Patents by Inventor Wen-Hao Ching
Wen-Hao Ching has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11929434Abstract: A switch device includes a P-type substrate, a first gate structure, a first N-well, a shallow trench isolation structure, a first P-well, a second gate structure, a first N-type doped region, a second P-well, and a second N-type doped region. The first N-well is formed in the P-type substrate and partly under the first gate structure. The shallow trench isolation structure is formed in the first N-well and under the first gate structure. The first P-well is formed in the P-type substrate and under the first gate structure. The first N-type doped region is formed in the P-type substrate and between the first gate structure and the second gate structure. The second P-well is formed in the P-type substrate and under the second gate structure. The second N-type doped region is formed in the second P-well and partly under the second gate structure.Type: GrantFiled: April 15, 2022Date of Patent: March 12, 2024Assignee: eMemory Technology Inc.Inventors: Chih-Hsin Chen, Shih-Chen Wang, Tsung-Mu Lai, Wen-Hao Ching, Chun-Yuan Lo, Wei-Chen Chang
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Publication number: 20220246758Abstract: A switch device includes a P-type substrate, a first gate structure, a first N-well, a shallow trench isolation structure, a first P-well, a second gate structure, a first N-type doped region, a second P-well, and a second N-type doped region. The first N-well is formed in the P-type substrate and partly under the first gate structure. The shallow trench isolation structure is formed in the first N-well and under the first gate structure. The first P-well is formed in the P-type substrate and under the first gate structure. The first N-type doped region is formed in the P-type substrate and between the first gate structure and the second gate structure. The second P-well is formed in the P-type substrate and under the second gate structure. The second N-type doped region is formed in the second P-well and partly under the second gate structure.Type: ApplicationFiled: April 15, 2022Publication date: August 4, 2022Applicant: eMemory Technology Inc.Inventors: Chih-Hsin Chen, Shih-Chen Wang, Tsung-Mu Lai, Wen-Hao Ching, Chun-Yuan Lo, Wei-Chen Chang
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Patent number: 11335805Abstract: A switch device includes a P-type substrate, a first gate structure, a first N-well, a shallow trench isolation structure, a first P-well, a second gate structure, a first N-type doped region, a second P-well, and a second N-type doped region. The first N-well is formed in the P-type substrate and partly under the first gate structure. The shallow trench isolation structure is formed in the first N-well and under the first gate structure. The first P-well is formed in the P-type substrate and under the first gate structure. The first N-type doped region is formed in the P-type substrate and between the first gate structure and the second gate structure. The second P-well is formed in the P-type substrate and under the second gate structure. The second N-type doped region is formed in the second P-well and partly under the second gate structure.Type: GrantFiled: September 8, 2020Date of Patent: May 17, 2022Assignee: eMemory Technology Inc.Inventors: Chih-Hsin Chen, Shih-Chen Wang, Tsung-Mu Lai, Wen-Hao Ching, Chun-Yuan Lo, Wei-Chen Chang
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Patent number: 11164880Abstract: A multi-time programming non-volatile memory includes a select transistor, a floating gate transistor, a switch transistor, a capacitor and an erase gate element. The select transistor is connected with a select line and a source line. The floating gate transistor includes a floating gate. The floating gate transistor is connected with the select transistor. The switch transistor is connected with a word line, the floating gate transistor and a bit line. A first terminal of the capacitor is connected with the floating gate. A second terminal of the capacitor is connected with a control line. The erase gate element includes the floating gate, a gate oxide layer and a p-type region. The erase gate element is connected with an erase line. The floating gate of the erase gate element at least includes an n-type floating gate part.Type: GrantFiled: March 29, 2019Date of Patent: November 2, 2021Assignee: EMEMORY TECHNOLOGY INC.Inventors: Chun-Yuan Lo, Shih-Chen Wang, Wen-Hao Ching, Chih-Hsin Chen, Wei-Ren Chen
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Publication number: 20210074855Abstract: A switch device includes a P-type substrate, a first gate structure, a first N-well, a shallow trench isolation structure, a first P-well, a second gate structure, a first N-type doped region, a second P-well, and a second N-type doped region. The first N-well is formed in the P-type substrate and partly under the first gate structure. The shallow trench isolation structure is formed in the first N-well and under the first gate structure. The first P-well is formed in the P-type substrate and under the first gate structure. The first N-type doped region is formed in the P-type substrate and between the first gate structure and the second gate structure. The second P-well is formed in the P-type substrate and under the second gate structure. The second N-type doped region is formed in the second P-well and partly under the second gate structure.Type: ApplicationFiled: September 8, 2020Publication date: March 11, 2021Inventors: Chih-Hsin Chen, Shih-Chen Wang, Tsung-Mu Lai, Wen-Hao Ching, Chun-Yuan Lo, Wei-Chen Chang
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Publication number: 20200006508Abstract: A multi-time programming non-volatile memory includes a select transistor, a floating gate transistor, a switch transistor, a capacitor and an erase gate element. The select transistor is connected with a select line and a source line. The floating gate transistor includes a floating gate. The floating gate transistor is connected with the select transistor. The switch transistor is connected with a word line, the floating gate transistor and a bit line. A first terminal of the capacitor is connected with the floating gate. A second terminal of the capacitor is connected with a control line. The erase gate element includes the floating gate, a gate oxide layer and a p-type region. The erase gate element is connected with an erase line. The floating gate of the erase gate element at least includes an n-type floating gate part.Type: ApplicationFiled: March 29, 2019Publication date: January 2, 2020Inventors: Chun-Yuan LO, Shih-Chen WANG, Wen-Hao CHING, Chih-Hsin CHEN, Wei-Ren CHEN
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Patent number: 10255980Abstract: A memory array includes a plurality of memory pages, each memory page includes a plurality of memory cells, and each memory cell includes a floating gate module, a control element, and an erase element. The floating gate module is disposed in a first well, the erase element is disposed in a second well, and the control element is disposed in a third well. The first well, the second well and the third well are disposed in a deep doped region, and memory cells of the plurality of memory pages are all disposed in the deep doped region. Therefore, the spacing rule between deep doped regions is no longer be used to limit the circuit area of the memory array and the circuit area of the memory array can be reduced.Type: GrantFiled: February 26, 2018Date of Patent: April 9, 2019Assignee: eMemory Technology Inc.Inventors: Tsung-Mu Lai, Wen-Hao Ching, Chen-Hao Po
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Patent number: 10224108Abstract: A non-volatile memory includes a first memory cell. The first memory cell includes five transistors and a first capacitor. The first transistor includes a first gate, a first terminal and a second terminal. The second transistor includes a second gate, a third terminal and a fourth terminal. The third transistor includes a third gate, a fifth terminal and a sixth terminal. The fourth transistor includes a fourth gate, a seventh terminal and an eighth terminal. The fifth transistor includes a fifth gate, a ninth terminal and a tenth terminal. The first capacitor is connected between the third gate and a control line. The third gate is a floating gate. The second terminal is connected with the third terminal. The fourth terminal is connected with the fifth terminal. The sixth terminal is connected with the seventh terminal. The eighth terminal is connected with the ninth terminal.Type: GrantFiled: January 3, 2018Date of Patent: March 5, 2019Assignee: EMEMORY TECHNOLOGY INC.Inventors: Wen-Hao Ching, Shih-Chen Wang
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Patent number: 10181342Abstract: A method for improving a program speed of a memory includes acquiring a program level of the memory, comparing the program level of the memory with a valid level and a target level for generating a comparison result, and entering a first loop and/or a second loop for setting a program voltage of the memory according to the comparison result.Type: GrantFiled: November 3, 2017Date of Patent: January 15, 2019Assignee: eMemory Technology Inc.Inventors: Chun-Yuan Lo, Shih-Chen Wang, Wen-Hao Ching, Chun-Chieh Chao
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Publication number: 20180315462Abstract: A method for improving a program speed of a memory includes acquiring a program level of the memory, comparing the program level of the memory with a valid level and a target level for generating a comparison result, and entering a first loop and/or a second loop for setting a program voltage of the memory according to the comparison result.Type: ApplicationFiled: November 3, 2017Publication date: November 1, 2018Inventors: Chun-Yuan Lo, Shih-Chen Wang, Wen-Hao Ching, Chun-Chieh Chao
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Publication number: 20180197872Abstract: A non-volatile memory includes a first memory cell. The first memory cell includes five transistors and a first capacitor. The first transistor includes a first gate, a first terminal and a second terminal. The second transistor includes a second gate, a third terminal and a fourth terminal. The third transistor includes a third gate, a fifth terminal and a sixth terminal. The fourth transistor includes a fourth gate, a seventh terminal and an eighth terminal. The fifth transistor includes a fifth gate, a ninth terminal and a tenth terminal. The first capacitor is connected between the third gate and a control line. The third gate is a floating gate. The second terminal is connected with the third terminal. The fourth terminal is connected with the fifth terminal. The sixth terminal is connected with the seventh terminal. The eighth terminal is connected with the ninth terminal.Type: ApplicationFiled: January 3, 2018Publication date: July 12, 2018Inventors: Wen-Hao CHING, Shih-Chen Wang
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Publication number: 20180190357Abstract: A memory array includes a plurality of memory pages, each memory page includes a plurality of memory cells, and each memory cell includes a floating gate module, a control element, and an erase element. The floating gate module is disposed in a first well, the erase element is disposed in a second well, and the control element is disposed in a third well. The first well, the second well and the third well are disposed in a deep doped region, and memory cells of the plurality of memory pages are all disposed in the deep doped region. Therefore, the spacing rule between deep doped regions is no longer be used to limit the circuit area of the memory array and the circuit area of the memory array can be reduced.Type: ApplicationFiled: February 26, 2018Publication date: July 5, 2018Inventors: Tsung-Mu Lai, Wen-Hao Ching, Chen-Hao Po
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Patent number: 9941011Abstract: A memory array includes a plurality of memory pages, each memory page includes a plurality of memory cells, and each memory cell includes a floating gate module, a control element, and an erase element. The floating gate module is disposed in a first well, the erase element is disposed in a second well, and the control element is disposed in a third well. The first well, the second well and the third well are disposed in a deep doped region, and memory cells of the plurality of memory pages are all disposed in the deep doped region. Therefore, the spacing rule between deep doped regions is no longer be used to limit the circuit area of the memory array and the circuit area of the memory array can be reduced.Type: GrantFiled: November 16, 2016Date of Patent: April 10, 2018Assignee: eMemory Technology Inc.Inventors: Tsung-Mu Lai, Wen-Hao Ching, Chen-Hao Po
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Patent number: 9792993Abstract: A memory cell includes a read transistor, a first floating gate transistor, a program transistor, a second floating gate transistor, and a common floating gate. The common floating gate is coupled to the second floating gate transistor and the first floating gate transistor. The memory cell is programmed and erased through the common floating gate on the second floating gate transistor, and is read through the first floating gate transistor and the read transistor.Type: GrantFiled: January 16, 2017Date of Patent: October 17, 2017Assignee: eMemory Technology Inc.Inventors: Chun-Yuan Lo, Shih-Chen Wang, Wen-Hao Ching
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Publication number: 20170206968Abstract: A memory array includes a plurality of memory pages, each memory page includes a plurality of memory cells, and each memory cell includes a floating gate module, a control element, and an erase element. The floating gate module is disposed in a first well, the erase element is disposed in a second well, and the control element is disposed in a third well. The first well, the second well and the third well are disposed in a deep doped region, and memory cells of the plurality of memory pages are all disposed in the deep doped region. Therefore, the spacing rule between deep doped regions is no longer be used to limit the circuit area of the memory array and the circuit area of the memory array can be reduced.Type: ApplicationFiled: November 16, 2016Publication date: July 20, 2017Inventors: Tsung-Mu Lai, Wen-Hao Ching, Chen-Hao Po
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Publication number: 20170206969Abstract: A memory cell includes a read transistor, a first floating gate transistor, a program transistor, a second floating gate transistor, and a common floating gate. The common floating gate is coupled to the second floating gate transistor and the first floating gate transistor. The memory cell is programmed and erased through the common floating gate on the second floating gate transistor, and is read through the first floating gate transistor and the read transistor.Type: ApplicationFiled: January 16, 2017Publication date: July 20, 2017Inventors: Chun-Yuan Lo, Shih-Chen Wang, Wen-Hao Ching
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Patent number: 9666279Abstract: A non-volatile memory has an array of non-volatile memory cells. Each of the non-volatile memory cells includes a coupling device formed on a first well, a read device, a floating gate device formed on a second well and coupled to the coupling device, a program device formed on the second well, and an erase device formed on a third well and coupled to the first floating gate device. The read device, the program device, and the erase device are formed on separate wells so as to separate the cycling counts of a read operation, a program operation and an erase operation of the non-volatile memory cell.Type: GrantFiled: June 26, 2016Date of Patent: May 30, 2017Assignee: eMemory Technology Inc.Inventors: Wen-Hao Ching, Yen-Hsin Lai, Shih-Chen Wang
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Patent number: 9633729Abstract: A non-volatile memory has an array of non-volatile memory cells. Each of the non-volatile memory cells includes a coupling device formed on a first well, a read device, a floating gate device formed on a second well and coupled to the coupling device, a program device formed on the second well, and an erase device formed on a third well and coupled to the first floating gate device. The read device, the program device, and the erase device are formed on separate wells so as to separate the cycling counts of a read operation, a program operation and an erase operation of the non-volatile memory cell.Type: GrantFiled: October 7, 2015Date of Patent: April 25, 2017Assignee: eMemory Technology Inc.Inventors: Wen-Hao Ching, Yen-Hsin Lai, Shih-Chen Wang
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Publication number: 20160307629Abstract: A non-volatile memory has an array of non-volatile memory cells. Each of the non-volatile memory cells includes a coupling device formed on a first well, a read device, a floating gate device formed on a second well and coupled to the coupling device, a program device formed on the second well, and an erase device formed on a third well and coupled to the first floating gate device. The read device, the program device, and the erase device are formed on separate wells so as to separate the cycling counts of a read operation, a program operation and an erase operation of the non-volatile memory cell.Type: ApplicationFiled: June 26, 2016Publication date: October 20, 2016Inventors: Wen-Hao Ching, Yen-Hsin Lai, Shih-Chen Wang
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Patent number: 9466392Abstract: A memory array includes a first memory page and a second memory page. The first memory page includes a first word line, a first select gate line, a first control line, a first erase line, and a plurality of first memory cells each coupled to the first word line, the first select gate line, the first control line, and the first erase line, and for receiving a bit line signal and a source line signal. The second memory page includes a second control line, a second erase line, and a plurality of second memory cells each coupled to the first word line, the first select gate line, the second control line, and the second erase line, and for receiving a bit line signal and a source line signal.Type: GrantFiled: October 13, 2015Date of Patent: October 11, 2016Assignee: eMemory Technology Inc.Inventors: Wei-Chen Chang, Wen-Hao Ching, Chih-Hsin Chen, Shih-Chen Wang, Ching-Sung Yang