Patents by Inventor Wilhelmus Jacobus Johannes Welters

Wilhelmus Jacobus Johannes Welters has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11269259
    Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
    Type: Grant
    Filed: November 19, 2020
    Date of Patent: March 8, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Thomas Poiesz, Bert Dirk Scholten, Dirk Willem Harberts, Lucas Henricus Johannes Stevens, Laura Maria Fernandez Diaz, Johannes Adrianus Cornelis Maria Pijnenburg, Abraham Alexander Soethoudt, Wilhelmus Jacobus Johannes Welters, Jimmy Matheus Wilhelmus Van De Winkel
  • Publication number: 20210223696
    Abstract: A substrate, a substrate holder, a substrate coating apparatus, a method for coating the substrate and a method for removing the coating. A monomolecular layer is applied to the backside of the substrate or a clamp surface of the substrate holder. The friction force between the substrate backside and the substrate is small when the substrate does not experience full clamping force. After loading the substrate on the substrate holder full clamping force is exerted in order to fix the substrate. The clamping force causes local removal of the monomolecular layer, resulting in an increase of the friction force between the substrate and the substrate holder.
    Type: Application
    Filed: August 23, 2017
    Publication date: July 22, 2021
    Inventors: Satish ACHANTA, Wilhelmus Jacobus Johannes WELTERS, Abraham Alexander SOETHOUDT, Jelmer Mattheüs KAMMINGA, Christian LIEDECKE
  • Patent number: 10976196
    Abstract: A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.
    Type: Grant
    Filed: February 15, 2018
    Date of Patent: April 13, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Joost André Klugkist, Vadim Yevgenyevich Banine, Johan Franciscus Maria Beckers, Madhusudhanan Jambunathan, Maxim Aleksandrovich Nasalevich, Andrey Nikipelov, Roland Johannes Wilhelmus Stas, David Ferdinand Vles, Wilhelmus Jacobus Johannes Welters, Sandro Wricke
  • Publication number: 20210072649
    Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
    Type: Application
    Filed: November 19, 2020
    Publication date: March 11, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Thomas Poiesz, Bert Dirk Scholten, Dirk Willem Harberts, Lucas Henricus Johannes Stevens, Laura Maria Fernandez Diaz, Johannes Adrianus Cornelis M Pijnenburg, Abraham Alexander Soethoudt, Wilhelmus Jacobus Johannes Welters, Jimmy Matheus Wilhelmus Van De Winkel
  • Patent number: 10871715
    Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: December 22, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Thomas Poiesz, Bert Dirk Scholten, Dirk Willem Harberts, Lucas Henricus Johannes Stevens, Laura Maria Fernandez Diaz, Johannes Adrianus Cornelis Maria Pijnenburg, Abraham Alexander Soethoudt, Wilhelmus Jacobus Johannes Welters, Jimmy Matheus Wilhelmus Van De Winkel
  • Publication number: 20200183289
    Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
    Type: Application
    Filed: November 21, 2019
    Publication date: June 11, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thomas POIESZ, Bert Dirk SCHOLTEN, Dirk Willem HARBERTS, Lucas Henricus Johannes STEVENS, Laura Maria FERNANDEZ DIAZ, Johannes Adrianus Cornelis Maria PIJNENBURG, Abraham Alexander SOETHOUDT, Wilhelmus Jacobus Johannes WELTERS, Jimmy Matheus Wilhelmus VAN DE WINKEL
  • Publication number: 20200064183
    Abstract: A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.
    Type: Application
    Filed: February 15, 2018
    Publication date: February 27, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joost André KLUGKIST, Vadim Yevgenyevich BANINE, Johan Franciscus Maria BECKERS, Madhusudhanan JAMBUNATHAN, Maxim Aleksandrovich NASALEVICH, Andrey NIKIPELOV, Roland Johannes Wilhelmus STAS, David Ferdinand VLES, Wilhelmus Jacobus Johannes WELTERS, Sandro WRICKE
  • Patent number: 9798251
    Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.
    Type: Grant
    Filed: February 26, 2014
    Date of Patent: October 24, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LaFarre, Satish Achanta, Matteo Filippi, Yogesh Karade, Antonius Johannes Maria Nellissen, Ronald Van Der Wilk, Hendrikus Christoffel Maria Van Doremalen, Wilhelmus Jacobus Johannes Welters
  • Publication number: 20160018744
    Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.
    Type: Application
    Filed: February 26, 2014
    Publication date: January 21, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Satish ACHANTA, Matteo FILIPPI, Yogesh KARADE, Antonius Johannes Maria NELLISSEN, Ronal VAN DER WILK, Hendrikus Christoffel Maria VAN DOREMALEN, Wilhelmus Jacobus Johannes WELTERS
  • Patent number: 7378798
    Abstract: An electric lamp has a lamp vessel accommodating an electric element. The element is connected to current conductors including molybdenum portions which have a coating of material chosen from the group of chromium-manganese, chromium-cobalt, chromium-iron and chromium-boron alloys as a protection against oxidation.
    Type: Grant
    Filed: May 21, 2003
    Date of Patent: May 27, 2008
    Assignee: Koninklijke Philips Electronics, N.V.
    Inventors: Jacobus Johannes Chretien Coumans, Marten Willem Schuiteman, Wilhelmus Jacobus Johannes Welters