Patents by Inventor Wen-Yun Wang

Wen-Yun Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140272724
    Abstract: A system and method for photoresists is provided. In an embodiment a photoresist is developed. Once developed, the photoresist is slimmed using either a direct slimming technique or an indirect slimming technique. In a direct slimming technique the slimming agent is either an alkaline solution or a polar solvent. In the indirect slimming technique a hydrophobic material is diffused into the photoresist to form a modified region and the modified region is then removed.
    Type: Application
    Filed: March 15, 2013
    Publication date: September 18, 2014
    Inventors: Wen-Yun Wang, Cheng-Han Wu
  • Publication number: 20140273457
    Abstract: A system and method for anti-reflective layers is provided. In an embodiment the anti-reflective layer comprises a floating component in order to form a floating region along a top surface of the anti-reflective layer after the anti-reflective layer has dispersed. The floating component may be a floating cross-linking agent, a floating polymer resin, or a floating catalyst. The floating cross-linking agent, the floating polymer resin, or the floating catalyst may comprise a fluorine atom.
    Type: Application
    Filed: October 17, 2013
    Publication date: September 18, 2014
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yu-Chung Su, Ching-Yu Chang, Wen-Yun Wang
  • Publication number: 20140255851
    Abstract: A system and method for reducing defects in photoresist processing is provided. An embodiment comprises cleaning the photoresist after development using an alkaline environment. The alkaline environment may comprise a neutral solvent and an alkaline developer. The alkaline environment will modify the attraction between residue leftover from development and a surface of the photoresist such that the surfaces repel each other, making the removal of the residue easier. By removing more residue, there will be fewer defects in the photolithographic process.
    Type: Application
    Filed: March 8, 2013
    Publication date: September 11, 2014
    Inventors: Wen-Yun Wang, Ching-Yu Chang
  • Patent number: 7723763
    Abstract: The invention discloses the color photodetector with multi-primary is introduced to detect the incident light with specific wavelength regimes. Combining the surface plasma resonance effect with photodetector can be utilized to enhance the photo-responsivity of the demanded light wavelength and also can substitute the conventionally color filter and infrared cutter. In this invention, a novel integrated photo-detector that can be realized in commercial CMOS process for achieving low-cost consideration.
    Type: Grant
    Filed: October 30, 2007
    Date of Patent: May 25, 2010
    Assignee: National Taiwan University
    Inventors: Hsuen-Li Chen, Kuan-Sheng Lai, Wen-Yun Wang
  • Publication number: 20080290434
    Abstract: The invention discloses the color photodetector with multi-primary is introduced to detect the incident light with specific wavelength regimes. Combining the surface plasma resonance effect with photodetector can be utilized to enhance the photo-responsivity of the demanded light wavelength and also can substitute the conventionally color filter and infrared cutter. In this invention, a novel integrated photo-detector that can be realized in commercial CMOS process for achieving low-cost consideration.
    Type: Application
    Filed: October 30, 2007
    Publication date: November 27, 2008
    Applicant: National Taiwan University
    Inventors: Hsuen-Li Chen, Kuan-Sheng Lai, Wen-Yun Wang