Patents by Inventor Wayne Babie

Wayne Babie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Unique process chemistry for etching organic low-k materials
    Patent number: 6841483
    Abstract: Method for etching a feature in an integrated circuit wafer with minimized effect of micromasking. The method introduces a flow of etchant gas including a fluorocarbon gas to the wafer, and uses the etchant gas to form a plasma in proximity with at least a portion of the wafer. The plasma is used to etch at least a portion of the feature in the wafer. Disassociation of the fluorocarbon into fluorine and hydrocarbon species performs two functions. The fluorine species prevents or significantly reduces sputtered hardmask components from depositing on the floor of the etched feature during etching. The hydrocarbon species acts to form a passivation layer on the sidewalls of the feature.
    Type: Grant
    Filed: February 12, 2001
    Date of Patent: January 11, 2005
    Assignee: Lam Research Corporation
    Inventors: Helen H. Zhu, James R. Bowers, Ian J. Morey, Wayne Babie, Michael Goss
  • Unique process chemistry for etching organic low-k materials
    Publication number: 20020111036
    Abstract: Method for etching a feature in an integrated circuit wafer with minimized effect of micromasking. The method introduces a flow of etchant gas including a fluorocarbon gas to the wafer, and uses the etchant gas to form a plasma in proximity with at least a portion of the wafer. The plasma is used to etch at least a portion of the feature in the wafer. Disassociation of the fluorocarbon into fluorine and hydrocarbon species performs two functions. The fluorine species prevents or significantly reduces sputtered hardmask components from depositing on the floor of the etched feature during etching. The hydrocarbon species acts to form a passivation layer on the sidewalls of the feature.
    Type: Application
    Filed: February 12, 2001
    Publication date: August 15, 2002
    Applicant: Lam Research Corporation
    Inventors: Helen H. Zhu, James R. Bowers, Ian J. Morey, Wayne Babie, Michael Goss