Abstract: An illuminating device comprises a light source, a lens holder, and a spherical modulator. The lens holder has a concave part and a blocking part surrounding the concave part. The concave part has an aperture on the bottom. The spherical modulator contains materials having refractive indexes ranging from 1.3 to 2.7. The lens holder is located between the light source and the spherical modulator. The spherical modulator is disposed on the concave part of the lens holder and covers the aperture. The light source provides light towards the aperture. The light source and the aperture are aligned to an optical axis of the spherical modulator.

Abstract: A bubble atomizer includes a cartridge having an open end, a liquid absorbing member provided inside the cartridge, a firing chamber covering the open end and formed with liquid outlets and liquid inlets through which liquid enters the firing chamber from the cartridge, and heaters mounted inside the firing chamber. The heaters are connected with a power electronics unit through a cable. Each heater has a thickness in micron to sub-micron scale. When a pulse signal generated is applied to the heaters, current generated heats up the heaters and vapor bubbles are formed on the heaters that generate pressure and push the liquid out of the firing chamber through the liquid outlets to thereby form droplets.

Abstract: A bubble atomizer includes a cartridge having an open end, a liquid absorbing member provided inside the cartridge, a firing chamber covering the open end and formed with liquid outlets and liquid inlets through which liquid enters the firing chamber from the cartridge, and heaters mounted inside the firing chamber. The heaters are connected with a power electronics unit through a cable. Each heater has a thickness in micron to sub-micron scale. When a pulse signal generated is applied to the heaters, current generated heats up the heaters and vapor bubbles are formed on the heaters that generate pressure and push the liquid out of the firing chamber through the liquid outlets to thereby form droplets.

Abstract: An integrated circuit, or microelectromechanical structure is defined onto a contour surface by utilizing a flexible mask upon which photolithographic patterns are first defined using conventional planar photolithographic techniques. The contour surface is provided with a thin film uniformly distributed on the surface and then the flexible mask is aligned with the contour substrate. Alignments are made through multiple stages of yaw alignment, translation alignment and rotational alignment. Once the mask is aligned with contour substrate it is then subjected while rotating to developing field, such as uniform illumination of ultraviolet light shining on the side of the contour substrate as it is rotated in the illumination field. The developed photoresist layer disposed on the surface of the contour substrate is thus developed and the underlying film etched according to the patterned mask in a manner similar to a conventional planar photolithography.