Patents by Inventor Wilhelm Ulrich
Wilhelm Ulrich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8632195Abstract: In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.Type: GrantFiled: October 22, 2012Date of Patent: January 21, 2014Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Mann, David Shafer, Wilhelm Ulrich
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Patent number: 8605255Abstract: An imaging optical system has a plurality of mirrors. These image an object field in an object plane into an image field in an image plane. In the imaging optical system, the ratio of a maximum angle of incidence of imaging light) on reflection surfaces of the mirrors and an image-side numerical aperture of the imaging optical system is less than 33.8°. This can result in an imaging optical system which offers good conditions for a reflective coating of the mirror, with which a low reflection loss can be achieved for imaging light when passing through the imaging optical system, in particular even at wavelengths in the EUV range of less than 10 nm.Type: GrantFiled: April 26, 2010Date of Patent: December 10, 2013Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Mann, Wilhelm Ulrich, Stephan Muellender, Hartmut Enkisch
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Publication number: 20130182234Abstract: A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.Type: ApplicationFiled: March 5, 2013Publication date: July 18, 2013Applicant: Carl Zeiss SMT GmbHInventors: Paul Graupner, Olaf Conradi, Christoph Zaczek, Wilhelm Ulrich, Helmut Beierl, Toralf Gruner, Volker Graeschus
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Patent number: 8456616Abstract: An optical system, in particular a projection objective, for microlithography, has an optical axis and at least one optical correction arrangement, which has a first optical correction element and at least one second optical correction element, wherein the first correction element is provided with a first aspherical surface contour, and wherein the second correction element is provided with a second aspherical surface contour, wherein the first surface contour and the second surface contour add up at least approximately to zero, wherein the correction arrangement has at least one drive for movement of at least one of the two correction elements. In this case, at least one of the two correction elements can rotate about a rotation axis which is at least approximately parallel to the optical axis, and the at least one drive is a rotary drive for rotation of one or both of the correction elements about the rotation axis.Type: GrantFiled: April 7, 2009Date of Patent: June 4, 2013Assignee: Carl Zeiss SMT GmbHInventors: Daniel Kraehmer, Wilhelm Ulrich, Matthias Manger, Bernhard Gellrich
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Patent number: 8416490Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.Type: GrantFiled: June 16, 2010Date of Patent: April 9, 2013Assignee: Carl Zeiss SMT GmbHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
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Patent number: 8363315Abstract: A catadioptric projection objective for imaging an off-axis object field arranged in an object surface of the projection objective onto an off-axis image field arranged in an image surface of the projection objective has a front lens group, a mirror group comprising four mirrors and having an object side mirror group entry, an image side mirror group exit, and a mirror group plane aligned transversely to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit; and a rear lens group. The mirrors of the mirror group are arranged such that at least one intermediate image is positioned inside the mirror group between mirror group entry and mirror group exit, and that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit.Type: GrantFiled: April 7, 2005Date of Patent: January 29, 2013Assignee: Carl Zeiss SMT GmbHInventors: Alexander Epple, Wilhelm Ulrich, Aurelian Dodoc, Hans-Juergen Mann, David Shafer
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Patent number: 8355201Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.Type: GrantFiled: April 6, 2011Date of Patent: January 15, 2013Assignee: Carl Zeiss SMT GmbHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf M. Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
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High transmission, high aperture catadioptric projection objective and projection exposure apparatus
Patent number: 8345222Abstract: The disclosure provides projection objectives which may be used in a microlithographic projection exposure apparatus to expose a radiation-sensitive substrate arranged in the region of an image surface of the projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective. The disclosure also provides projection exposure apparatus which include such projection objectives, as well as related components and methods.Type: GrantFiled: October 16, 2009Date of Patent: January 1, 2013Assignee: Carl Zeiss SMT GmbHInventors: Daniel Kraehmer, Ralf Mueller, Thomas Schicketanz, Wilhelm Ulrich, Alexander Epple -
Patent number: 8339701Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.Type: GrantFiled: June 17, 2010Date of Patent: December 25, 2012Assignee: Carl Zeiss SMT GmbHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Patent number: 8317345Abstract: In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.Type: GrantFiled: July 15, 2011Date of Patent: November 27, 2012Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Mann, David Shafer, Wilhelm Ulrich
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Publication number: 20120274918Abstract: A catadioptric projection objective for imaging a pattern onto an image plane includes: a first objective part for imaging the pattern into a first intermediate image; a second objective part for imaging the first intermediate image into a second intermediate image; and a third objective part for imaging the second intermediate image onto the image plane. A first concave mirror having a continuous mirror surface and a second concave mirror having a continuous mirror surface are upstream of the second intermediate image. A pupil surface is formed between the object plane and the first intermediate image, between the first and the second intermediate image, and between the second intermediate image and the image plane. A plate having essentially parallel plate surfaces is positioned in the first objective part near the pupil surface. At least one plate surface is aspherized to correct for aberrations.Type: ApplicationFiled: June 13, 2012Publication date: November 1, 2012Applicant: CARL ZEISS SMT GMBHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Publication number: 20120274919Abstract: A reflection mirror assembly for use in a catadioptric imaging optical system includes two curved reflection mirrors, each including a reflection surface expressed by equation (a), where y represents height in a direction perpendicular to the optical axis, z represents distance (sag amount) along the optical axis from a tangent plane at a vertex of the reflection surface to a position on the reflection surface at height y, r represents a vertex curvature radius, and R represents a conical coefficient; z=(y2/r)/[1+{1?(1+?)·y2/r2}1/2]??(a), wherein ?1<k<0.Type: ApplicationFiled: June 25, 2012Publication date: November 1, 2012Applicant: CARL ZEISS SMT GMBHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple
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Patent number: 8289619Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.Type: GrantFiled: June 6, 2011Date of Patent: October 16, 2012Assignee: Carl Zeiss SMT GmbHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf M. Von Buenau, Hans-Juergen Mann, Alexander Epple
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Publication number: 20120250147Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.Type: ApplicationFiled: May 14, 2012Publication date: October 4, 2012Inventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
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Publication number: 20120188636Abstract: A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hMH to marginal ray height hMR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hLH to marginal ray height hLR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.Type: ApplicationFiled: April 5, 2012Publication date: July 26, 2012Applicant: Carl Zeiss SMT GmbHInventors: Wilhelm Ulrich, Thomas Okon, Norbert Wabra, Toralf Gruner, Boris Bittner, Volker Graeschus
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Publication number: 20120188525Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.Type: ApplicationFiled: April 3, 2012Publication date: July 26, 2012Applicant: CARL ZEISS SMT GMBHInventors: Hans-Juergen Mann, Wilhelm Ulrich, Marco Pretorius
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Publication number: 20120162625Abstract: A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.Type: ApplicationFiled: January 30, 2012Publication date: June 28, 2012Applicant: CARL ZEISS SMT GMBHInventors: Aurelian DODOC, Wilhelm ULRICH, Alexander EPPLE
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Patent number: 8208199Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.Type: GrantFiled: March 23, 2009Date of Patent: June 26, 2012Assignee: Carl Zeiss SMT GmbHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
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Patent number: 8208198Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y?, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y?·NA2) and wherein the condition COMP1<10 holds.Type: GrantFiled: January 16, 2007Date of Patent: June 26, 2012Assignee: Carl Zeiss SMT GmbHInventors: David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann, Alexander Epple, Susanne Beder, Wolfgang Singer
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Publication number: 20120147347Abstract: An imaging optical system has a plurality of mirrors, which image an object field in an object plane into an image field in an image plane. A reflection face of at least one of the mirrors is configured as a free form face which cannot be described by a rotationally symmetrical function. The object field has an aspect ratio greater than 1. A ratio of a minimal and a maximal transverse dimension of the object field can be less than 0.9.Type: ApplicationFiled: December 15, 2011Publication date: June 14, 2012Applicant: CARL ZEISS SMT GMBHInventors: Hans-Juergen Mann, Johannes Zellner, Aurelian Dodoc, Marco Pretorius, Christoph Menke, Wilhelm Ulrich, Martin Endres