Patents by Inventor Willem Maurits WEEDA

Willem Maurits WEEDA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CHARGED PARTICLE LITHOGRAPHY APPARATUS AND METHOD OF GENERATING VACUUM IN A VACUUM CHAMBER
    Publication number: 20110042579
    Abstract: The invention relates to a charged particle lithography apparatus with a charged particle source for creating one or more charged particle beams, a charged particle projector for projecting the beams onto a wafer; and a moveable wafer stage for carrying the wafer. The charged particle source, charged particle projector, and moveable wafer stage are disposed in a common vacuum chamber forming a vacuum environment. The vacuum chamber further has an opening for loading wafers into the chamber and a door.
    Type: Application
    Filed: February 19, 2010
    Publication date: February 24, 2011
    Applicant: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Guido DE BOER, Sander BALTUSSEN, Remco JAGER, Jerry Johannes Martinus PEIJSTER, Tijs Frans TEEPEN, Joris Anne Henri VAN NIEUWSTADT, Willem Maurits WEEDA, Alexander Hendrik Vincent VAN VEEN