Patents by Inventor William L. Wilson, Jr.

William L. Wilson, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multiple image photolithography system and method
    Patent number: 6741333
    Abstract: A multiple image photolithography system includes a radiation source (18) projecting electromagnetic radiation along a path. A reticle cartridge (26) is located in the path of the projected radiation. The cartridge (26) includes a photomask (34,36) located in the path of the projected radiation and a Fabry-Perot interferometer (54) located in the path of the projected radiation. A radiation-sensitive material (30) is located in the path of the projected radiation such that the projected radiation encounters the reticle cartridge (26) before the projected radiation encounters the radiation-sensitive material (30).
    Type: Grant
    Filed: April 2, 2003
    Date of Patent: May 25, 2004
    Assignee: Texas Instruments Incorporated
    Inventors: Michael C. Smayling, Frank Tittel, William L. Wilson, Jr.
  • Multiple image photolithography system and method
    Patent number: 6567153
    Abstract: A multiple image photolithography system includes a radiation source (18) projecting electromagnetic radiation along a path. A reticle cartridge (26) is located in the path of the projected radiation. The cartridge (26) includes a photomask (34,36) located in the path of the projected radiation and a Fabry-Perot interferometer (54) located in the path of the projected radiation. A radiation-sensitive material (30) is located in the path of the projected radiation such that the projected radiation encounters the reticle cartridge (26) before the projected radiation encounters the radiation-sensitive material (30).
    Type: Grant
    Filed: October 19, 2000
    Date of Patent: May 20, 2003
    Assignee: Texas Instruments Incorporated
    Inventors: Michael C. Smayling, Frank Tittel, William L. Wilson, Jr.
  • Two-halogen donor mixture for XeF (C.fwdarw.A) laser
    Patent number: 4660210
    Abstract: An improved electric discharge XeF excimer laser employs a reaction gas mixture containing NF.sub.3 and F.sub.2 in proportions that tailor the kinetics of the electrochemical reactions in order to achieve a substantial increase in power.
    Type: Grant
    Filed: March 14, 1986
    Date of Patent: April 21, 1987
    Assignee: United Technologies Corporation
    Inventors: William L. Nighan, Frank K. Tittel, William L. Wilson, Jr.
  • Multi-component buffer gas mixture for XeF(C.fwdarw.A) laser
    Patent number: 4646311
    Abstract: A xenon fluoride (C.fwdarw.A) laser operating in the visible region is improved by the use of a synthesized buffer gas containing at least two components that combine to provide kinetic properties that are different from those of any single-component buffer gas.
    Type: Grant
    Filed: April 24, 1985
    Date of Patent: February 24, 1987
    Assignee: United Technologies Corporation
    Inventors: William L. Nighan, Frank K. Tittel, William L. Wilson, Jr.