Patents by Inventor Weiming Ren
Weiming Ren has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220254599Abstract: Inspection systems and methods are disclosed. An inspection system may include a first energy source configured to provide a first landing energy beam and a second energy source configured to provide a second landing energy beam. The inspection system may also include a beam controller configured to selectively deliver one of the first and second landing energy beams towards a same field of view, and to switch between delivery of the first and second landing energy beams according to a mode of operation of the inspection system.Type: ApplicationFiled: July 18, 2020Publication date: August 11, 2022Applicant: ASML Netherlands B.V.Inventors: Wei FANG, Weiming REN, Zhong-wei CHEN
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Publication number: 20220246395Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.Type: ApplicationFiled: April 11, 2022Publication date: August 4, 2022Applicant: ASML Netherlands B.V.Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zong-wei CHEN
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Patent number: 11398368Abstract: A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.Type: GrantFiled: October 19, 2020Date of Patent: July 26, 2022Assignee: ASML Netherlands B.VInventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
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Publication number: 20220223366Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer; a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.Type: ApplicationFiled: March 28, 2022Publication date: July 14, 2022Inventors: Xuerang HU, Weiming REN, Xuedong LIU, Zhong-wei CHEN
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Publication number: 20220216029Abstract: A multi-beam inspection apparatus including an improved source conversion unit is disclosed. The improved source conversion unit may comprise a micro-structure deflector array including a plurality of multipole structures. The micro-deflector deflector array may comprise a first multipole structure having a first radial shift from a central axis of the array and a second multipole structure having a second radial shift from the central axis of the array. The first radial shift is larger than the second radial shift, and the first multipole structure comprises a greater number of pole electrodes than the second multipole structure to reduce deflection aberrations when the plurality of multipole structures deflects a plurality of charged particle beams.Type: ApplicationFiled: January 24, 2022Publication date: July 7, 2022Applicant: ASML Netherlands B.V.Inventors: Weiming REN, Qian ZHANG, Xuerang HU, Xuedong LIU
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Publication number: 20220189726Abstract: A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.Type: ApplicationFiled: March 6, 2020Publication date: June 16, 2022Applicant: ASML Netherlands B.V.Inventors: Qingpo XI, Xuerang HU, Xuedong LIU, Weiming REN, Zhong-wei CHEN
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Publication number: 20220148851Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.Type: ApplicationFiled: August 30, 2021Publication date: May 12, 2022Inventors: Weiming REN, Shuai LI, Xuedong LIU, Zhongwei CHEN
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Patent number: 11328894Abstract: Systems and methods are provided for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus. Embodiments of the present disclosure provide a dispersion device comprising an electrostatic deflector and a magnetic deflector configured to induce a beam dispersion set to cancel the dispersion generated by the beam separator. The combination of the electrostatic deflector and the magnetic deflector can be used to keep the deflection angle due to the dispersion device unchanged when the induced beam dispersion is changed to compensate for a change in the dispersion generated by the beam separator. In some embodiments, the deflection angle due to the dispersion device can be controlled to be zero and there is no change in primary beam axis due to the dispersion device.Type: GrantFiled: July 27, 2018Date of Patent: May 10, 2022Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Xinan Luo, Zhongwei Chen
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Patent number: 11302514Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.Type: GrantFiled: August 8, 2019Date of Patent: April 12, 2022Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zong-wei Chen
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Patent number: 11295930Abstract: Systems and methods are provided for charged particle detection. The detection system can comprise a signal processing circuit configured to generate a set of intensity gradients based on electron intensity data received from a plurality of electron sensing elements. The detection system can further comprise a beam spot processing module configured to determine, based on the set of intensity gradients, at least one boundary of a beam spot; and determine, based on the at least one boundary, that a first set of electron sensing elements of the plurality of electron sensing elements is within the beam spot. The beam spot processing module can further be configured to determine an intensity value of the beam spot based on the electron intensity data received from the first set of electron sensing elements and also generate an image of a wafer based on the intensity value.Type: GrantFiled: February 1, 2018Date of Patent: April 5, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Yongxin Wang, Weiming Ren, Zhonghua Dong, Zhongwei Chen
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Patent number: 11289304Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer; a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.Type: GrantFiled: April 4, 2018Date of Patent: March 29, 2022Assignee: ASML Netherlands B.V.Inventors: Xuerang Hu, Weiming Ren, Xuedong Liu, Zhong-wei Chen
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Patent number: 11282675Abstract: The present disclosure proposes a crossover-forming deflector array of an electro-optical system for directing a plurality of electron beams onto an electron detection device. The crossover-forming deflector array includes a plurality of crossover-forming deflectors positioned at or at least near an image plane of a set of one or more electro-optical lenses of the electro-optical system, wherein each crossover-forming deflector is aligned with a corresponding electron beam of the plurality of electron beams.Type: GrantFiled: January 11, 2021Date of Patent: March 22, 2022Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhong-wei Chen
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Patent number: 11232928Abstract: A multi-beam inspection apparatus including an improved source conversion unit is disclosed. The improved source conversion unit may comprise a micro-structure deflector array including a plurality of multipole structures. The micro-deflector deflector array may comprise a first multipole structure having a first radial shift from a central axis of the array and a second multipole structure having a second radial shift from the central axis of the array. The first radial shift is larger than the second radial shift, and the first multipole structure comprises a greater number of pole electrodes than the second multipole structure to reduce deflection aberrations when the plurality of multipole structures deflects a plurality of charged particle beams.Type: GrantFiled: December 27, 2019Date of Patent: January 25, 2022Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Qian Zhang, Xuerang Hu, Xuedong Liu
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Publication number: 20220005665Abstract: The present disclosure proposes an anti-rotation lens and using it as an anti-rotation condenser lens in a multi-beam apparatus with a pre-beamlet-forming mechanism. The anti-rotation condenser lens keeps rotation angles of beamlets unchanged when changing currents thereof, and thereby enabling the pre-beamlet-forming mechanism to cut off electrons not in use as much as possible. In this way, the multi-beam apparatus can observe a sample with high resolution and high throughput, and is competent as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry.Type: ApplicationFiled: July 12, 2021Publication date: January 6, 2022Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zhong-wei CHEN
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Patent number: 11217423Abstract: A multi-beam apparatus for observing a sample with oblique illumination is proposed. In the apparatus, a new source-conversion unit changes a single electron source into a slant virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample with oblique illumination, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means not only forms the slant virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots. The apparatus can provide dark-field images and/or bright-field images of the sample.Type: GrantFiled: March 18, 2019Date of Patent: January 4, 2022Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen, Jack Jau
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Publication number: 20210391138Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.Type: ApplicationFiled: June 21, 2021Publication date: December 16, 2021Inventors: Xuedong LIU, Weiming REN, Shuai LI, Zhongwei CHEN
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Publication number: 20210384008Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.Type: ApplicationFiled: July 12, 2021Publication date: December 9, 2021Applicant: ASML Netherlands B.V.Inventors: Shuai LI, Weiming REN, Xuedong LIU, Juying DOU, Xuerang HU, Zhongwei CHEN
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Publication number: 20210319977Abstract: Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a compound objective lens comprising a magnetic lens and an electrostatic lens, the magnetic lens comprising a cavity, and an electron detector located immediately upstream from a polepiece of the magnetic lens and inside the cavity of the magnetic lens. In some embodiments, deflectors may be located between the electron detector and the opening of the polepiece adjacent to the sample to achieve a large field of view. Electron distributions among the detectors can be manipulated without changing the landing energy by changing the potential of the control electrode(s) in the electrostatic objective lens. The electron source can be operated with several discrete potentials to cover different landing energies, while the potential difference between electron source and the extractor is fixed.Type: ApplicationFiled: April 8, 2021Publication date: October 14, 2021Inventors: Xuedong LIU, Weimin ZHOU, Xiaoxue CHEN, Xiaoyu JI, Heng LI, Shahedul HOQUE, Zongyao LI, Shuhao LIU, Weiming REN
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Patent number: 11107657Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.Type: GrantFiled: May 4, 2020Date of Patent: August 31, 2021Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen
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Publication number: 20210233736Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.Type: ApplicationFiled: December 28, 2020Publication date: July 29, 2021Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zhongwei CHEN