data, from a log file in which pieces of log data having different recording formats are mixed, the information processing system includes a format-information recording portion configured to store format information in which a determination condition to identify a recording format of the specified piece of log data is contained, an extraction-condition recording portion configured to store an extraction condition to extract the specified piece of log data or the specified field, and an extraction processing portion configured to extract the specified piece of log data or the specified field, from the log file by using the format information stored in the format-information recording portion and the extraction condition.
    Type: Grant
    Filed: November 9, 2022
    Date of Patent: October 3, 2023
    Assignee: Canon Kabushiki Kaisha
    Inventor: Wataru Ozawa
  • Publication number: 20230073718
    Abstract: An information processing system that extracts a specified piece of log data or a specified field that constitutes the specified piece of log data, from a log file in which pieces of log data having different recording formats are mixed, the information processing system includes a format-information recording portion configured to store format information in which a determination condition to identify a recording format of the specified piece of log data is contained, an extraction-condition recording portion configured to store an extraction condition to extract the specified piece of log data or the specified field, and an extraction processing portion configured to extract the specified piece of log data or the specified field, from the log file by using the format information stored in the format-information recording portion and the extraction condition.
    Type: Application
    Filed: November 9, 2022
    Publication date: March 9, 2023
    Inventor: Wataru Ozawa
  • Patent number: 11526419
    Abstract: An information processing system that extracts a specified piece of log data or a specified field that constitutes the specified piece of log data, from a log file in which pieces of log data having different recording formats are mixed, the information processing system includes a format-information recording portion configured to store format information in which a determination condition to identify a recording format of the specified piece of log data is contained, an extraction-condition recording portion configured to store an extraction condition to extract the specified piece of log data or the specified field, and an extraction processing portion configured to extract the specified piece of log data or the specified field, from the log file by using the format information stored in the format-information recording portion and the extraction condition.
    Type: Grant
    Filed: December 16, 2020
    Date of Patent: December 13, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventor: Wataru Ozawa
  • Publication number: 20210191839
    Abstract: An information processing system that extracts a specified piece of log data or a specified field that constitutes the specified piece of log data, from a log file in which pieces of log data having different recording formats are mixed, the information processing system includes a format-information recording portion configured to store format information in which a determination condition to identify a recording format of the specified piece of log data is contained, an extraction-condition recording portion configured to store an extraction condition to extract the specified piece of log data or the specified field, and an extraction processing portion configured to extract the specified piece of log data or the specified field, from the log file by using the format information stored in the format-information recording portion and the extraction condition.
    Type: Application
    Filed: December 16, 2020
    Publication date: June 24, 2021
    Inventor: Wataru Ozawa
  • Patent number: 10861675
    Abstract: A controller disclosed herein drives, in a first step, a high frequency generating source at a first energy condition, and drives, in a second step, a high frequency generating source at a second energy condition. Prior to a switching time of the first step and the second step, the controller switches gas species supplied from the gas supply system into the processing container, and sets a gas flow rate in an initial period just after the switching to be larger than a gas flow rate in a stabilization period after lapse of the initial period.
    Type: Grant
    Filed: January 4, 2019
    Date of Patent: December 8, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takao Funakubo, Hirofumi Haga, Shinichi Kozuka, Wataru Ozawa, Akihiro Sakamoto, Naoki Taniguchi, Hiroshi Tsujimoto, Kumiko Ono
  • Publication number: 20190139744
    Abstract: A controller disclosed herein drives, in a first step, a high frequency generating source at a first energy condition, and drives, in a second step, a high frequency generating source at a second energy condition. Prior to a switching time of the first step and the second step, the controller switches gas species supplied from the gas supply system into the processing container, and sets a gas flow rate in an initial period just after the switching to be larger than a gas flow rate in a stabilization period after lapse of the initial period.
    Type: Application
    Filed: January 4, 2019
    Publication date: May 9, 2019
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takao FUNAKUBO, Hirofumi HAGA, Shinichi KOZUKA, Wataru OZAWA, Akihiro SAKAMOTO, Naoki TANIGUCHI, Hiroshi TSUJIMOTO, Kumiko ONO
  • Patent number: 10254774
    Abstract: A temperature control method is provided for controlling a plasma processing apparatus that is capable of changing a temperature setting for each step of a plasma process including multiple steps. The method includes a transfer step of performing an entry process for transferring a workpiece into a processing chamber of the plasma processing apparatus and/or an exit process for transferring the workpiece out of the processing chamber, a process execution step of executing the plasma process including multiple steps, and a temperature control step of performing a first temperature control and/or a second temperature control. The first temperature control includes controlling a temperature to a temperature setting of a next process according to a time execution of the plasma process is completed, and the second temperature control includes controlling the temperature to the temperature setting of the next process in parallel with the entry process and/or the exit process.
    Type: Grant
    Filed: October 30, 2012
    Date of Patent: April 9, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Tatsuya Miura, Wataru Ozawa, Kimihiro Fukasawa, Kazunori Kazama
  • Patent number: 10204763
    Abstract: A controller disclosed herein drives, in a first step, a high frequency generating source at a first energy condition, and drives, in a second step, a high frequency generating source at a second energy condition. Prior to a switching time of the first step and the second step, the controller switches gas species supplied from the gas supply system into the processing container, and sets a gas flow rate in an initial period just after the switching to be larger than a gas flow rate in a stabilization period after lapse of the initial period.
    Type: Grant
    Filed: June 26, 2015
    Date of Patent: February 12, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takao Funakubo, Hirofumi Haga, Shinichi Kozuka, Wataru Ozawa, Akihiro Sakamoto, Naoki Taniguchi, Hiroshi Tsujimoto, Kumiko Ono
  • Patent number: 9299540
    Abstract: Provided is a parallel flat-panel type plasma processing apparatus which includes a recipe storing unit storing a processing recipe for performing a plasma processing, a compensation setting unit setting an accumulation time of the plasma processing or the number of processed substrates after starting using a new second electrode and the compensation value of the set temperature of the second electrode in an input screen, and a storage unit storing the compensated set value. The plasma processing apparatus is further equipped with a program for controlling a temperature adjusting mechanism based on a set temperature after compensation by adding a set temperature of an upper electrode written in the processing recipe to the compensation value stored within the storage unit. As a result, the non-uniformity in the plasma processing between the substrates caused by the change of processing atmosphere is suppressed.
    Type: Grant
    Filed: September 16, 2014
    Date of Patent: March 29, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tatsuya Ogi, Wataru Ozawa, Kimihiro Fukasawa, Kazuhiro Kanaya
  • Publication number: 20150380282
    Abstract: A controller disclosed herein drives, in a first step, a high frequency generating source at a first energy condition, and drives, in a second step, a high frequency generating source at a second energy condition. Prior to a switching time of the first step and the second step, the controller switches gas species supplied from the gas supply system into the processing container, and sets a gas flow rate in an initial period just after the switching to be larger than a gas flow rate in a stabilization period after lapse of the initial period.
    Type: Application
    Filed: June 26, 2015
    Publication date: December 31, 2015
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takao FUNAKUBO, Hirofumi HAGA, Shinichi KOZUKA, Wataru OZAWA, Akihiro SAKAMOTO, Naoki TANIGUCHI, Hiroshi TSUJIMOTO, Kumiko ONO
  • Publication number: 20150001181
    Abstract: Provided is a parallel flat-panel type plasma processing apparatus which includes a recipe storing unit storing a processing recipe for performing a plasma processing, a compensation setting unit setting an accumulation time of the plasma processing or the number of processed substrates after starting using a new second electrode and the compensation value of the set temperature of the second electrode in an input screen, and a storage unit storing the compensated set value. The plasma processing apparatus is further equipped with a program for controlling a temperature adjusting mechanism based on a set temperature after compensation by adding a set temperature of an upper electrode written in the processing recipe to the compensation value stored within the storage unit. As a result, the non-uniformity in the plasma processing between the substrates caused by the change of processing atmosphere is suppressed.
    Type: Application
    Filed: September 16, 2014
    Publication date: January 1, 2015
    Inventors: Tatsuya OGI, Wataru OZAWA, Kimihiro FUKASAWA, Kazuhiro KANAYA
  • Patent number: 8864934
    Abstract: Provided is a parallel flat-panel type plasma processing apparatus which includes a recipe storing unit storing a processing recipe for performing a plasma processing, a compensation setting unit setting an accumulation time of the plasma processing or the number of processed substrates after starting using a new second electrode and the compensation value of the set temperature of the second electrode in an input screen, and a storage unit storing the compensated set value. The plasma processing apparatus is further equipped with a program for controlling a temperature adjusting mechanism based on a set temperature after compensation by adding a set temperature of an upper electrode written in the processing recipe to the compensation value stored within the storage unit. As a result, the non-uniformity in the plasma processing between the substrates caused by the change of processing atmosphere is suppressed.
    Type: Grant
    Filed: March 29, 2012
    Date of Patent: October 21, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Tatsuya Ogi, Wataru Ozawa, Kimihiro Fukasawa, Kazuhiro Kanaya
  • Publication number: 20140288726
    Abstract: A temperature control method is provided for controlling a plasma processing apparatus that is capable of changing a temperature setting for each step of a plasma process including multiple steps. The method includes a transfer step of performing an entry process for transferring a workpiece into a processing chamber of the plasma processing apparatus and/or an exit process for transferring the workpiece out of the processing chamber, a process execution step of executing the plasma process including multiple steps, and a temperature control step of performing a first temperature control and/or a second temperature control. The first temperature control includes controlling a temperature to a temperature setting of a next process according to a time execution of the plasma process is completed, and the second temperature control includes controlling the temperature to the temperature setting of the next process in parallel with the entry process and/or the exit process.
    Type: Application
    Filed: October 30, 2012
    Publication date: September 25, 2014
    Inventors: Tatsuya Miura, Wataru Ozawa, Kimihiro Fukasawa, Kazunori Kazama
  • Publication number: 20120248067
    Abstract: Provided is a parallel flat-panel type plasma processing apparatus which includes a recipe storing unit storing a processing recipe for performing a plasma processing, a compensation setting unit setting an accumulation time of the plasma processing or the number of processed substrates after starting using a new second electrode and the compensation value of the set temperature of the second electrode in an input screen, and a storage unit storing the compensated set value. The plasma processing apparatus is further equipped with a program for controlling a temperature adjusting mechanism based on a set temperature after compensation by adding a set temperature of an upper electrode written in the processing recipe to the compensation value stored within the storage unit. As a result, the non-uniformity in the plasma processing between the substrates caused by the change of processing atmosphere is suppressed.
    Type: Application
    Filed: March 29, 2012
    Publication date: October 4, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Tatsuya Ogi, Wataru Ozawa, Kimihiro Fukasawa, Kazuhiro Kanaya
  • Patent number: 6517171
    Abstract: A method for braking force distribution control for a vehicle with a direct four wheel drive mode, which does not become an obstacle to an effective braking force and disconcert the driver's feeling. This method relates to a braking force distribution control for a vehicle during direct four wheel drive mode and under the condition that the anti-skid control is inhibited, which does not operate pressure reduction control or the amount of pressure reduction.
    Type: Grant
    Filed: November 30, 2000
    Date of Patent: February 11, 2003
    Assignee: Nisshinbo Industries, Inc
    Inventors: Hiroshi Oshiro, Wataru Ozawa, Yutaka Tanaka, Norihiko Usui
  • Publication number: 20010041958
    Abstract: A method for braking force distribution control for a vehicle with a direct four wheel drive mode, which does not become an obstacle to an effective braking force and disconcert the driver's feeling. This method relates to a braking force distribution control for a vehicle during direct four wheel drive mode and under the condition that the anti-skid control is inhibited, which does not operate pressure reduction control or the amount of pressure reduction.
    Type: Application
    Filed: November 30, 2000
    Publication date: November 15, 2001
    Inventors: Hiroshi Oshiro, Wataru Ozawa, Yutaka Tanaka, Norihiko Usui
  • Patent number: 5792968
    Abstract: A method of an accurate detection of a spinning vehicle wheel. Observed wheel speeds are derived by measuring the speed of each wheel and the slowest speed is set as the slowest observed wheel speed. A maximum probable wheel speed is derived by multiplying the slowest observed wheel speed by the ratio of the maximum wheel speed to the slowest wheel speed for a given minimum turning radius. The maximum probable wheel speed is compared with an observed wheel speed and if the observed wheel speed is greater, the wheel is deemed to be spinning.
    Type: Grant
    Filed: December 19, 1996
    Date of Patent: August 11, 1998
    Assignee: Nisshinbo Industries Inc.
    Inventors: Noriyuki Takemasa, Keiji Toyoda, Wataru Ozawa, Susumu Yamada, Hiroshi Oshiro
  • Patent number: 5734265
    Abstract: A method is provided to compute the probable body speed of a vehicle equipped with a mini tire as a spare tire, specifically when the mini tire is mounted. The wheel speeds of the four wheels are measured, and if the speed does not satisfy the predetermined formula relating to the wheel base and tread of the vehicle to a wheel speed, then a probable vehicle body speed is derived by the normal method. The speed thus derived is corrected by the diameter of the mini tire to compute a new probable vehicle body speed.
    Type: Grant
    Filed: March 20, 1996
    Date of Patent: March 31, 1998
    Assignee: Nisshinbo Industries Inc.
    Inventors: Keiji Toyoda, Noriyuki Takemasa, Wataru Ozawa, Susumu Yamada, Hiroshi Oshiro
  • Patent number: 5655818
    Abstract: An anti-skid control device is provided that eliminates noise and vibration, provides better pedal responsiveness, and provides better anti-skid control. In the anti-skid control device 1, a pressure regulator valve 4 is positioned in the brake line between the master cylinder 12 and inlet valve 21, and the pressure differential between the input side and output side of the inlet valve 21 is minimized.
    Type: Grant
    Filed: June 28, 1995
    Date of Patent: August 12, 1997
    Assignee: Nisshinbo Industries Inc.
    Inventors: Wataru Ozawa, Iwao Ono, Toyohiko Ishikawa, Koji Sakai
  • Patent number: 5572868
    Abstract: An exhaust manifold in which a plurality of branch tubes at an inlet side are connected to a collecting tube at an outlet side, and in which the fluid flows from the branch tubes to the collecting tube, wherein a volumetric chamber is provided between at least a pair of the branch tubes in communication with the branch tubes, with the volumetric chamber being gradually increased in its cross-sectional area in a fluid flowing direction. An exhaust manifold formed of upper and lower members comprises a branch tube having a bend. The upper lower members are interconnected by joining flanges having a broader width in the vicinity of the bend than other joining flange portions.
    Type: Grant
    Filed: February 21, 1995
    Date of Patent: November 12, 1996
    Assignee: Aisin Takaoka Co., Ltd.
    Inventors: Masami Okamoto, Yoshifumi Sogo, Eiji Nawata, Naofumi Masuda, Wataru Ozawa