Patents by Inventor Wei-Cheng Chung

Wei-Cheng Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240144467
    Abstract: A hot spot defect detecting method and a hot spot defect detecting system are provided. In the method, hot spots are extracted from a design of a semiconductor product to define a hot spot map comprising hot spot groups, wherein local patterns in a same context of the design yielding a same image content are defined as a same hot spot group. During runtime, defect images obtained by an inspection tool performing hot scans on a wafer manufactured with the design are acquired and the hot spot map is aligned to each defect image to locate the hot spot groups. The hot spot defects in each defect image are detected by dynamically mapping the hot spot groups located in each defect image to a plurality of threshold regions and respectively performing automatic thresholding on pixel values of the hot spots of each hot spot group in the corresponding threshold region.
    Type: Application
    Filed: January 8, 2024
    Publication date: May 2, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chien-Huei Chen, Pei-Chao Su, Xiaomeng Chen, Chan-Ming Chang, Shih-Yung Chen, Hung-Yi Chung, Kuang-Shing Chen, Li-Jou Lee, Yung-Cheng Lin, Wei-Chen Wu, Shih-Chang Wang, Chien-An Lin
  • Patent number: 11973117
    Abstract: Methods of forming contacts for source/drain regions and a contact plug for a gate stack of a finFET device are disclosed herein. Methods include etching a contact opening through a dielectric layer to expose surfaces of a first source/drain contact and repairing silicon oxide structures along sidewall surfaces of the contact opening and along planar surfaces of the dielectric layer to prevent selective loss defects from occurring during a subsequent selective deposition of conductive fill materials and during subsequent etching of other contact openings. The methods further include performing a selective bottom-up deposition of conductive fill material to form a second source/drain contact. According to some of the methods, once the second source/drain contact has been formed, the contact plug may be formed over the gate stack.
    Type: Grant
    Filed: August 3, 2021
    Date of Patent: April 30, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Hsien Huang, Chang-Ting Chung, Wei-Cheng Lin, Wei-Jung Lin, Chih-Wei Chang
  • Patent number: 11955507
    Abstract: A light-emitting device, including a first type semiconductor layer, a patterned insulating layer, a light-emitting layer, and a second type semiconductor layer, is provided. The patterned insulating layer covers the first type semiconductor layer and has a plurality of insulating openings. The insulating openings are separated from each other. The light-emitting layer is located in the plurality of insulating openings and covers a portion of the first type semiconductor layer. The second type semiconductor layer is located on the light-emitting layer.
    Type: Grant
    Filed: September 9, 2021
    Date of Patent: April 9, 2024
    Assignee: AU OPTRONICS CORPORATION
    Inventors: Hsin-Hung Li, Wei-Syun Wang, Chih-Chiang Chen, Yu-Cheng Shih, Cheng-Chan Wang, Chia-Hsin Chung, Ming-Jui Wang, Sheng-Ming Huang
  • Patent number: 11940737
    Abstract: A method includes receiving a device design layout and a scribe line design layout surrounding the device design layout. The device design layout and the scribe line design layout are rotated in different directions. An optical proximity correction (OPC) process is performed on the rotated device design layout and the rotated scribe line design layout. A reticle includes the device design layout and the scribe line design layout is formed after performing the OPC process.
    Type: Grant
    Filed: May 7, 2021
    Date of Patent: March 26, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hsueh-Yi Chung, Yung-Cheng Chen, Fei-Gwo Tsai, Chi-Hung Liao, Shih-Chi Fu, Wei-Ti Hsu, Jui-Ping Chuang, Tzong-Sheng Chang, Kuei-Shun Chen, Meng-Wei Chen
  • Patent number: 11929730
    Abstract: An acoustic wave element includes: a substrate; a bonding structure on the substrate; a support layer on the bonding structure; a first electrode including a lower surface on the support layer; a cavity positioned between the support layer and the first electrode and exposing a lower surface of the first electrode; a piezoelectric layer on the first electrode; and a second electrode on the piezoelectric layer, wherein at least one of the first electrode and the second electrode includes a first layer and a second layer that the first layer has a first acoustic impedance and a first electrical impedance, the second layer has a second acoustic impedance and a second electrical impedance, wherein the first acoustic impedance is higher than the second acoustic impedance, and the second electrical impedance is lower than the first electrical impedance.
    Type: Grant
    Filed: February 10, 2021
    Date of Patent: March 12, 2024
    Assignee: EPISTAR CORPORATION
    Inventors: Ta-Cheng Hsu, Wei-Shou Chen, Chun-Yi Lin, Chung-Jen Chung, Wei-Tsuen Ye, Wei-Ching Guo
  • Patent number: 11459738
    Abstract: A connection structure of a ceramic cartridge of a faucet contains: a control body, a rotatable operation rod, a connection ring, a stop ring, a guide ring, and a seal washer. The control body includes an accommodation space and an outlet. The guiding ring includes a fan-shaped hole corresponding to multiple stopping fringes of the stop ring. The control body includes an orifice, and the rotatable operation rod includes multiple O rings fitted thereon to avoid a leakage of the waters. The orifice has a recess, and the rotatable operation rod includes a notch for accommodating a C retainer. The rotatable operation rod includes an insertion, and the connection ring includes a receiving trough. The insertion has a hook, and the receiving trough has a cutout configured to engage with the hook. The connection ring includes a rib. The stop ring includes an aperture and multiple stopping fringes.
    Type: Grant
    Filed: June 9, 2021
    Date of Patent: October 4, 2022
    Assignee: Greatness Sanitary Industrial Co., Ltd.
    Inventor: Wei-Cheng Chung
  • Patent number: 11143348
    Abstract: A gas pipe joint contains: a connection pipe, a first threaded pipe, and a second threaded pipe. The connection pipe includes a first part and a second part, the first part has a first threaded orifice, and the second part has a second threaded orifice. The first threaded pipe includes a first coupling section, a first nut section, and a second coupling section. The second threaded pipe includes a second nut section and a third coupling section, the second nut section has a second screwing portion, and the third coupling section has at least one second recessed portion and a second groove. The third coupling section has a second shoulder. The second shoulder has a second lower gasket. The first groove has two first loops, and the second groove has two second loops.
    Type: Grant
    Filed: October 18, 2019
    Date of Patent: October 12, 2021
    Assignee: Greatness Sanitary Industrial Co.
    Inventor: Wei-cheng Chung
  • Publication number: 20210116063
    Abstract: A gas pipe joint contains: a connection pipe, a first threaded pipe, and a second threaded pipe. The connection pipe includes a first part and a second part, the first part has a first threaded orifice, and the second part has a second threaded orifice. The first threaded pipe includes a first coupling section, a first nut section, and a second coupling section. The second threaded pipe includes a second nut section and a third coupling section, the second nut section has a second screwing portion, and the third coupling section has at least one second recessed portion and a second groove. The third coupling section has a second shoulder. The second shoulder has a second lower gasket. The first groove has two first loops, and the second groove has two second loops.
    Type: Application
    Filed: October 18, 2019
    Publication date: April 22, 2021
    Inventor: Wei-cheng Chung
  • Publication number: 20200149252
    Abstract: A rotary control structure for a water valve contains: a body, a connection disk, a guide disc, a guide disc, and a stop ring. The body accommodates a control shaft and includes a receiving space and an outlet. The connection disk is connected with a positioning disc including a sector cutout. The guide disc is mounted below the positioning disc and includes a fan-shaped aperture corresponding to the sector cutout. The stop ring is mounted below the fan-shaped aperture and limits the connection disk, the positioning disc, and the guide disc in the receiving space. The body includes a limitation slot, and the control shaft includes a fixing portion and a C-retainer fitted on the fixing portion. The control shaft further includes an insertion retained with a coupling groove of the connection disk, and the connection disk includes a rib configured to urge the positioning disc to rotate.
    Type: Application
    Filed: November 13, 2018
    Publication date: May 14, 2020
    Inventor: Wei-Cheng Chung
  • Publication number: 20130181191
    Abstract: An electronic device including a bio-polymer material and a method for manufacturing the same are disclosed. The electronic device of the present invention comprises: a substrate; a first electrode disposed on the substrate; a bio-polymer layer disposed on the first electrode, wherein the bio-polymeric material is selected from a group consisting of wool keratin, collagen hydrolysate, gelatin, whey protein and hydroxypropyl methylcellulose; and a second electrode disposed on the biopolymer material layer. The present invention is suitable for various electronic devices such as an organic thin film transistor, an organic floating gate memory, or a metal-insulator-metal capacitor.
    Type: Application
    Filed: June 1, 2012
    Publication date: July 18, 2013
    Inventors: Jenn-Chang Hwang, Chao-Ying Hsieh, Lung-Kai Mao, Chun-Yi Lee, Li-Shiuan Tsai, Cheng-Lung Tsai, Wei-Cheng Chung, Ping-Chiang Lyu
  • Publication number: 20050156808
    Abstract: An improved structure for a communication probe component comprises a cylindrical housing, a post-shaped push up pin, an elastic component and a cap; wherein the cylindrical housing with hollow cavity has two oppositely disposed open ends, so that electrolyte may evenly and completely distribute on the inner wall and bottom surfaces of the hollow cavity during electroplating to ensure excellent electroplating quality; and since the electroplating quality is good for all parts of the communication probe component, the functionality of the communication probe component is ensured without concerns about poor electric conductivity or connection when used as a recharging pin or antenna signal pin for mobile phones
    Type: Application
    Filed: July 14, 2004
    Publication date: July 21, 2005
    Applicant: P-TWO INDUSTRIES INC.
    Inventor: Wei-Cheng Chung
  • Patent number: D973848
    Type: Grant
    Filed: January 19, 2021
    Date of Patent: December 27, 2022
    Assignee: Greatness Sanitary Industrial Co., Ltd.
    Inventor: Wei-cheng Chung
  • Patent number: D1006605
    Type: Grant
    Filed: January 19, 2021
    Date of Patent: December 5, 2023
    Assignee: Greatness Sanitary Industrial Co., Ltd.
    Inventor: Wei-cheng Chung
  • Patent number: D1013112
    Type: Grant
    Filed: January 19, 2021
    Date of Patent: January 30, 2024
    Assignee: Greatness Sanitary Industrial Co., Ltd.
    Inventor: Wei-cheng Chung
  • Patent number: D1022131
    Type: Grant
    Filed: January 19, 2021
    Date of Patent: April 9, 2024
    Assignee: Greatness Sanitary Industrial Co., Ltd.
    Inventor: Wei-cheng Chung
  • Patent number: D1022142
    Type: Grant
    Filed: January 19, 2021
    Date of Patent: April 9, 2024
    Assignee: Greatness Sanitary Industrial Co., Ltd.
    Inventor: Wei-cheng Chung
  • Patent number: D1025304
    Type: Grant
    Filed: January 19, 2021
    Date of Patent: April 30, 2024
    Assignee: Greatness Sanitary Industrial Co., Ltd.
    Inventor: Wei-cheng Chung