Abstract: A method is provided for decontaminating biological pathogens residing in an enclosure of an electronic device. The method includes: identifying materials used to encase the enclosure of the electronic device; tailoring x-ray radiation to penetrate the materials encasing the enclosure; and directing x-ray radiation having a diffused radiation angle towards the electronic device.

Abstract: A method is provided for decontaminating biological pathogens residing in an enclosure of an electronic device. The method includes: identifying materials used to encase the enclosure of the electronic device; tailoring x-ray radiation to penetrate the materials encasing the enclosure; and directing x-ray radiation having a diffused radiation angle towards the electronic device.

Abstract: A pixel array arrangement is provided for a soft x-ray source. The arrangement includes: a window-frame structure having a plurality of channels passing therethrough, where each channel forms a pixel for the x-ray source; a cathode disposed on one side of each channel in the window-frame structure and operable to emit electrons into the channel; and an anode disposed in each cavity on an opposing side of the channel from the cathode and operable to emit x-ray radiation when electrons from the cathode impinge thereon, where the anode is configured to emit x-ray radiation at a diffused angle such that the x-ray radiation from a given pixel overlaps with x-ray radiation from adjacent pixels.

Abstract: A method is provided for decontaminating biological pathogens residing in an enclosure of an electronic device. The method includes: identifying materials used to encase the enclosure of the electronic device; tailoring x-ray radiation to penetrate the materials encasing the enclosure; and directing x-ray radiation having a diffused radiation angle towards the electronic device.

Abstract: A pixel array arrangement is provided for a soft x-ray source. The arrangement includes: a window-frame structure having a plurality of channels passing therethrough, where each channel forms a pixel for the x-ray source; a cathode disposed on one side of each channel in the window-frame structure and operable to emit electrons into the channel; and an anode disposed in each cavity on an opposing side of the channel from the cathode and operable to emit x-ray radiation when electrons from the cathode impinge thereon, where the anode is configured to emit x-ray radiation at a diffused angle such that the x-ray radiation from a given pixel overlaps with x-ray radiation from adjacent pixels.

Abstract: A method is provided for decontaminating biological pathogens residing in an enclosure of an electronic device. The method includes: identifying materials used to encase the enclosure of the electronic device; tailoring x-ray radiation to penetrate the materials encasing the enclosure; and directing x-ray radiation having a diffused radiation angle towards the electronic device.

Abstract: Plasma discharge sources for generating emissions in the VUV, EUV and X-ray spectral regions. Embodiments can include running a current through liquid jet streams within space to initiate plasma discharges. Additional embodiments can include liquid droplets within the space to initiate plasma discharges. One embodiment can form a substantially cylindrical plasma sheath. Another embodiment can form a substantially conical plasma sheath. Another embodiment can form bright spherical light emission from a cross-over of linear expanding plasmas. All the embodiments can generate light emitting plasmas within a space by applying voltage to electrodes adjacent to the space. All the radiative emissions are characteristic of the materials comprising the liquid jet streams or liquid droplets.

Abstract: Method and apparatus for mitigating the transport of debris generated and dispersed from electric discharge sources by thermophoretic and electrostatic deposition. A member is positioned adjacent the front electrode of an electric discharge source and used to establish a temperature difference between it and the front electrode. By flowing a gas between the member and the front electrode a temperature gradient is established that can be used for thermophoretic deposition of particulate debris on either the member or front electrode depending upon the direction of the thermal gradient. Establishing an electric field between the member and front electrode can aid in particle deposition by electrostatic deposition.

Abstract: Method and apparatus for mitigating the transport of debris generated and dispersed from electric discharge sources by thermophoretic and electrostatic deposition. A member is positioned adjacent the front electrode of an electric discharge source and used to establish a temperature difference between it and the front electrode. By flowing a gas between the member and the front electrode a temperature gradient is established that can be used for thermophoretic deposition of particulate debris on either the member or front electrode depending upon the direction of the thermal gradient. Establishing an electric field between the member and front electrode can aid in particle deposition by electrostatic deposition.

Abstract: Method and apparatus for mitigating the transport of debris generated and dispersed from electric discharge sources by thermophoretic and electrostatic deposition. A member is positioned adjacent the front electrode of an electric discharge source and used to establish a temperature difference between it and the front electrode. By flowing a gas between the member and the front electrode a temperature gradient is established that can be used for thermophoretic deposition of particulate debris on either the member or front electrode depending upon the direction of the thermal gradient. Establishing an electric field between the member and front electrode can aid in particle deposition by electrostatic deposition.

Abstract: An emitting capillary discharge light source is modified by means to provide for constant, capillary discharge chamber diameter despite interior surface erosion during operation of the light source in order to maintain capillary bore size. The emissions are generated within the capillary discharge chamber and discharged from its outlet. The emission also carries debris generated from within the capillary discharge chamber by erosion of its inner walls reducing its initial inner diameter. The debris is deleterious to the mirrors and other components positioned in the emission stream whereas the erosion distorts the plasma beam. This increase in the initial inner diameter of the discharge chamber leads rapidly to poor imaging of the light stream. By keeping the inner bore diameter of the capillary discharge chamber constant, i.e., 110%, and preferably 105%, of the initial inner bore diameter, the imaging problem is overcome.

Abstract: An angular pumped and emitting capillary(APEC) discharge light source having a blocking electrode installed on the axis of the capillary just beyond the end of the capillary bore. Thus, the emitting region occurs in an angular fashion between the end of the capillary and the blocking electrode. The blocking electrode prevents debris generated within the capillary from being expelled onto collecting optics for the discharge source. A second version shapes the blocking electrode into a trap so that emitted debris will be collected within the trap. Alternatively, the trap can be a collector separate and apart from the electrodes of the light source. The capillary bore and electrode configuration allow for emissions to be enhanced by placing the electrode in front of the outlet to the capillary bore.

Abstract: Capillary discharge extreme ultraviolet lamp sources for EUV microlithography and other applications. The invention covers operating conditions for a pulsed capillary discharge lamp for EUVL and other applications such as resist exposure tools, microscopy, interferometry, metrology, biology and pathology. Techniques and processes are described to mitigate against capillary bore erosion, pressure pulse generation, and debris formation in capillary discharge-powered lamps operating in the EUV. Additional materials are described for constructing capillary discharge devices fore EUVL and related applications. Further, lamp designs and configurations are described for lamps using gasses and metal vapors as the radiating species.

Abstract: Capillary discharge extreme ultraviolet lamp sources for EUV microlithography and other applications. The invention covers operating conditions for a pulsed capillary discharge lamp for EUVL and other applications such as resist exposure tools, microscopy, interferometry, metrology, biology and pathology. Techniques and processes are described to mitigate against capillary bore erosion, pressure pulse generation, and debris formation in capillary discharge-powered lamps operating in the EUV. Additional materials are described for constructing capillary discharge devices fore EUVL and related applications. Further, lamp designs and configurations are described for lamps using gasses and metal vapors as the radiating species.

Abstract: This invention relates to Lithium Plasma discharge sources, and in particular to methods of making and producing pulsed and continuous discharge sources for plasma soft-x-ray or EUV projection lithography. Specifically, novel configurations, metal and ceramic material combinations and efficient wavelengths over and including 11.4 nm are disclosed for EUV lithium plasma discharge lamps.

Abstract: Methods for making pulsed and continuous discharge plasma light sources for extreme ultraviolet(EUV) projection lithography and soft-x-ray microscopy as well as other applications are disclosed. A first light source of doubly ionized lithium ions emits over a narrow bandwidth of approximately 13.5 nm. A second light source of beryllium ions radiates at approximately 7.60 nm. A third light source of boron ions radiates at approximately 4.86 nm, and a fourth light source of carbon ions radiates at approximately 3.38 nm. Preferred embodiments of apparatus for generating pulsed and continuous discharge sources are disclosed.

Abstract: A helium-cadmium laser having high reflector mirror and output coupler mirror properties which favor lasing at 353.6 nm while inhibiting lasing at 325.0 nm. The preferred characteristics of the high reflector and/or output coupler mirrors include transmission at 325.0 nm greater than 10% and transmission at 353.6 nm less than 5%.

Abstract: Described is a high gain, soft X-ray pumped, inner-shell, photoionization amplifier/laser in Cd or Zn vapors. The soft X-ray photoionization, generated by a laser-produced plasma or other high intensity X-ray source, preferentially removes inner-shell d-electrons from neutral atoms leaving them ionized in a .sup.2 D state and producing a population inversion with respect to a lower lying .sup.2 p state. Also described are techniques for achieving inversions with respect to the ion ground state of Cd, Zn or Hg by optically pumping from the inner-shell ionized state to a higher energy level. Iso-electronic scaling of Cd, Zn and Hg suggests similar lasing phenomena exist, for example, in Ga, In and Tl ions, respectively, and also higher iso-electronic sequences.

Abstract: In an arc discharge device, a thin film bridges the gap(s) between adjacent electrodes, thereby enabling the arc discharge to be initiated and sustained by a low voltage D.C. supply. Application of the invention to both light source (e.g., laser) and material working (e.g., metal deposition) embodiments is described. One of the light source embodiments utilizes a cathode electrode which includes a pool of liquid Hg to generate a Hg ion plasma.

Abstract: Continuous wave laser oscillation has been achieved in a segmented plasma excitation and recombination device in the presence of a low-pressure background gas which rapidly flows across the segmented electrodes. Laser action has been observed in Cd I at 1.40, 1.43, 1.44, and 1.64 .mu.m. Also disclosed are techniques for allowing the background gas to flow between the electrodes and for confining the expanding plasmas with shields in the vicinity of the gaps between electrodes.