Patents by Inventor William W. Chism, II
William W. Chism, II has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11940488Abstract: A precise optical technique for measuring electronic transport properties in semiconductors is disclosed. The sensitivity of the technique to electronic transport properties follows from a simple analytic expression for the Z dependence of a photo-modulated reflectance signal in terms of the (complex) carrier diffusion length. The sensitivity of the technique to electronic transport properties also enables a trained neural network to predict electronic transport properties directly from Z-scan photo-modulated reflectance data. Synthetic data and/or physical constraints may be derived from the analytical expression and incorporated into a machine learning algorithm. Moreover, electronic transport properties as determined or predicted may be used to enable machine learning based control of semiconductor process tools and/or manufacturing processes, including via advanced reinforcement learning algorithms.Type: GrantFiled: May 31, 2022Date of Patent: March 26, 2024Inventor: William W. Chism, II
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Publication number: 20230084219Abstract: A rapid photoreflectance spectroscopy technique using parallel demodulation has been developed. A high-speed spectroscopic photo-reflectometer comprising an intensity modulated pump laser beam to modulate the reflectivity of a semiconductor sample and a second spectroscopic probe light beam to measure the modulated reflectance of the sample is disclosed. The modulated pump beam is focused onto the sample where it interacts with the sample. The spectroscopic probe beam is focused onto the sample where it is reflected. The reflected probe beam is collected and its constituent wavelengths are dispersed onto a compact photosensor array further comprising a parallel demodulation circuit for each photosensor element. Demodulated signals may then be passed to a computer for recordation and/or further analysis. A fit to the data may then be performed using standard nonlinear regression techniques, thereby providing rapid characterization of the sample material and/or electronic properties.Type: ApplicationFiled: July 30, 2022Publication date: March 16, 2023Inventor: William W. Chism, II
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Publication number: 20220291281Abstract: A precise optical technique for measuring electronic transport properties in semiconductors is disclosed. The sensitivity of the technique to electronic transport properties follows from a simple analytic expression for the Z dependence of a photo-modulated reflectance signal in terms of the (complex) carrier diffusion length. The sensitivity of the technique to electronic transport properties also enables a trained neural network to predict electronic transport properties directly from Z-scan photo-modulated reflectance data. Synthetic data and/or physical constraints may be derived from the analytical expression and incorporated into a machine learning algorithm. Moreover, electronic transport properties as determined or predicted may be used to enable machine learning based control of semiconductor process tools and/or manufacturing processes, including via advanced reinforcement learning algorithms.Type: ApplicationFiled: May 31, 2022Publication date: September 15, 2022Applicant: XCalipr CorporationInventor: William W. Chism, II
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Patent number: 11402429Abstract: A precise optical technique for measuring electronic transport properties in semiconductors is disclosed. Using tightly focused laser beams in a photo-modulated reflectance system, the modulated reflectance signal is measured as a function of the longitudinal (Z) displacement of the sample from focus. The modulated component of the reflected probe beam is a Gaussian beam with its profile determined by the focal parameters and the complex diffusion length. The reflected probe beam is collected and input to the detector, thereby integrating over the radial profile of the beam. This results in a simple analytic expression for the Z dependence of the signal in terms of the complex diffusion length. Best fit values for the diffusion length and recombination lifetime are obtained via a nonlinear regression analysis. The output diffusion lengths and recombination lifetimes and their estimated uncertainties may then be used to evaluate various transport properties and their associated uncertainties.Type: GrantFiled: January 14, 2021Date of Patent: August 2, 2022Inventor: William W. Chism, II
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Publication number: 20210165040Abstract: A precise optical technique for measuring electronic transport properties in semiconductors is disclosed. Using tightly focused laser beams in a photo-modulated reflectance system, the modulated reflectance signal is measured as a function of the longitudinal (Z) displacement of the sample from focus. The modulated component of the reflected probe beam is a Gaussian beam with its profile determined by the focal parameters and the complex diffusion length. The reflected probe beam is collected and input to the detector, thereby integrating over the radial profile of the beam. This results in a simple analytic expression for the Z dependence of the signal in terms of the complex diffusion length. Best fit values for the diffusion length and recombination lifetime are obtained via a nonlinear regression analysis. The output diffusion lengths and recombination lifetimes and their estimated uncertainties may then be used to evaluate various transport properties and their associated uncertainties.Type: ApplicationFiled: January 14, 2021Publication date: June 3, 2021Applicant: XCALIPR CORPORATIONInventor: William W. Chism, II
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Patent number: 10921369Abstract: A precise optical technique for measuring electronic transport properties in semiconductors is disclosed. Using tightly focused laser beams in a photo-modulated reflectance system, the modulated reflectance signal is measured as a function of the longitudinal (Z) displacement of the sample from focus. The modulated component of the reflected probe beam is a Gaussian beam with its profile determined by the focal parameters and the complex diffusion length. The reflected probe beam is collected and input to the detector, thereby integrating over the radial profile of the beam. This results in a simple analytic expression for the Z dependence of the signal in terms of the complex diffusion length. Best fit values for the diffusion length and recombination lifetime are obtained via a nonlinear regression analysis. The output diffusion lengths and recombination lifetimes and their estimated uncertainties may then be used to evaluate various transport properties and their associated uncertainties.Type: GrantFiled: December 27, 2017Date of Patent: February 16, 2021Inventor: William W. Chism, II
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Publication number: 20180188319Abstract: A precise optical technique for measuring electronic transport properties in semiconductors is disclosed. Using tightly focused laser beams in a photo-modulated reflectance system, the modulated reflectance signal is measured as a function of the longitudinal (Z) displacement of the sample from focus. The modulated component of the reflected probe beam is a Gaussian beam with its profile determined by the focal parameters and the complex diffusion length. The reflected probe beam is collected and input to the detector, thereby integrating over the radial profile of the beam. This results in a simple analytic expression for the Z dependence of the signal in terms of the complex diffusion length. Best fit values for the diffusion length and recombination lifetime are obtained via a nonlinear regression analysis. The output diffusion lengths and recombination lifetimes and their estimated uncertainties may then be used to evaluate various transport properties and their associated uncertainties.Type: ApplicationFiled: December 27, 2017Publication date: July 5, 2018Inventor: William W. Chism, II
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Publication number: 20120327420Abstract: A method of z-scan photo-reflectance characterization of semiconductor structures and apparatus for same has been developed. The method and apparatus provides the ability to independently measure electro-refractive and electro-absorptive nonlinearities that occur in conventional photo-reflectance signals. By performing a series of photo-reflectance measurements, each containing photo-modulated nonlinear optical signals, with the sample at a multiplicity of positions along the focal length of the probe light column, and with an aperture fixtured in the reflected probe path, precision characterization of both electro-refractive and electro-absorptive nonlinearities is attained. The Z-scan photo-reflectance method and apparatus characterizes spatial distortions of a coherent photo-reflectance probe light beam due to electro-refractive and electro-absorptive effects.Type: ApplicationFiled: August 31, 2012Publication date: December 27, 2012Inventor: William W. Chism, II
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Patent number: 8300227Abstract: A method of z-scan photo-reflectance characterization of semiconductor structures and apparatus for same has been developed. The method and apparatus provides the ability to independently measure electro-refractive and electro-absorptive nonlinearities that occur in conventional photo-reflectance signals. By performing a series of photo-reflectance measurements, each containing photo-modulated nonlinear optical signals, with the sample at a multiplicity of positions along the focal length of the probe light column, and with an aperture fixtured in the reflected probe path, precision characterization of both electro-refractive and electro-absorptive nonlinearities is attained. The Z-scan photo-reflectance method and apparatus characterizes spatial distortions of a coherent photo-reflectance probe light beam due to electro-refractive and electro-absorptive effects.Type: GrantFiled: February 13, 2009Date of Patent: October 30, 2012Assignee: Xitronix CorporationInventor: William W. Chism, II
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Publication number: 20100315646Abstract: A method of z-scan photo-reflectance characterization of semiconductor structures and apparatus for same has been developed. The method and apparatus provides the ability to independently measure electro-refractive and electro-absorptive nonlinearities that occur in conventional photo-reflectance signals. By performing a series of photo-reflectance measurements, each containing photo-modulated nonlinear optical signals, with the sample at a multiplicity of positions along the focal length of the probe light column, and with an aperture fixtured in the reflected probe path, precision characterization of both electro-refractive and electro-absorptive nonlinearities is attained. The Z-scan photo-reflectance method and apparatus characterizes spatial distortions of a coherent photo-reflectance probe light beam due to electro-refractive and electro-absorptive effects.Type: ApplicationFiled: February 13, 2009Publication date: December 16, 2010Applicant: XITRONIX CORPORATIONInventor: William W. CHISM, II
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Patent number: 7759607Abstract: A new technique and Method of Direct Coulomb Explosion in Laser Ablation of Semiconductor Structures in semiconductor materials is disclosed. The Method of Direct Coulomb Explosion in Laser Ablation of Semiconductor Structures provides activation of the “Coulomb explosion” mechanism in a manner which does not invoke or require the conventional avalanche photoionization mechanism, but rather utilizes direct interband absorption to generate the Coulomb explosion threshold charge densities. This approach minimizes the laser intensity necessary for material removal and provides optimal machining quality. The technique generally comprises use of a femtosecond pulsed laser to rapidly evacuate electrons from a near surface region of a semiconductor or dielectric structure, and wherein the wavelength of the laser beam is chosen such that interband optical absorption dominates the carrier production throughout the laser pulse.Type: GrantFiled: June 20, 2007Date of Patent: July 20, 2010Assignee: Optical Analytics, Inc.Inventor: William W. Chism, II
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Method of photo-reflectance characterization of strain and active dopant in semiconductor structures
Patent number: 7391507Abstract: A new method of photo-reflectance characterization of strain and active dopant in semiconductor structures has been developed for characterization of physical properties of semiconductor structures. The underlying principle of the strain and active dopant characterization technique is to measure photo-reflectance signals occurring nearby to interband transitions in the semiconductor bandstructure and which are highly sensitive to strain and/or active dopant through the effect of the nanometer scale space charge fields induced at the semiconductor surface. To attain this, the present disclosure comprises an intensity modulated pump laser beam and a continuous wave probe laser beam, focused coincident on a semiconductor structure. The pump laser provides approximately 15 mW optical power in the NIR-VIS. The pump light is amplitude modulated by a signal generator operating in the range of 100 kHz-50 MHz.Type: GrantFiled: October 25, 2006Date of Patent: June 24, 2008Assignee: Xitronix CorporationInventor: William W. Chism, II -
Patent number: 7239392Abstract: A polarization modulation photoreflectance technique has been developed for optical characterization of semiconductor electronic interfaces. By using a laser source in conjunction with polarization state modulation, a polarization modulation spectroscopy technique may be used to characterize the optical response of semiconductor materials and structures. Disclosed methods and instruments are suitable for characterization of optical signatures of electronic interfaces, including characterization of electric fields at semiconductor interfaces.Type: GrantFiled: April 4, 2005Date of Patent: July 3, 2007Assignee: Xitronix CorporationInventor: William W. Chism, II
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Patent number: 7122806Abstract: A laser stimulated atom probe for atom probe imaging of dielectric and low conductivity semiconductor materials is disclosed. The laser stimulated atom probe comprises a conventional atom probe providing a field emission tip and ion detector arrangement, a laser system providing a laser short laser pulse and synchronous electronic timing signal to the atom probe, and an optical system for delivery of the laser beam onto the field emitting tip apex. Due to enhanced absorption, it is also possible to realize a photo ionization mechanism, wherein the laser stimulates electronic transitions from the more extended surface atoms, thereby ionizing the surface atom.Type: GrantFiled: June 30, 2004Date of Patent: October 17, 2006Inventor: William W. Chism II
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Patent number: 6963402Abstract: A polarization modulation photoreflectance technique has been developed for optical characterization of semiconductor quantum confined structures. By using a tunable laser source in conjunction with polarization state modulation, a single beam modulation spectroscopy technique may be used to characterize the optical response of semiconductor materials and structures. Disclosed methods and instruments are suitable for characterization of optical signatures of quantum electronic confinement, including resolution of excitonic states at the band edge or other direct or indirect critical points in the band structure. This allows for characterization of semiconductor quantum well structures, for characterization of strain in semiconductor films, and for characterization of electric fields at semiconductor interfaces.Type: GrantFiled: May 17, 2004Date of Patent: November 8, 2005Inventor: William W. Chism, II