Patents by Inventor Weixuan HU

Weixuan HU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230273528
    Abstract: A method for selecting patterns for training a model to predict patterns to be printed on a substrate. The method includes (a) obtaining images of multiple patterns, wherein the multiple patterns correspond to target patterns to be printed on a substrate; (b) grouping the images into a group of special patterns and multiple groups of main patterns; and (c) outputting a set of patterns based on the images as training data for training the model, wherein the set of patterns includes the group of special patterns and a representative main pattern from each group of main patterns.
    Type: Application
    Filed: July 29, 2021
    Publication date: August 31, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Rencheng SUN, Qi JIA, Meng LIU, Weixuan HU, Jen-Yi WUU, Hao CHEN
  • Publication number: 20230236512
    Abstract: Methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method involves obtaining a training data set including: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; and training a machine learning model for the patterning process based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model can be used for determining a ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.
    Type: Application
    Filed: March 7, 2023
    Publication date: July 27, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Youping ZHANG, Maxime Philippe Frederic Genin, Cong Wu, Jing Su, Weixuan Hu, Yi Zou
  • Patent number: 11635699
    Abstract: Methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method involves obtaining a training data set including: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; and training a machine learning model for the patterning process based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model can be used for determining a ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: April 25, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Youping Zhang, Maxime Philippe Frederic Genin, Cong Wu, Jing Su, Weixuan Hu, Yi Zou
  • Publication number: 20220043356
    Abstract: Methods for training a process model and determining ranking of simulated patterns (e.g., corresponding to hot spots). A method involves obtaining a training data set including: (i) a simulated pattern associated with a mask pattern to be printed on a substrate, (ii) inspection data of a printed pattern imaged on the substrate using the mask pattern, and (iii) measured values of a parameter of the patterning process applied during imaging of the mask pattern on the substrate; and training a machine learning model for the patterning process based on the training data set to predict a difference in a characteristic of the simulated pattern and the printed pattern. The trained machine learning model can be used for determining a ranking of hot spots. In another method a model is trained based on measurement data to predict ranking of the hot spots.
    Type: Application
    Filed: December 4, 2019
    Publication date: February 10, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Youping ZHANG, Maxime Philippe Frederic GENIN, Cong WU, Jing SU, Weixuan HU, Yi ZOU
  • Publication number: 20220035256
    Abstract: A method of hot spot ranking for a patterning process. The method includes obtaining (i) a set of hot spots of a patterning process, (ii) measured values of one or more parameters of the patterning process corresponding to the set of hot spots, and (ii) simulated values of the one or more parameters of the patterning process corresponding to the set of hot spots; determining a measurement feedback based on the measured values and the simulated values of the one or more parameters of the patterning process; and determining, via simulation of a process model of the patterning process, a ranking of a hot spot within the set of hot spots based on the measurement feedback.
    Type: Application
    Filed: September 20, 2019
    Publication date: February 3, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Youping ZHANG, Weixuan HU, Fei YAN, Wei PENG, Vivek Kumar JAIN