Abstract: An air injection sports goggle (10) has a lens subframe (14) connected to a face flange subframe (16) by struts (18). The struts (18) form a top opening (20) and a pair of cheek openings (22) between the lens subframe (14) and the face flange subframe (16). A lens (24) is contained in the lens subframe (14). A cover fits (46) over the top opening (20). A pair of open cell foam vents (52) are located in the pair of cheek openings (22). An air injection hole (54) provides access between an outside and an interior space. A ventilating fan (12) located in the top opening (20) pulls air in through the air injection hole (54) and the pair of cheek openings (22) and exhausts the air through the top opening (20).

Abstract: A power pack (12) for a ventilating fan (16) of a sports goggle (10) has a housing (12) designed to attach to a strap (14) of the sports goggle (10). The housing (12) has a slider (20) that is substantially rectangular in shape and is substantially the same size as the housing (12). The slider (20) forms an outer wall of the housing (12). A power regulating circuit (100) contained in the housing (12), is designed to be connected to a battery and provide a constant voltage power supply to the ventilating fan (16).

Abstract: A sports goggle (10) has a lens subframe (14) attached to a face subframe (16) by spacer struts (18). The spacer struts (18) form a top open portion (20) and a pair of cheek open portions (22). The face subframe (16) has a face flange (26) conforming to a user's face. The face flange (26) has a trapezoidal opening (28) in a forehead portion and a pair of locking holes (30) on either side of the trapezoidal opening (28).

Abstract: A triode sputtering system comprises a plasma confining enclosure including a cathode at one end, an anode at the other, and a central plasma supporting portion. Contamination caused by unwanted sputtering of the surfaces of the confining apparatus is substantially eliminated by making the confining enclosure in several, typically four, electrically isolated portions, namely, the cathode support portion, the anode support portion and a pair of plasma support portions. In the structure described there is avoided the relatively large potential difference between the confinement enclosure and the plasma, which occurs predominantly at the anode support end of the confining enclosure of prior art one-piece apparatus. This portion of the apparatus has been found to be the major source of unwanted sputtering therein.

Abstract: An attenuating member comprising a plurality of passages like a tube nest, is positioned between the electrodes of a diode sputter-etching system and close or next to the anode. The passages of the attenuating member are parallel to the direct path between the electrodes and have a length appreciably greater than their maximum width. A bias on the attenuating member tends to cause secondary electrons emitted by ion bombardment at the cathode to pass through the attenuating member with a minimum of collisions. Upon striking the anode, X-rays generated at the anode by the collision of the secondary electrons are inhibited from traveling back to the workpiece by the interposition of the attenuating member. The arrangement is important in the fabrication of surface-sensitive devices such as MOS devices in which the impingement of even low energy X-rays may affect critical operating parameters, in particular, the threshold voltage.