Patents by Inventor William Dinan Hinsberg
William Dinan Hinsberg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7855045Abstract: A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 ?/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.Type: GrantFiled: October 5, 2007Date of Patent: December 21, 2010Assignee: International Business Machines CorporationInventors: Robert David Allen, Phillip Joe Brock, Dario Gil, William Dinan Hinsberg, Carl Eric Larson, Linda Karin Sundberg, Gregory Michael Wallraff
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Patent number: 7348127Abstract: A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the photoresist layer. The topcoat layer is then rendered insoluble in neutral water but remains soluble in aqueous-base developer solutions so the photoresist may be exposed in a immersion lithographic system using water as the immersion fluid, but is removed during photoresist development. The topcoat materials are suitable for use with positive, negative, dual tone and chemically amplified (CA) photoresist.Type: GrantFiled: January 9, 2007Date of Patent: March 25, 2008Assignee: International Business Machines CorporationInventor: William Dinan Hinsberg, III
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Patent number: 7288362Abstract: A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 ?/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.Type: GrantFiled: February 23, 2005Date of Patent: October 30, 2007Assignee: International Business Machines CorporationInventors: Robert David Allen, Phillip Joe Brock, Dario Gil, William Dinan Hinsberg, Carl Eric Larson, Linda Karin Sundberg, Gregory Michael Wallraff
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Patent number: 7205093Abstract: A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the photoresist layer. The topcoat layer is then rendered insoluble in neutral water but remains soluble in aqueous-base developer solutions so the photoresist may be exposed in a immersion lithographic system using water as the immersion fluid, but is removed during photoresist development. The topcoat materials are suitable for use with positive, negative, dual tone and chemically amplified (CA) photoresist.Type: GrantFiled: June 3, 2005Date of Patent: April 17, 2007Assignee: International Business Machines CorporationInventor: William Dinan Hinsberg, III
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Patent number: 7179571Abstract: An optical apparatus used for the efficient characterization of photoresist material includes at least one grating interferometer having at least two gratings that together define an optical recombination plane. An optical stop blocks any zeroth order beam from propagating through the apparatus. A reticle positioned at the recombination plane has at least one fiducial marking therein. A lithographic imaging optical tool is positioned so that its input optical plane is substantially coincident with the optical recombination plane and its output imaging plane is substantially coincident with photoresist on a wafer. The apparatus writes in the photoresist latent, sinusoidal grating patterns, preferably of different spatial frequencies, as well as at least one fiducial mark whose pattern is determined by the marking in the reticle. After the photoresist is developed, its intrinsic spatial resolution may be determined by automated means.Type: GrantFiled: February 9, 2006Date of Patent: February 20, 2007Assignee: International Business Machines CorporationInventors: William Dinan Hinsberg, III, John Allen Hoffnagle, Frances Anne Houle, Martha Inez Sanchez
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Patent number: 7046342Abstract: An optical apparatus used for the efficient characterization of photoresist material includes at least one grating interferometer having at least two gratings that together define an optical recombination plane. An optical stop blocks any zeroth order beam from propagating through the apparatus. A reticle positioned at the recombination plane has at least one fiducial marking therein. A lithographic imaging optical tool is positioned so that its input optical plane is substantially coincident with the optical recombination plane and its output imaging plane is substantially coincident with photoresist on a wafer. The apparatus writes in the photoresist latent, sinusoidal grating patterns, preferably of different spatial frequencies, as well as at least one fiducial mark whose pattern is determined by the marking in the reticle. After the photoresist is developed, its intrinsic spatial resolution may be determined by automated means.Type: GrantFiled: January 29, 2004Date of Patent: May 16, 2006Assignee: International Business Machines CorporationInventors: William Dinan Hinsberg, III, John Allen Hoffnagle, Frances Anne Houle, Martha Inez Sanchez
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Patent number: 6423465Abstract: A method is disclosed for preparing a patterned continuous polymeric brush on a substrate surface. The method generally involves functionalization of the substrate surface followed by surface-initiated polymerization at the initiation sites so provided, e.g., using a living free radical polymerization technique or the like, whereby a covalently bound continuous polymeric brush results, with acid-labile groups present throughout. An acid is then applied to the continuous polymer brush in a predetermined pattern, under conditions that result in removal of the acid-labile groups in at least one first region of the continuous polymer brush but not in at least one second region of the continuous polymer brush. In a preferred embodiment, the acid is a photogenerated acid resulting from imagewise irradiation of a photoacid generator applied as a film or coating to the surface-bound polymer brush.Type: GrantFiled: January 28, 2000Date of Patent: July 23, 2002Assignees: International Business Machines Corporation, The Board of Trustees of the Leland Stanford Junior UniversityInventors: Craig Jon Hawker, James Lupton Hedrick, William Dinan Hinsberg, III, Marc Husemann, Michael Morrison
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Patent number: 6277546Abstract: The present invention relates to an improved lithographic imaging process for use in the manufacture of integrated circuits. The process provides protection to the photoresist film from airborne chemical contaminants.Type: GrantFiled: November 28, 1994Date of Patent: August 21, 2001Assignee: International Business Machines CorporationInventors: Gregory Breyta, Nicholas Jeffries Clecak, William Dinan Hinsberg, III, Donald Clifford Hofer, Hiroshi Ito, Scott Arthur MacDonald, Ratnam Sooriyakumaran
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Patent number: 6180317Abstract: An improved photoimagable cationically polymerizable epoxy based coating material is provided, that is suitable for use on a variety of substrates including epoxy-glass laminate boards cured with dicyandiamide. The material includes an epoxy resin system consisting essentially of between about 10% and about 80% by weight of a polyol resin which is a condensation product of epichlorohydrin and bisphenol A having a molecular weight of between about 40,000 and 130,000; and between about 35% and 72% by weight of an epoxidized glycidyl ether of a brominated bisphenol A having a softening point of between about 60° C. and about 110° C. and a molecular weight of between about 600 and 2,500. Optionally, a third resin may be added to the resin system. To this resin system is added about 0.Type: GrantFiled: November 18, 1991Date of Patent: January 30, 2001Assignee: International Business Machines CorporationInventors: Robert David Allen, Richard Allen Day, Donald Herman Glatzel, William Dinan Hinsberg, John Richard Mertz, David John Russell, Gregory Michael Wallraff
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Patent number: 5826065Abstract: A stochastic simulation method and system are provided. The invention eliminates the need for the use of subroutine calls in a user-written simulation program, and of option flags to direct execution via decision trees, by allowing the user to configure the simulator through choices of options at run-time. The options are presented via a user interface as radio buttons or checkboxes which the user activates. The simulator sets itself up to incorporate only those options. The programmer (that is, the author of software according to the invention) only makes the objects available and ensures that they work together. It is the user who actually configures the simulator. The invention provides a highly extendable structure. By use of inheritance and dynamic allocation of memory, and by design of self-contained objects to represent various components of the simulation system, a simulation program according to the invention incorporates new features and options with a minimum of new code.Type: GrantFiled: January 13, 1997Date of Patent: October 20, 1998Assignee: International Business Machines CorporationInventors: William Dinan Hinsberg, III, Frances Anne Houle
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Patent number: 5747223Abstract: An improved photoimagable cationically polymerizable epoxy based coating material is provided, that is suitable for use on a variety of substrates including epoxy-glass laminate boards cured with dicyandiamide. The material includes an epoxy resin system consisting essentially of between about 10% and about 80% by weight of a polyol resin which is a condensation product of epichlorohydrin and bisphenol A having a molecular weight of between about 40,000 and 130,000; and between about 35% and 72% by weight of an epoxidized glycidyl ether of a brominated bisphenol A having a softening point of between about 60.degree. C. and about 110.degree. C. and a molecular weight of between about 600 and 2,500. Optionally, a third resin may be added to the resin system. To this resin system is added about 0.Type: GrantFiled: July 9, 1996Date of Patent: May 5, 1998Assignee: International Business Machines CorporationInventors: Robert D. Allen, Richard Allen Day, Donald Herman Glatzel, William Dinan Hinsberg, John Richard Mertz, David John Russell, Gregory Michael Wallraff
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Patent number: 5745385Abstract: A system and method for simulating a mechanistic kinetic process, such as a chemical process including one or more chemical reactions, over a predetermined time period, subject to a programmed temperature variation, is provided. The simulation proceeds stochastically, by taking discrete time steps through the time period. The time steps vary in size, based on instantaneous reaction rate values for the reactions taking place. Reaction rates can vary by many orders of magnitude, and sometimes a stochastically calcualated time step will be so great that it might skip over a later increase in chemical activity. To avoid loss of accuracy and control of the simulation due to such excessively large time steps, when the stochastically determined time step exceeds a threshold, one or more smaller, deterministic time steps are made. The deterministic time steps "inch" forward in time, until an increase in chemical activity is detected. Then, stochastic time steps are resumed.Type: GrantFiled: April 25, 1994Date of Patent: April 28, 1998Assignee: International Business Machines CorproationInventors: William Dinan Hinsberg, III, Frances Anne Houle
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Patent number: 5658734Abstract: The present invention relates to a process for synthesizing on a single substrate a plurality of chemical compounds having diverse structures. The process involves the use of a bilayer photoresist to build up selected regions of the array in a step wise fashion.Type: GrantFiled: October 17, 1995Date of Patent: August 19, 1997Assignee: International Business Machines CorporationInventors: Phillip Joe Brock, William Dinan Hinsberg, Jeffrey William Labadie, Glenn McGall, Gregory Michael Wallraff