Patents by Inventor Wendy A. Orr-Arienzo

Wendy A. Orr-Arienzo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Preferential chemical etch for doped silicon
    Patent number: 4681657
    Abstract: The present invention provides an improved etchant composition and method for the resistivity specific etching of doped silicon films which overlie intrinsic or lightly doped crystal regions. The composition of the etchant is 0.2-6 mole % hydrofluoric acid, 14-28 mole % nitric acid, and 66-86 mole % acetic acid/water. The etchant leaves no silicon residue and provides for controlled etching with an etch stop at the lightly doped or intrinsic region.
    Type: Grant
    Filed: October 31, 1985
    Date of Patent: July 21, 1987
    Assignee: International Business Machines Corporation
    Inventors: Bao-Tai Hwang, Wendy A. Orr-Arienzo, Reinhard Glang