Abstract: The present invention discloses a two-stage locating device and the method thereof. In stage-one, the preliminary locating device finds the approximate area of the locking hole encircled with the magnetic material on the intramedullary nail. In stage-two, the pinpoint device has a plurality of targeting devices and includes a transparent plate with a plurality of alignment lines. According to the deviations between each pointing device and the alignment lines, the direction of the pinpoint device for further adjustment can be determined. The present invention can determine the position and the orientation of the locking hole on the intramedullary nail quickly and precisely to shorten the time spent to implant the intramedullary nail. Furthermore, the present invention can also have a conductive circuit to connect to an alarm device. Thus, the precise location can be determined through the different alarm signals based on the contact conditions between each directing devices and the conductive circuit.

Abstract: A magnetic bead-based digital microfluidic immunoanalysis device and a method thereof are provided, which includes a lower plate, an upper plate disposed above the lower plate, a separating structure therebetween and a magnet disposed on the upper plate or the lower plate. The lower plate includes a first electrode layer including a plurality of channel electrodes with different sizes. A droplet containing few magnetic beads is adapted to be disposed on the lower plate and corresponding to the channel electrodes. The magnet attracts the magnetic beads to approach to the smaller one of the channel electrodes though a magnetic force, and when a voltage is applied to the first electrode layer, the droplet is divided to a detection portion with the magnetic beads and a waste-liquid portion without the magnetic beads respectively corresponding to the smaller one and the larger one of the channel electrodes through a dual-direction electrowetting-on-dielectric force.

Abstract: A magnetic bead-based digital microfluidic immunoanalysis device and a method thereof are provided, which includes a lower plate, an upper plate disposed above the lower plate, a separating structure therebetween and a magnet disposed on the upper plate or the lower plate. The lower plate includes a first electrode layer including a plurality of channel electrodes with different sizes. A droplet containing few magnetic beads is adapted to be disposed on the lower plate and corresponding to the channel electrodes. The magnet attracts the magnetic beads to approach to the smaller one of the channel electrodes though a magnetic force, and when a voltage is applied to the first electrode layer, the droplet is divided to a detection portion with the magnetic beads and a waste-liquid portion without the magnetic beads respectively corresponding to the smaller one and the larger one of the channel electrodes through a dual-direction electrowetting-on-dielectric force.

Abstract: The present invention discloses a two-stage locating device and the method thereof. In stage-one, the preliminary locating device finds the approximate area of the locking hole encircled with the magnetic material on the intramedullary nail. In stage-two, the pinpoint device has a plurality of targeting devices and includes a transparent plate with a plurality of alignment lines. According to the deviations between each pointing device and the alignment lines, the direction of the pinpoint device for further adjustment can be determined. The present invention can determine the position and the orientation of the locking hole on the intramedullary nail quickly and precisely to shorten the time spent to implant the intramedullary nail. Furthermore, the present invention can also have a conductive circuit to connect to an alarm device. Thus, the precise location can be determined through the different alarm signals based on the contact conditions between each directing devices and the conductive circuit.

Abstract: The present invention relates to process for fabricating supersphere solid immersion lens (SSIL). The procedure of the present invention comprises the steps of: firstly, coating a positive photoresist layer on a substrate, followed by first exposure and second exposure with different exposure dose separately by first mask and second mask to form the positive photoresist structure with different dimensions and depths. The first exposure dose is supplied enough to make sure the patterns of the first mask can be observed on the positive photoresist layer during the alignment of the second exposure process. And the following reflow process forms a supersphere solid immersion lens (SSIL) structure.

Abstract: The present invention relates to a Microelectro mechanical system structure. More specifically the invention relates to utilize a sacrificial layer to fabricate an air bearing structure, followed by forming an aperture, and reducing the aperture to nano-scale by electroplating. And then, by using of two thick film photoresist films for twice electroplating fabrication, for fabricate metal microcoils having high aspect ratio structure and interconnection metal line, to achieve efficiencies of utilizing area and reducing resistance. Moreover, proceed lithography depends on different portions and exposure dose.

Abstract: The present invention relates to a Microelectro mechanical system structure. More specifically the invention relates to utilize a sacrificial layer to fabricate an air bearing structure, followed by forming an aperture, and reducing the aperture to nano-scale by electroplating. And then, by using of two thick film photoresist films for twice electroplating fabrication, for fabricate metal microcoils having high aspect ratio structure and interconnection metal line, to achieve efficiencies of utilizing area and reducing resistance. Moreover, proceed lithography depends on different portions and exposure dose.

Abstract: The present invention relates to process for fabricating supersphere solid immersion lens (SSIL). The procedure of the present invention comprises the steps of: firstly, coating a positive photoresist layer on a substrate, followed by first exposure and second exposure with different exposure dose separately by first mask and second mask to form the positive photoresist structure with different dimensions and depths. The first exposure dose is supplied enough to make sure the patterns of the first mask can be observed on the positive photoresist layer during the alignment of the second exposure process. And the following reflow process forms a supersphere solid immersion lens (SSIL) structure.

Abstract: The invention relates to an integrated method for manufacturing a combined solid immersion lens (SIL) and submicron aperture, and device thereof, comprising depositing a sacrificial layer on a substrate, coating a photoresist on the sacrificial layer and using photo-lithography to form an aperture on the photoresist, applying reflow and etching process to remove the sacrificial layer below the aperture, depositing a conductive material on the photoresist and performing electroplating to reduce the aperture size, then coating another photoresist and using photo-lithography to form a cylindrical phtoresist above the aperture, applying a high temperature thermal reflow to form a microlens, and finally removing the substrate to obtain an optical read/write apparatus with a combined solid immersion lens (SIL) and submicron aperture.

Abstract: The invention relates to an integrated method for manufacturing a combined solid immersion lens (SIL) and submicron aperture, and device thereof, comprising depositing a sacrificial layer on a substrate, coating a photoresist on the sacrificial layer and using photo-lithography to form an aperture on the photoresist, applying reflow and etching process to remove the sacrificial layer below the aperture, depositing a conductive material on the photoresist and performing electroplating to reduce the aperture size, then coating another photoresist and using photo-lithography to form a cylindrical phtoresist above the aperture, applying a high temperature thermal reflow to form a microlens, and finally removing the substrate to obtain an optical read/write apparatus with a combined solid immersion lens (SIL) and submicron aperture.