Patents by Inventor Wen Yin

Wen Yin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11976091
    Abstract: The present disclosure relates generally to terpene glycosides, such as certain such compounds extracted from Stevia rebaudiana Bertoni, Rubus suavissimus, or Siraitia grosvenorii. The disclosure also provides for the use of such compounds as food ingredients, flavors, and sweeteners, and related methods. The disclosure also provides ingestible compositions comprising such compounds, as well as processes for extracting such compounds selectively from certain plant sources.
    Type: Grant
    Filed: September 25, 2019
    Date of Patent: May 7, 2024
    Assignee: Firmenich SA
    Inventors: Dan-Ting Yin, Yi-Min Wang, Xian-Wen Gan
  • Publication number: 20240125849
    Abstract: An RF testing method is applied between a testing instrument and multiple devices under test at least including a first DUT and a second DUT. The testing instrument includes a signal generator and a signal analyzer. A sync signal is sent to the testing instrument and the first DUT, so that the first DUT occupies the signal generator to receive a testing signal from the signal generator. The first DUT sends an uplink signal to the signal analyzer based on the testing signal to occupy the signal analyzer for signal analysis at a first point in time. The sync signal is sent to the testing instrument and the second DUT, so that the second DUT occupies the signal generator to receive the testing signal from the signal generator at a second point in time. The first point in time is parallel to the second point in time.
    Type: Application
    Filed: March 8, 2023
    Publication date: April 18, 2024
    Inventors: Jung-Yin CHIEN, Po-Yen TSENG, Pin-Lin HUANG, Wen-Chih CHEN
  • Publication number: 20240120388
    Abstract: Provided are structures and methods for forming structures with sloping surfaces of a desired profile. An exemplary method includes performing a first etch process to differentially etch a gate material to a recessed surface, wherein the recessed surface includes a first horn at a first edge, a second horn at a second edge, and a valley located between the first horn and the second horn; depositing an etch-retarding layer over the recessed surface, wherein the etch-retarding layer has a central region over the valley and has edge regions over the horns, and wherein the central region of the etch-retarding layer is thicker than the edge regions of the etch-retarding layer; and performing a second etch process to recess the horns to establish the gate material with a desired profile.
    Type: Application
    Filed: January 18, 2023
    Publication date: April 11, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Li-Wei Yin, Tzu-Wen Pan, Yu-Hsien Lin, Jih-Sheng Yang, Shih-Chieh Chao, Chia Ming Liang, Yih-Ann Lin, Ryan Chia-Jen Chen
  • Patent number: 11955553
    Abstract: Embodiments disclosed herein relate to using an implantation process and a melting anneal process performed on a nanosecond scale to achieve a high surface concentration (surface pile up) dopant profile and a retrograde dopant profile simultaneously. In an embodiment, a method includes forming a source/drain structure in an active area on a substrate, the source/drain structure including a first region comprising germanium, implanting a first dopant into the first region of the source/drain structure to form an amorphous region in at least the first region of the source/drain structure, implanting a second dopant into the amorphous region containing the first dopant, and heating the source/drain structure to liquidize and convert at least the amorphous region into a crystalline region, the crystalline region containing the first dopant and the second dopant.
    Type: Grant
    Filed: February 24, 2023
    Date of Patent: April 9, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Su-Hao Liu, Kuo-Ju Chen, Wen-Yen Chen, Ying-Lang Wang, Liang-Yin Chen, Li-Ting Wang, Huicheng Chang
  • Publication number: 20240113112
    Abstract: Methods of cutting gate structures and fins, and structures formed thereby, are described. In an embodiment, a substrate includes first and second fins and an isolation region. The first and second fins extend longitudinally parallel, with the isolation region disposed therebetween. A gate structure includes a conformal gate dielectric over the first fin and a gate electrode over the conformal gate dielectric. A first insulating fill structure abuts the gate structure and extends vertically from a level of an upper surface of the gate structure to at least a surface of the isolation region. No portion of the conformal gate dielectric extends vertically between the first insulating fill structure and the gate electrode. A second insulating fill structure abuts the first insulating fill structure and an end sidewall of the second fin. The first insulating fill structure is disposed laterally between the gate structure and the second insulating fill structure.
    Type: Application
    Filed: December 1, 2023
    Publication date: April 4, 2024
    Inventors: Ryan Chia-Jen Chen, Cheng-Chung Chang, Shao-Hua Hsu, Yu-Hsien Lin, Ming-Ching Chang, Li-Wei Yin, Tzu-Wen Pan, Yi-Chun Chen
  • Patent number: 11948920
    Abstract: Provided are a semiconductor device and a method for manufacturing the same, and a semiconductor package. The semiconductor device includes a die stack and a cap substrate. The die stack includes a first die, second dies stacked on the first die, and a third die stacked on the second dies. The first die includes first through semiconductor vias. Each of the second dies include second through semiconductor vias. The third die includes third through semiconductor vias. The cap substrate is disposed on the third die of the die stack. A sum of a thickness of the third die and a thickness of the cap substrate ranges from about 50 ?m to about 80 ?m.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: April 2, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: I-Chun Hsu, Yan-Zuo Tsai, Chia-Yin Chen, Yang-Chih Hsueh, Yung-Chi Lin, Tsang-Jiuh Wu, Wen-Chih Chiou
  • Patent number: 11939431
    Abstract: The present invention relates to a composition comprising an amino acid-modified polymer, a carboxypolysaccharide, and may further include a metal ion for anti-adhesion and vector application. More specifically, the invention relates to a thermosensitive composition having enhanced mechanical and improved water-erosion resistant properties for efficiently preventing tissue adhesions and can serve as a vector with bio-compatible, bio-degradable/absorbable, and in-vivo sustainable properties.
    Type: Grant
    Filed: April 23, 2021
    Date of Patent: March 26, 2024
    Assignee: PROVIEW-MBD BIOTECH CO., LTD.
    Inventors: Yu-Chia Chang, Yunn-Kuen Chang, Wen-Yen Huang, Ging-Ho Hsiue, Hsieh-Chih Tsai, Shuian-Yin Lin, Nai-Sheng Hsu, Tzu-Yu Lin
  • Patent number: 11939432
    Abstract: Synthetic amino acid-modified polymers and methods of making the same and using the same are disclosed. The synthetic amino acid-modified polymers possess distinct thermosensitive, improved water-erosion resistant, and enhanced mechanical properties, and are suitable of reducing or preventing formation of postoperative tissue adhesions. Additionally, the amino acid-modified polymers can also be used as a vector to deliver pharmaceutically active agents.
    Type: Grant
    Filed: April 23, 2021
    Date of Patent: March 26, 2024
    Assignee: PROVIEW-MBD BIOTECH CO., LTD.
    Inventors: Yu-Chia Chang, Yunn-Kuen Chang, Wen-Yen Huang, Ging-Ho Hsiue, Hsieh-Chih Tsai, Shuian-Yin Lin, Nai-Sheng Hsu, Tzu-Yu Lin
  • Publication number: 20240096630
    Abstract: Disclosed is a semiconductor fabrication method. The method includes forming a gate stack in an area previously occupied by a dummy gate structure; forming a first metal cap layer over the gate stack; forming a first dielectric cap layer over the first metal cap layer; selectively removing a portion of the gate stack and the first metal cap layer while leaving a sidewall portion of the first metal cap layer that extends along a sidewall of the first dielectric cap layer; forming a second metal cap layer over the gate stack and the first metal cap layer wherein a sidewall portion of the second metal cap layer extends further along a sidewall of the first dielectric cap layer; forming a second dielectric cap layer over the second metal cap layer; and flattening a top layer of the first dielectric cap layer and the second dielectric cap layer using planarization operations.
    Type: Application
    Filed: January 12, 2023
    Publication date: March 21, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Li-Wei Yin, Tzu-Wen Pan, Yu-Hsien Lin, Yu-Shih Wang, Jih-Sheng Yang, Shih-Chieh Chao, Yih-Ann Lin, Ryan Chia-Jen Chen
  • Publication number: 20240089333
    Abstract: A method that includes collecting, by a computer, social network posts by social network friends of a user containing images. The method further includes identifying, by the computer, images within the social network posts containing the user through facial image recognition based on an image of the user in a user social network profile and determining, by the computer, information from the identified images containing the user within the social network posts for inclusion in the user social network profile. The method may further include updating, by the computer, the profile information of the user social network profile to include the information from the identified images containing the user within the social network posts.
    Type: Application
    Filed: November 21, 2023
    Publication date: March 14, 2024
    Inventors: Wen Wang, Yan Bin Fu, Shuang Yin Liu, Yi Wu, Qing Jun Gao
  • Publication number: 20240088225
    Abstract: A method includes forming a gate stack on a first portion of a semiconductor substrate, removing a second portion of the semiconductor substrate on a side of the gate stack to form a recess, growing a semiconductor region starting from the recess, implanting the semiconductor region with an impurity, and performing a melt anneal on the semiconductor region. At least a portion of the semiconductor region is molten during the melt anneal.
    Type: Application
    Filed: November 14, 2023
    Publication date: March 14, 2024
    Inventors: Su-Hao Liu, Wen-Yen Chen, Li-Heng Chen, Li-Ting Wang, Liang-Yin Chen, Huicheng Chang, Yee-Chia Yeo, Ying-Lang Wang
  • Publication number: 20240078441
    Abstract: A method for knowledge representation and deduction of service logic includes: generating, based on a knowledge representation model, a semantic graph corresponding to conceptual-layer service logic, where the semantic graph includes one or more types of nodes and edges for connecting the one or more types of nodes, and the nodes include at least a node of a variable type; generating, based on the semantic graph and a physical table to which a service object is mapped, an instance graph, where the instance graph includes the nodes and edges in the semantic graph; generating executable code based on a service logic relationship between the nodes in the instance graph; and determining, based on the executable code and a data instance corresponding to a node whose in-degree is 0 in the instance graph, a data instance corresponding to each node in the instance graph.
    Type: Application
    Filed: November 9, 2023
    Publication date: March 7, 2024
    Inventors: Rong Duan, Kangxing Hu, Wenwen Huang, Yuan Yuan, Wen Peng, Chunxi Liu, Qinjie Yang, Xiaoliang Yin, Shufan Li
  • Publication number: 20240074119
    Abstract: An immersion cooling system includes a pressure seal tank, an electronic apparatus, a pressure balance pipe and a relief valve. The pressure seal tank is configured to store coolant. A vapor space is formed in the pressure seal tank above the liquid level of the coolant. The electronic apparatus is completely immersed in the coolant. The pressure balance pipe has a gas collection length. The first port of the pressure balance pipe is disposed on the top surface of the pressure seal tank. The relief valve is disposed on the second port of the pressure balance pipe. The second port is farther away from the top surface of the pressure seal tank than the first port. The gas collection length of the pressure equalization tube allows the concentration of vaporized coolant at the first port to be greater than the concentration of vaporized coolant at the second port.
    Type: Application
    Filed: May 9, 2023
    Publication date: February 29, 2024
    Inventors: Ren-Chun CHANG, Wei-Chih LIN, Sheng-Chi WU, Wen-Yin TSAI, Li-Hsiu CHEN
  • Publication number: 20240072170
    Abstract: A semiconductor device is disclosed. The semiconductor device includes a semiconductor fin. The semiconductor device includes first spacers over the semiconductor fin. The semiconductor device includes a metal gate structure, over the semiconductor fin, that is sandwiched at least by the first spacers. The semiconductor device includes a gate electrode contacting the metal gate structure. An interface between the metal gate structure and the gate electrode has its side portions extending toward the semiconductor fin with a first distance and a central portion extending toward the semiconductor fin with a second distance, the first distance being substantially less than the second distance.
    Type: Application
    Filed: August 24, 2022
    Publication date: February 29, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Li-Wei Yin, Tzu-Wen Pan, Yu-Hsien Lin, Yu-Shih Wang, Yih-Ann Lin, Chia Ming Liang, Ryan Chia-Jen CHEN
  • Publication number: 20240047483
    Abstract: An array substrate includes an opening area and a non-opening area, and further includes a first substrate, a gate insulating layer, a first interlayer insulating layer, and a second interlayer insulating layer. The gate insulating layer is disposed on the first substrate and located in the opening area and the non-opening area. The first interlayer insulating layer is disposed on a side of the gate insulating layer away from the first substrate and located in the non-opening area. The second interlayer insulating layer is disposed on a side of the first interlayer insulating layer away from the first substrate and located in the opening area and the non-opening area. A projection of the first interlayer insulating layer on the first substrate is tangent to or separated from a projection of the opening area on the first substrate. A display panel includes the array substrate.
    Type: Application
    Filed: March 14, 2022
    Publication date: February 8, 2024
    Applicant: Wuhan China Star Optoelectronics Technology Co., Ltd.
    Inventor: Wen YIN
  • Publication number: 20230401459
    Abstract: An image inference method is provided by the present disclosure. The method includes determining a target collocation scheme for an image according to an inference request and a preset weight table, the target collocation scheme including a hardware accelerator in an idle state and an estimated time duration of inferring the image. A usage state of the hardware accelerator in the target collocation scheme is updated to be an in use state, and the image is inferred according to the target collocation scheme. When the inferring of the image is completed, the usage state of the hardware accelerator is updated from the in use state to be the idle state. Once an actual time duration of inferring the image is obtained, the estimated time duration is updated to be the actual time duration.
    Type: Application
    Filed: June 30, 2022
    Publication date: December 14, 2023
    Inventors: YUNG-CHING CHIEN, WEN-YIN WANG
  • Publication number: 20230389231
    Abstract: The present disclosure provides an immersion cooling system for a server cabinet including a plurality of server boxes, a cooling tank and a plurality of liquid connecting pipes. Each server box includes an electronic device immersed in the cooling liquid, and the electronic device generates a thermal energy so that part of the cooling liquid evaporates into a hot vapor. The cooling tank is connected to the plurality of server boxes and includes a condenser and a storage part. The condenser is connected to each server box and condenses the hot vapor to form the cooling liquid. The storage part storages the cooling liquid from the condenser. Two ends of the liquid connecting pipe is connected to the storage part and the server box respectively. The cooling liquid in the storage part and the cooling liquid of each server box are maintained in a same liquid level.
    Type: Application
    Filed: August 8, 2022
    Publication date: November 30, 2023
    Inventors: Li-Hsiu Chen, Ming-Tang Yang, Wei-Chih Lin, Peng-Yuan Chen, Sheng-Chi Wu, Ren-Chun Chang, Wen-Yin Tsai
  • Patent number: 11824128
    Abstract: A photocurrent-generating electrode includes a supporting substrate, a first nanoparticle layer, a second nanoparticle layer, and a semiconductor nanostructure formed on the second nanoparticle layer and having a biocompatible semiconductor nanomaterial. The first nanoparticle layer has first noble metal nanoparticles bonded to the supporting substrate. The second nanoparticle layer is formed on the first nanoparticle layer, and has second noble metal nanoparticles having an average dimension larger than an average dimension of the first noble metal nanoparticles. Two adjacent ones of the second noble metal nanoparticles are electrically connected to each other through one of the first noble metal nanoparticles.
    Type: Grant
    Filed: January 26, 2022
    Date of Patent: November 21, 2023
    Assignee: NATIONAL CHUNG-HSING UNIVERSITY
    Inventors: Kuan-Jiuh Lin, Wen-Yin Ko
  • Patent number: 11804428
    Abstract: Disclosed is a package and method of forming the package with a mixed pad size. The package includes a first set of pads having a first size and a first pitch, where the first set of pads are solder mask defined (SMD) pads. The package also includes a second set of pads having a second size and a second pitch, where the second set of pads are non-solder mask defined (NSMD) pads.
    Type: Grant
    Filed: November 13, 2020
    Date of Patent: October 31, 2023
    Assignee: QUALCOMM INCORPORATED
    Inventors: Wen Yin, Yonghao An, Manuel Aldrete
  • Publication number: 20230325276
    Abstract: Example error correction methods and apparatus are described. In one example method, a register controller detects an error existing in a memory, and after detecting an uncorrected error (UCE), obtains a memory address in which the UCE occurs. The register controller reads raw data from a location indicated by the memory address, stores preset first data in the location indicated by the memory address, and reads second data from the location after storing the first data in the location. The register controller compares the first data with the second data to determine a first failure location in the location, determines raw data stored in the first failure location from the raw data in the location, and performs error correction on the raw data stored in the first failure location.
    Type: Application
    Filed: June 1, 2023
    Publication date: October 12, 2023
    Inventors: Yuwei LI, Xu ZHANG, Wei LI, Kun ZHANG, Wen YIN