Abstract: An array substrate, a fabrication method thereof, and a display panel are provided. The array substrate comprises a substrate, and a plurality of thin-film-transistors, which includes an active layer formed on the substrate including a source region, a drain region, and a channel region located between the source region and the drain region, a source electrode metal contact layer, a drain electrode metal contact layer, a barrier layer formed on a side of the active layer facing away from the substrate, a source electrode formed on a side of the source electrode metal contact layer facing away from active layer, a drain electrode formed on a side of the drain electrode metal contact layer facing away from the active layer, and a gate electrode insulated from the barrier layer and formed on a side of the barrier layer facing away from the active layer.

Abstract: An array substrate, a fabrication method thereof, and a display panel are provided. The array substrate comprises a substrate, and a plurality of thin-film-transistors, which includes an active layer formed on the substrate including a source region, a drain region, and a channel region located between the source region and the drain region, a source electrode metal contact layer, a drain electrode metal contact layer, a barrier layer formed on a side of the active layer facing away from the substrate, a source electrode formed on a side of the source electrode metal contact layer facing away from active layer, a drain electrode formed on a side of the drain electrode metal contact layer facing away from the active layer, and a gate electrode insulated from the barrier layer and formed on a side of the barrier layer facing away from the active layer.

Abstract: A film deposition device is disclosed. The device includes a driver, a sputtering target assembly, and at least one rotatable magnetoelectric device located at the back of the sputtering target assembly. The rotatable magnetoelectric device includes a transmission having a conveyor belt, and at least one pair of gears which cooperate with the conveyor belt and are disposed at an inner side of the conveyor belt, where an axial direction of the gears is substantially parallel to a surface of the sputtering target assembly. The rotatable magnetoelectric device also includes a first set of magnets, where the first set of magnets are disposed outside of the conveyor belt. In addition, the driver is configured to cause the gears to rotate.

Abstract: A film deposition device is disclosed. The device includes a driver, a sputtering target assembly, and at least one rotatable magnetoelectric device located at the back of the sputtering target assembly. The rotatable magnetoelectric device includes a transmission having a conveyor belt, and at least one pair of gears which cooperate with the conveyor belt and are disposed at an inner side of the conveyor belt, where an axial direction of the gears is substantially parallel to a surface of the sputtering target assembly. The rotatable magnetoelectric device also includes a first set of magnets, where the first set of magnets are disposed outside of the conveyor belt. In addition, the driver is configured to cause the gears to rotate.