Abstract: A memory device includes a first well, a second well, a first active area, a second active area, a third active area, a first poly layer and a second poly layer. The first well is of a first conductivity type. The second well is of a second conductivity type different from the first conductivity type. The first active area is of the second conductivity type and is formed on the first well. The second active area is of the first conductivity type and is formed on the first well and between the first active area and the second well. The third active area is of the first conductivity type and is formed on the second well. The first poly layer is formed above the first well and the second well. The second poly layer is formed above the first well.

Abstract: A programming and verifying method for a multi-level memory cell array includes following steps. In a step (a1), a first row of the multi-level memory cell array is set as a selected row, and A is set as 1. In a step (a2), memory cells in the selected row excluding the memory cells in the target storage state and bad memory cells are programmed to the A-th storage state. In a step (a3), if A is not equal to X, 1 is added to X and the step (a2) is performed again. In a step (a4), if A is equal to X, the program cycle is ended. In the step (a2), the first-portion memory cells of the selected row are subjected to plural write actions and plural verification actions until all of the first-portion memory cells reach the A-th storage state.

Abstract: A non-volatile memory includes a substrate region, a barrier layer, an N-type well region, an isolation structure, a first gate structure, a first sidewall insulator, a first P-type doped region, a second P-type doped region and an N-type doped region. The isolation structure is arranged around the N-type well region and formed over the barrier layer. The N-type well region is surrounded by the isolation structure and the barrier layer. Consequently, the N-type well region is an isolation well region. The first gate structure is formed over a surface of the N-type well region. The first sidewall insulator is arranged around the first gate structure. The first P-type doped region, the second P-type doped region and the N-type doped region are formed under the surface of the N-type well region.

Abstract: A memory device includes a well, a poly layer, a dielectric layer, an alignment layer and an active area. The poly layer is formed above the well. The dielectric layer is formed above the poly layer. The alignment layer is formed on the dielectric layer, used to receive an alignment layer voltage and substantially aligned with the dielectric layer in a projection direction. The active area is formed on the well. The dielectric layer is thicker than the alignment layer. A first overlap area of the poly layer and the active area is smaller than a second overlap area of the poly layer and the dielectric layer excluding the first overlap area.

Abstract: A memory cell of a memory cell array includes a well region, a first doped region, a second doped region, a first gate structure, and a storage structure. The first doped region and the second doped region are formed in the well region. The first gate structure is formed over a first surface between the first doped region and the second doped region. The storage structure is formed over a second surface and the second surface is between the first surface and the second doped region. The storage structure is covered on a portion of the first gate structure, the second surface and an isolation structure.

Abstract: A random bit cell includes a selection transistor, a first P-type transistor, and a second P-type transistor. The selection transistor has a first terminal coupled to a source line, a second terminal coupled to a common node, and a control terminal coupled to a word line. The first P-type transistor has a first terminal coupled to the common node, a second terminal coupled to a first bit line, and a floating gate. The second P-type transistor has a first terminal coupled to the common node, a second terminal coupled to a second bit line, and a floating gate. During an enroll operation, one of the first P-type transistor and the second P-type transistor is programmed by channel hot electron injection.

Abstract: A one time programmable non-volatile memory cell includes a storage element. The storage element includes a glass substrate, a buffer layer, a polysilicon layer and a metal layer. The buffer layer is disposed on the glass substrate. The polysilicon layer is disposed on the buffer layer. A P-type doped region and an N-type doped region are formed in the polysilicon layer. The metal layer is contacted with the N-type doped region and the P-type doped region. The metal layer, the N-type doped region and the P-type doped region are collaboratively formed as a diode. When a program action is performed, the first diode is reverse-biased, and the diode is switched from a first storage state to a second storage state. When a read action is performed, the diode is reverse-biased and the diode generates a read current.

Abstract: A storage cell includes a selection circuit, a first memory transistor, and a second memory transistor. The selection circuit is coupled to a source line and a common node. When the selection circuit is turned on, the selection circuit forms an electrical connection between the source line and the common node. The first memory transistor has a first terminal coupled to the common node, a second terminal coupled to a first bit line, and a control terminal coupled to a control line. The second memory transistor has a first terminal coupled to the common node, a second terminal coupled to a second bit line, and a control terminal coupled to the control line. The first memory transistor and the second memory transistor are 2-dimension charge-trapping devices or 3-dimension charge-trapping devices.

Abstract: An erasable programmable non-volatile memory includes a memory array and a sensing circuit. The memory array includes a general memory cell and a reference memory cell, which are connected with a word line. The sensing circuit includes a current comparator. The read current in the program state of the general memory cell is higher than the read current in the program state of the reference memory cell. The erase efficiency of the general memory cell is higher than the erase efficiency of the reference memory cell. When a read action is performed, the general memory cell generates a read current to the current comparator, and the reference memory cell generates a reference current to the current comparator. According to the reference current and the read current, the current comparator generates an output data signal to indicate a storage state of the general memory cell.

Abstract: An erasable programmable non-volatile memory includes a first-type well region, three doped regions, two gate structures, a blocking layer and an erase line. The first doped region is connected with a source line. The third doped region is connected with a bit line. The first gate structure is spanned over an area between the first doped region and the second doped region. A first polysilicon gate of the first gate structure is connected with a select gate line. The second gate structure is spanned over an area between the second doped region and the third doped region. The second gate structure includes a floating gate and the floating gate is covered by the blocking layer. The erase line is contacted with the blocking layer. The erase line is located above an edge or a corner of the floating gate.

Abstract: A non-volatile memory includes a substrate region, a barrier layer, an N-type well region, an isolation structure, a first gate structure, a first sidewall insulator, a first P-type doped region, a second P-type doped region and an N-type doped region. The isolation structure is arranged around the N-type well region and formed over the barrier layer. The N-type well region is surrounded by the isolation structure and the barrier layer. Consequently, the N-type well region is an isolation well region. The first gate structure is formed over a surface of the N-type well region. The first sidewall insulator is arranged around the first gate structure. The first P-type doped region, the second P-type doped region and the N-type doped region are formed under the surface of the N-type well region.

Abstract: A memory system includes a non-volatile memory block, a random bit block, and a sense amplifier. The non-volatile memory block includes a plurality of non-volatile memory cells for storing a plurality of bits of data. Each of the non-volatile memory cells includes a first storage transistor. The random bit block includes a plurality of random bit cells for providing a plurality of random bits. Each of the random bit cells includes a second storage transistor and a third storage transistor. The sense amplifier senses a first read current of a non-volatile memory cell during a read operation of the non-volatile memory cell and senses a second read current of a random bit cell during a read operation of the random bit cell. The first storage transistor, the second storage transistor, and the third storage transistor are storage transistors of the same type.

Abstract: A read-only memory cell array includes a first storage state memory cell and a second storage state memory cell. The first storage state memory cell includes a first transistor and a second transistor. The first transistor is connected to a source line and a word line. The second transistor is connected to the first transistor and a first bit line. The second storage state memory cell includes a third transistor and a fourth transistor. The third transistor is connected to the source line and the word line. The fourth transistor is connected to the third transistor and a second bit line. A gate terminal of the fourth transistor is connected to a gate terminal of the third transistor.

Abstract: A memory structure including a first select transistor, a first floating gate transistor, a second select transistor, a second floating gate transistor, and a seventh doped region is provided. The first select transistor includes a select gate, a first doped region, and a second doped region. The first floating gate transistor includes a floating gate, the second doped region, and a third doped region. The second select transistor includes the select gate, a fourth doped region, and a fifth doped region. The second floating gate transistor includes the floating gate, the fifth doped region, and a sixth doped region. A gate width of the floating gate in the second floating gate transistor is greater than a gate width of the floating gate in the first floating gate transistor. The floating gate covers at least a portion of the seventh doped region.

Abstract: A random code generator includes a memory cell, two write buffers and two sensing circuits. The memory cell includes a first program path between a first source line and a first bit line, a second program path between the first source line and a second bit line, a first read path between a second source line and a third bit line, and a second read path between a third source line and a fourth bit line. The two write buffers are connected with the first bit line and the second bit line, respectively. The two sensing circuits are connected with the third bit line and the fourth bit line, respectively. The two sensing circuits generate a first output signal and the second output signal to the corresponding write buffers according to the read currents in the corresponding read paths.

Abstract: A method for manufacturing a semiconductor structure includes forming a first oxide layer on a wafer; forming a silicon nitride layer on the first oxide layer; forming a plurality of trenches; filling an oxide material in the trenches to form a plurality of shallow trench isolation regions; removing the silicon nitride layer without removing the first oxide layer; using a photomask to apply a photoresist for covering a first part of the first oxide layer on a first area and exposing a second part of the first oxide layer on a second area; and removing the second part of the first oxide layer while remaining the first part of the first oxide layer.

Abstract: A nonvolatile memory structure includes a substrate, a select transistor, and a floating-gate transistor. The substrate includes an oxide defined (OD) region and an erase region. The select transistor is disposed on the OD region, and the floating-gate transistor is disposed on the OD region between the select transistor and the erase region, wherein the floating gate has an extended portion capacitively coupled to the erase region, and the extended portion has an extending direction parallel to a first direction. The OD region further has an addition region protruding in a second direction and partially overlapped with the floating gate, in which the second direction is vertical to the first direction.

Abstract: A memory system includes a non-volatile memory block, a random bit block, and a sense amplifier. The non-volatile memory block includes a plurality of non-volatile memory cells for storing a plurality of bits of data. Each of the non-volatile memory cells includes a first storage transistor. The random bit block includes a plurality of random bit cells for providing a plurality of random bits. Each of the random bit cells includes a second storage transistor and a third storage transistor. The sense amplifier senses a first read current of a non-volatile memory cell during a read operation of the non-volatile memory cell and senses a second read current of a random bit cell during a read operation of the random bit cell. The first storage transistor, the second storage transistor, and the third storage transistor are storage transistors of the same type.

Abstract: A memory device includes a well, a first gate layer, a second gate layer, a doped region, a blocking layer and an alignment layer. The first gate layer is formed on the well. The second gate layer is formed on the well. The doped region is formed within the well and located between the first gate layer and the second gate layer. The blocking layer is formed to cover the first gate layer, the first doped region and a part of the second gate layer and used to block electrons from excessively escaping. The alignment layer is formed on the blocking layer and above the first gate layer, the doped region and the part of the second gate layer. The alignment layer is thinner than the blocking layer, and the alignment layer is thinner than the first gate layer and the second gate layer.

Abstract: A random bit cell includes a selection transistor, a first P-type transistor, and a second P-type transistor. The selection transistor has a first terminal coupled to a source line, a second terminal coupled to a common node, and a control terminal coupled to a word line. The first P-type transistor has a first terminal coupled to the common node, a second terminal coupled to a first bit line, and a floating gate. The second P-type transistor has a first terminal coupled to the common node, a second terminal coupled to a second bit line, and a floating gate. During an enroll operation, one of the first P-type transistor and the second P-type transistor is programmed by channel hot electron injection.