Patents by Inventor Wilfred Gerard Van Der Wiel

Wilfred Gerard Van Der Wiel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SENSOR FOR SINGLE PARTICLE DETECTION
    Publication number: 20220099663
    Abstract: The invention provides a sensor (100) for sensing a predetermined particle (10) in a fluid (11), wherein the sensor (100) comprises (i) an electrode (110) and (ii) an recognition element (112), wherein the electrode (110) comprises an electrode face (111) configured accessible to the fluid (11), to the predetermined particle (10) in the fluid (11), and to a redox mediator (12) in the fluid (11); and wherein the recognition element (112) is configured to at least temporarily selectively bind with the predetermined particle (10), thereby limiting access of the redox mediator (12) to the electrode face (111) during the binding of the predetermined particle with the recognition element (112).
    Type: Application
    Filed: March 5, 2020
    Publication date: March 31, 2022
    Applicant: UNIVERSITEIT TWENTE
    Inventors: Dilu George MATHEW, Pepijn BEEKMAN, Wilfred Gerard VAN DER WIEL, Serge Joseph Guy LEMAY
  • PHOTOCATALYTIC WATER SPLITTING
    Publication number: 20130248349
    Abstract: The invention is directed to a method for photocatalytic water splitting, and to an apparatus for carrying out said method.
    Type: Application
    Filed: July 15, 2011
    Publication date: September 26, 2013
    Applicant: UNIVERSITEIT TWENTE
    Inventors: Guido Mul, Wilfred Gerard Van Der Wiel, Machiel Pieter De Jong
  • METHOD FOR MANUFACTURING A MULTILAYER STRUCTURE WITH A LATERAL PATTERN FOR APPLICATION IN THE XUV WAVELENGTH RANGE, AND BF AND LMAG STRUCTURES MANUFACTURED ACCORDING TO THIS METHOD
    Publication number: 20130220971
    Abstract: Method for manufacturing a multilayer structure with a lateral pattern, in particular of an optical grating for application in an optical device for electromagnetic radiation with a wavelength in the wavelength range between 0.1 nm and 100 nm, comprising the steps of (i) providing a multilayer structure, and (ii) arranging a lateral three-dimensional pattern in the multilayer structure, wherein step (ii) of arranging the lateral pattern is performed by means of a method for nano-imprint lithography (NIL), and BF and LMAG structures manufactured according to this method.
    Type: Application
    Filed: December 8, 2010
    Publication date: August 29, 2013
    Applicant: PANALYTICAL B.V.
    Inventors: Frederik Bijkerk, Wilfred Gerard Van Der Wiel, Robert Van Der Meer, Petronella Emerentiana Hegeman