Patents by Inventor William J. Sudyka

William J. Sudyka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Measurement of etching
    Patent number: 8173032
    Abstract: Methods and apparatus for determining the extent of etching in material by locating a detector element adjacent to a portion of the material that is to be etched. The width of the element varies. The resistance of the element is measured upon etching the portion.
    Type: Grant
    Filed: January 21, 2009
    Date of Patent: May 8, 2012
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Ted W. Barnes, Victorio Chavarria, William J. Sudyka, Adam Ghozeil, Timothy R. Emery
  • MEASUREMENT OF ETCHING
    Publication number: 20090127225
    Abstract: Methods and apparatus for determining the extent of etching in material by locating a detector element adjacent to a portion of the material that is to be etched. The width of the element varies. The resistance of the element is measured upon etching the portion.
    Type: Application
    Filed: January 21, 2009
    Publication date: May 21, 2009
    Inventors: Ted W. Barnes, Victorio Chavarria, William J. Sudyka, Adam Ghozeil, Timothy R. Emery
  • Measurement of etching
    Patent number: 7494596
    Abstract: Methods and apparatus for determining the extent of etching in material by locating a detector element adjacent to a portion of the material that is to be etched. The width of the element varies. The resistance of the element is measured upon etching the portion.
    Type: Grant
    Filed: March 21, 2003
    Date of Patent: February 24, 2009
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Ted W. Barnes, Victorio Chavarria, William J. Sudyka, Adam Ghozeil, Timothy R. Emery
  • Measurement of etching
    Publication number: 20040182513
    Abstract: Methods and apparatus for determining the extent of etching in material by locating a detector element adjacent to a portion of the material that is to be etched. The width of the element varies. The resistance of the element is measured upon etching the portion.
    Type: Application
    Filed: March 21, 2003
    Publication date: September 23, 2004
    Inventors: Ted W. Barnes, Victorio Chavarria, William J. Sudyka, Adam Ghozeil, Timothy R. Emery