Patents by Inventor William A. Reinerth

William A. Reinerth has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8076443
    Abstract: A synthetic process for polyhedral oligomeric silsesquioxanes (POSS) and polyhedral oligomeric silicates (POS) produces silanol and siloxide molecules containing both olefinic groups and alkyl or aromatic groups. Olefin-bearing POSS silanol/siloxides are derivatized into a variety of chemical species while retaining the ability to further derivatize the silanol/siloxide.
    Type: Grant
    Filed: August 16, 2006
    Date of Patent: December 13, 2011
    Assignee: Hybrid Plastics, Inc.
    Inventors: Joseph J. Schwab, Yi-Zhong An, Sukhendu B. Hait, William A. Reinerth, Sr., Hendrikus C. L. Abbenhuis
  • Patent number: 7638195
    Abstract: Nanoreinforced coatings with improved hydrophobicity, thermal stability, hardness, and durability have been developed from polyhedral oligomeric silsesquioxane (POSS) reagents and resins. The nanoscopic dimensions and hybrid (organic/inorganic) composition of POSS reagents are particularly useful for coating fillers derived from minerals, metals, glasses, and polymeric materials.
    Type: Grant
    Filed: January 27, 2006
    Date of Patent: December 29, 2009
    Assignee: Hybrid Plastics, Inc.
    Inventors: Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zhong An, William A. Reinerth, Sr.
  • Publication number: 20060188732
    Abstract: Nanoreinforced coatings with improved hydrophobicity, thermal stability, hardness, and durability have been developed from polyhedral oligomeric silsesquioxane (POSS) reagents and resins. The nanoscopic dimensions and hybrid (organic/inorganic) composition of POSS reagents are particularly useful for coating fillers derived from minerals, metals, glasses, and polymeric materials.
    Type: Application
    Filed: January 27, 2006
    Publication date: August 24, 2006
    Inventors: Joseph Lichtenhan, Joseph Schwab, Yi-Zhong An, William Reinerth
  • Patent number: 6972312
    Abstract: Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydroxide [OH]?, alkoxide [RO]??, etc. The first process utilizes such bases to effectively redistribute the silicon-oxygen frameworks in polymeric silsesquioxanes [RSiO1.5]28 where ?=1-1,000,000 or higher into POSS nanostructures of formulas [(RSiO1.5)n?#, homoleptic, [(RXSiO1.5)n]?#, functionalized homoleptic, [(RSiO1.5)m(R?SiO1.5)n]?#, heteroleptic, and {(RSiO1.5)m(RXSiO1.0)n}?#, functionalized heteroleptic nanostructures. The second process utilizes base to aid in the formation of POSS nanostructures of formulas [(RSiO1.5)n]?# homoleptic and [(RSiO1.5)m(R?SiO1.5)n]?# heteroleptic and [(RSiO1.5)m(RXSiO1.
    Type: Grant
    Filed: August 4, 2000
    Date of Patent: December 6, 2005
    Assignee: Hybrid Plastics LLC
    Inventors: Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zong An, William Reinerth, Michael J. Carr, Frank J. Feher, Raquel Terroba, Qibo Liu
  • Publication number: 20050239985
    Abstract: Three processes for the manufacture of polyhedral oligomeric silsesquioxanes (POSS) which utilize the action of bases that are capable of either attacking silicon or any compound that can react with a protic solvent (e.g. ROH, H2O etc.) and generate hydroxide [OH]?, alkoxide [RO]?, etc. The first process utilizes such bases to effectively redistribute the silicon-oxygen frameworks in polymeric silsesquioxanes [RSiO1.5]? where ?=1?1,000,000 or higher into POSS nanostructures of formulas [(RSiO1.5)n]?#, homoleptic, [(RXSiO1.5)n]?#, functionalized homoleptic, [(RSiO1.5)m(R?SiO1.5)n]?#, heteroleptic, and {(RSiO1.5)m(RXSiO1.0)n}?#, functionalized heteroleptic nanostructures. The second process utilizes base to aid in the formation of POSS nanostructures of formulas [(RSiO1.5)n]?# homoleptic and [(RSiO1.5)m(R?SiO1.5)n]?# heteroleptic and [(RSiO1.5)m(RXSiO1.
    Type: Application
    Filed: June 24, 2005
    Publication date: October 27, 2005
    Applicant: Hybrid Plastics LLC
    Inventors: Joseph Lichtenhan, Joseph Schwab, Yi-Zong An, William Reinerth, Michael Carr, Frank Feher, Raquel Terroba
  • Patent number: 6911518
    Abstract: Processes have been developed for the manufacture of polyhedral oligomeric silsesquioxanes (POSS), polysilsesquioxanes, polyhedral oligomeric silicates (POS), and siloxane molecules bearing reactive ring-strained cyclic olefins (e.g. norbornenyl, cyclopentenyl, etc. functionalities). The preferred manufacturing processes employ the silation of siloxides (Si—OA, where A=H, alkaline or alkaline earth metals) with silane reagents that contain at least one reactive ring-strained cyclic olefin functionality [e.g., X3-ySi(CH3)y(CH2)2 where y=1-2 and X=OH, Cl, Br, I, alkoxide OR, acetate OOCR, peroxide OOR, amine NR2, isocyanate NCO, and R]. Alternatively, similar products can be prepared through hydrosilation reactions between silanes containing at least one silicon-hydrogen bond (Si—H) with ring-strained cyclic olefin reagents [e.g., 5-vinyl, 2 norbornene CH2?CH, cyclopentadiene]. The two processes can be effectively practiced using polymeric silsesquioxanes [RSiO1.
    Type: Grant
    Filed: December 21, 2000
    Date of Patent: June 28, 2005
    Assignee: Hybrid Plastics, LLC
    Inventors: Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zong An, William Reinerth, Frank J. Feher
  • Patent number: 6767930
    Abstract: Performance additives in high performance polymers using polyhedral oligomeric silsesquioxanes (POSS) and polyhedral oligomeric silicates (POS) as nanoscopic reinforcements, porosity control agents, thermal and oxidative stability aids to improve the properties of the polymers.
    Type: Grant
    Filed: September 9, 2002
    Date of Patent: July 27, 2004
    Inventors: Steven A. Svejda, Shawn H. Phillips, Rene I. Gonzalez, Frank J. Feher, Joseph D. Lichtenhan, Joseph J. Schwab, William A. Reinerth
  • Publication number: 20040068075
    Abstract: Processes have been developed for the manufacture of polyhedral oligomeric silsesquioxanes (POSS), polysilsesquioxanes, polyhedral oligomeric silicates (POS), and siloxane molecules bearing reactive ring-strained cyclic olefins (e.g. norbornenyl, cyclopentenyl, etc. functionalities). The preferred manufacturing processes employ the silation of siloxides (SiOA, where A=H, alkaline or alkaline earth metals) with silane reagents that contain at least one reactive ring-strained cyclic olefin functionality [e.g., X3-ySi(CH3)y(CH2)2 where y=1-2 and X=OH, Cl, Br, I, alkoxide OR, acetate OOCR, peroxide OOR, amine NR2, isocyanate NCO, and R]. Alternatively, similar products can be prepared through hydrosilation reactions between silanes containing at least one silicon-hydrogen bond (Si—H) with ring-strained cyclic olefin reagents [e.g., 5-vinyl, 2 norbornene CH2═CH, cyclopentadiene].
    Type: Application
    Filed: August 23, 2001
    Publication date: April 8, 2004
    Applicant: Hybrid Plastics
    Inventors: Joseph D. Lichtenhan, Joseph J. Schwab, Yi-Zong An, William Reinerth, Frank J. Feher