Abstract: A method for producing a press-ready lithographic printing plate which comprises:(A) providing an uncoated lithographic substrate;(B) coating a photosensitive layer on one side of the lithographic substrate;(C) providing a flexible substrate;(D) coating an adhesive layer directly on the flexible substrate;(E) laminating the coated lithographic substrate to the coated flexible substrate;(F) imagewise exposing the laminated element of (E) to radiation to which the photosensitive layer is sensitive; and(G) peeling off the flexible substrate along with the nonimage areas of the photosensitive layer, leaving the press-ready image areas of the colored photosensitive layer and the adhesive layer on the lithographic substrate.

Abstract: The invention is a method for preparing a photographic element which comprises imagewise exposing a photographic element, and removing the non-image areas thereof by contacting said element with a composition consisting essentially of in admixture:a) from at least about 5% to about 30% by weight of the developer of benzyl alcohol; andb) from about 1% to about 20% by weight of the developer of one of more compound selected from the group consisting of sodium xylene sulfonate and sodium cumene sulfonate; andc) from about 5% to about 40% by weight of the developer of potassium toluene sulfonate; andd) water in sufficient amount of formulate effective developer for imagewise exposed photographic elements.

Abstract: A composition capable of removing the non-image areas of an imagewise exposed photographic element, consisting essentially of in admixture:(a) from at least about 5% to about 30% by weight benzyl alcohol; and(b) from about 1% to about 20% by weight of one or more compounds selected from the group consisting of sodium xylene sulfonate and sodium cumene sulfonate; and(c) from about 5% to about 40% by weight potassium toluene sulfonate; and(d) water.

Abstract: The invention provides a method for developing negative working photographic elements using an aqueous developer comprising(a) a solvent composition consisting essentially of(i) n-propanol or isopropanol; and(ii) a glycol ether or acetate(b) a salt which is preferably magnesium sulfate; and(c) an ethoxylated alkyl phenol type non-ionic surfactant.

Abstract: The invention provides an organic solvent free, phosphate free, lithographic desensitizing composition which comprises:(a) from about 0.1% to about 20.0% by weight of the composition of a copolymer of polymethyl vinyl ether and maleic acid having the formula ##STR1## which has a molecular weight in an amount of from about 20,000 to about 70,000; and(b) from about 0.1% to about 20.0% by weight of the composition of a desensitizing component comprising one or more hydroxy carboxylic acids or salts; and(c) sufficient water to formulate a desensitizing composition; and(d) sufficient base to adjust the pH of the composition into the range of from about 6.5 to about 7.5.

Abstract: An organic solvent free developer composition having a pH in the range of from about 6.5 to about 7.5 comprising in admixture:(a) from about 0.1% to about 20% by weight of the developer of one or more compounds selected from the group consisting of sodium octyl sulfate, sodium tetradecyl sulfate, sodium 2-ethyl hexyl sulfate and ammonium lauryl sulfate; and(b) from about 0.1% to about 30% by weight of the developer of one or more components selected from the group consisting of lithium salts of hydroxy, aryl and alkyl carboxylic acids; and(c) from about 0.1% to about 30% by weight of the developer of one or more compounds selected from the group consisting of potassium salts of hydroxy, aryl and alkyl carboxylic acids; and(d) an optional compatible organic or inorganic acid or base in an amount sufficient to adjust the pH of the developer composition into the range of from about 6.5 to about 7.5; and(e) an optional anti-foam component in an amount of from about 0.02 to about 0.

Abstract: The invention provides an organic solvent free, phosphate free, lithographic desensitizing composition which comprises:(a) from about 0.1% to about 20.0% by weight of the composition of a copolymer of polymethyl vinyl ether and maleic acid having the formula ##STR1## which has a molecular weight in an amount of from about 20,000 to about 70,000; and(b) from about 0.1% to about 20.0% by weight of the composition of a desensitizing component comprising one or more hydroxy carboxylic acids or salts; and(c) sufficient water to formulate a desensitizing composition; and(d) sufficient base to adjust the pH of the composition into the range of from about 6.5 to about 7.5.

Abstract: Removing iron fouling from heat transfer surfaces of cooling water systems with an aqueous solution of certain alkylene amine carboxyl polyacids, or water soluble salts thereof, at a pH of 5-9.

Abstract: A process and composition using hydroxyphosphonoacetic acid or its water-soluble salts in combination with certain copolymers, such as water-soluble 1-acrylamido-2-methylpropane sulfonic acid copolymers with acrylic acid or methacrylic acid, provide improved corrosion protection for iron based metal in contact with the system water of aqueous systems.

Abstract: Composition for inhibition of ferrous metal corrosion consisting essentially of (a) HEDPA compound and (b) HPAA compound. Optionally the composition may also include (c) an azole.

Abstract: The invention provides a method for developing negative working photographic elements using an aqueous developer comprising(a) .alpha.-hydroxy toluene; and(b) C.sub.12 sodium alkyl ether sulfate.