Abstract: An apparatus for automatically conditioning a patch plate and a plenum of an electrophysiology measurement system is provided. An arm is linearly movable between a non-operative position and an operative position. An end effector mounted to one side of the arm is configured to condition the patch plate. Another end effector mounted to an opposite side of the arm is configured to condition the plenum. A linear actuator is coupled to the arm and is configured to drive movement of the arm between the operative position and the non-operative position. When the arm is positioned in the operative position, the arm is situated between the patch plate and the plenum.

Abstract: A device for separating materials of different densities is provided. A cup body has an internal cavity configured to hold media. An inner wall defines a central body region having an upper and lower end. The upper end is wider than the lower end. An interior shoulder circumscribes the upper end of the central body region. The interior shoulder defines a neck region above the central body region and a shoulder trap below the neck region. The shoulder trap circumscribes the upper end of the central body region and is wider than the neck region. When the device is spun about a central axis, the media travels upward along the inner wall toward the shoulder trap. Relatively more dense material in the media is collected in the shoulder trap, and relatively less dense material is expelled from the device through an opening above the neck region.

Abstract: An apparatus for automatically conditioning a patch plate and a plenum of an electrophysiology measurement system is provided. An arm is linearly movable between a non-operative position and an operative position. An end effector mounted to one side of the arm is configured to condition the patch plate. Another end effector mounted to an opposite side of the arm is configured to condition the plenum. A linear actuator is coupled to the arm and is configured to drive movement of the arm between the operative position and the non-operative position. When the arm is positioned in the operative position, the arm is situated between the patch plate and the plenum.

Abstract: A device for separating materials of different densities is provided. A cup body has an internal cavity configured to hold media. An inner wall defines a central body region having an upper and lower end. The upper end is wider than the lower end. An interior shoulder circumscribes the upper end of the central body region. The interior shoulder defines a neck region above the central body region and a shoulder trap below the neck region. The shoulder trap circumscribes the upper end of the central body region and is wider than the neck region. When the device is spun about a central axis, the media travels upward along the inner wall toward the shoulder trap. Relatively more dense material in the media is collected in the shoulder trap, and relatively less dense material is expelled from the device through an opening above the neck region.

Abstract: A MEMS-based mirror is provided with trenches between adjacent electrodes in order to be able to withstand relatively high applied voltages, and thus has a substantially reduced exposure to uncontrolled surface potentials. The MEMS-based mirror, thus avoids voltage drifts and has an improved mirror position stability. The trench dimensions are selected such that the voltage applied between each adjacent pair of electrodes stays within predefined limits. An insulating layer, such as silicon dioxide, electrically isolates each pair of adjacent electrodes. Each insulting layer extends partially above an associated trench and is characterized by the same height and width dimensions.

Abstract: A MEMS-based mirror is provided with trenches between adjacent electrodes in order to be able to withstand relatively high applied voltages, and thus has a substantially reduced exposure to uncontrolled surface potentials. The MEMS-based mirror, thus avoids voltage drifts and has an improved mirror position stability. The trench dimensions are selected such that the voltage applied between each adjacent pair of electrodes stays within predefined limits. An insulating layer, such as silicon dioxide, electrically isolates each pair of adjacent electrodes. Each insulting layer extends partially above an associated trench and is characterized by the same height and width dimensions.

Abstract: An electron beam lithography system includes a laser for generating a laser beam, and a beam splitter for splitting the laser beam into a plurality of light beams. The intensity of the light beams is individually modulated. The light beams are of sufficient energy such that, when they impinge on a photocathode, electrons are emitted. Modulation of the light beams controls modulation of the resulting electron beams. The electron beams are provided to an electron column for focusing and scanning control. Finally, the electron beams are used to write a scanning surface, for example, using an interlaced writing strategy.

Abstract: An electron beam lithography system includes a laser for generating a laser beam, and a beam splitter for splitting the laser beam into a plurality of light beams. The intensity of the light beams is individually modulated. The light beams are of sufficient energy such that, when they impinge on a photocathode, electrons are emitted. Modulation of the light beams controls modulation of the resulting electron beams. The electron beams are provided to an electron column for focusing and scanning control. Finally, the electron beams are used to write a scanning surface, for example, using an interlaced writing strategy.