Patents by Inventor Wen-Hsien LIAO

Wen-Hsien LIAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240170385
    Abstract: A semiconductor package device is provided. The semiconductor package device includes a chip and a redistribution layer disposed on the chip and electrically connected to the chip. The redistribution layer includes a plurality of first metal lines and a plurality of second metal lines, wherein at least one of the second metal lines is disposed between two adjacent first metal lines. The included angle between the at least one of the second metal lines and the two adjacent first metal lines is greater than or equal to 0 degrees and less than or equal to 10 degrees. The first width of one of the two adjacent first metal lines is greater than the second width of the at least one of the second metal lines.
    Type: Application
    Filed: December 22, 2022
    Publication date: May 23, 2024
    Inventors: Te-Hsun LIN, Wen-Hsiang LIAO, Mei-Yen CHEN, Ming-Hsien SHIH, Yung-Feng CHEN, Cheng-Chi WANG
  • Publication number: 20240153860
    Abstract: An electronic device is provided. The electronic device includes a redistribution structure, an electronic unit and a first conductive pad. The first conductive pad is disposed between the redistribution structure and the electronic unit. The electronic unit is electrically connected to the redistribution structure through the first conductive pad. The first conductive pad has a first coefficient of thermal expansion and a first Young's modulus. The first coefficient of thermal expansion and the first Young's modulus conform to the following formula: 0.7×(0.0069E2?1.1498E+59.661)?CTE?1.3×(0.0069E2?1.1498E+59.661), wherein CTE is the first coefficient of thermal expansion, and E is the first Young's modulus in the formula.
    Type: Application
    Filed: December 21, 2022
    Publication date: May 9, 2024
    Inventors: Te-Hsun LIN, Wen-Hsiang LIAO, Yung-Feng CHEN, Ming-Hsien SHIH
  • Patent number: 11978511
    Abstract: A phase-change memory (PCM) cell is provided to include a first electrode, a second electrode, and a phase-change feature disposed between the first electrode and the second electrode. The phase-change feature is configured to change its data state based on a write operation performed on the PCM cell. The write operation includes a reset stage and a set stage. In the reset stage, a plurality of reset current pulses are applied to the PCM cell, and the reset current pulses have increasing current amplitudes. In the set stage, a plurality of set current pulses are applied to the PCM cell, and the set current pulses exhibit an increasing trend in current amplitude. The current amplitudes of the set current pulses are smaller than those of the reset current pulses.
    Type: Grant
    Filed: January 21, 2022
    Date of Patent: May 7, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yung-Huei Lee, Chun-Wei Chang, Jian-Hong Lin, Wen-Hsien Kuo, Pei-Chun Liao, Chih-Hung Nien
  • Publication number: 20240145370
    Abstract: A semiconductor device includes a first region and a second region, and the second region surrounds the first region. The semiconductor device includes at least one electronic unit, a redistribution structure, a plurality of first pads, and a plurality of second pads. The redistribution structure may be electrically connected to at least one electronic unit. A plurality of first pads are arranged on the redistribution structure and correspondingly to the first region. There is a first pitch between two adjacent first pads. A plurality of second pads are arranged on the redistribution structure and correspondingly to the second region. There is a second pitch between two adjacent second pads, so that the first pitch is smaller than the second pitch.
    Type: Application
    Filed: December 18, 2022
    Publication date: May 2, 2024
    Applicant: InnoLux Corporation
    Inventors: Te-Hsun LIN, Wen-Hsiang LIAO, Ming-Hsien SHIH, Yung-Feng CHEN, Cheng-Chi WANG
  • Patent number: 10617226
    Abstract: A supporting apparatus of a chair includes a frame, two fabrics, two liners and a cushion. The frame is formed with two grooves extending along the frame. The depth of each of the internal and external grooves is larger than the width of the same. Each of the fabrics includes a wrapper extending around a contact portion and wrapping one of the liners. The wrapper of each of the fabrics and the corresponding liner are fitted in one of the grooves so that the contact portion of the fabric is stressed. The cushion is sandwiched between the contact portions of the fabrics.
    Type: Grant
    Filed: January 7, 2019
    Date of Patent: April 14, 2020
    Inventor: Wen Hsien Liao
  • Publication number: 20180334604
    Abstract: A slurry for manufacturing a graphene sheet combining graphite flake structure includes a solvent, a graphite nanoplatelet material and a graphene material. The graphite nanoplatelet material includes a plurality of graphite nanoplatelets. The graphene material comprising a plurality of graphenes. The graphite nanoplatelet material and the graphene material is mixed in the solvent, a weight percentage of the graphite nanoplatelet material is between 0.1% and 10%, and the content of the graphene material is between 1% and 80% of the graphite nanoplatelet material.
    Type: Application
    Filed: July 27, 2018
    Publication date: November 22, 2018
    Inventors: Tung CHOU, Feng-Yu WU, Chih-Chieh CHAN, Wen-Hsien LIAO, Hsiu-Pin CHANG, Lain-Jong LI, Jonathan ROSS
  • Patent number: 10066141
    Abstract: A graphene sheet combining graphite flake structure includes a graphite nanoplatelet material and a graphene material. The graphene material is mixed in the graphite nanoplatelet material, and the content of the graphene material is between 1% and 80% of the graphite nanoplatelet material. A slurry for manufacturing the graphene sheet combining graphite flake structure and a manufacturing method for the graphene sheet combining graphite flake structure are also disclosed.
    Type: Grant
    Filed: September 2, 2016
    Date of Patent: September 4, 2018
    Assignee: Nitronix International Holdings Limited
    Inventors: Tung Chou, Feng-Yu Wu, Chih-Chieh Chan, Wen-Hsien Liao, Hsiu-Pin Chang, Lain-Jong Li, Jonathan Ross
  • Publication number: 20170058176
    Abstract: A graphene sheet combining graphite flake structure includes a graphite nanoplatelet material and a graphene material. The graphene material is mixed in the graphite nanoplatelet material, and the content of the graphene material is between 1% and 80% of the graphite nanoplatelet material. A slurry for manufacturing the graphene sheet combining graphite flake structure and a manufacturing method for the graphene sheet combining graphite flake structure are also disclosed.
    Type: Application
    Filed: September 2, 2016
    Publication date: March 2, 2017
    Inventors: Tung CHOU, Feng-Yu WU, Chih-Chieh CHAN, Wen-Hsien LIAO, Hsiu-Pin CHANG, Lain-Jong LI, Jonathan ROSS