Patents by Inventor Woan-Shiow Tzeng

Woan-Shiow Tzeng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8575079
    Abstract: A lube oil composition is provided. The lube oil composition includes a base oil and a carbon nanocapsule grafting with an alkyl group dispersed in the base oil, wherein the carbon nanocapsule is hollow or filled with metal, metal alloy, metal oxide, metal carbide, metal sulfide, metal nitride or metal boride.
    Type: Grant
    Filed: May 2, 2008
    Date of Patent: November 5, 2013
    Assignee: Industrial Technology Research Institute
    Inventors: Gan-Lin Hwang, Ting-Yao Su, Woan-Shiow Tzeng, Hsin-Yi Wu
  • Publication number: 20090170733
    Abstract: A lube oil composition is provided. The lube oil composition includes a base oil and a carbon nanocapsule grafting with an alkyl group dispersed in the base oil, wherein the carbon nanocapsule is hollow or filled with metal, metal alloy, metal oxide, metal carbide, metal sulfide, metal nitride or metal boride.
    Type: Application
    Filed: May 2, 2008
    Publication date: July 2, 2009
    Inventors: Gan-Lin HWANG, Ting-Yao Su, Woan-Shiow Tzeng, Hsin-Yi Wu
  • Patent number: 7544308
    Abstract: Dichroic dyes, compositions thereof, and liquid crystal compositions, microencapsulated liquid crystal compositions and liquid-crystal display elements employing the same. The dichroic dyes have high photostability in addition to excellent solubility. Furthermore, the liquid crystal composition employing the above dichroic dyes can have an orientational order parameter more than 0.7.
    Type: Grant
    Filed: December 29, 2005
    Date of Patent: June 9, 2009
    Assignee: Industrial Technology Research Institute
    Inventors: Shih-Hsien Liu, Yang-Chu Lin, Woan-Shiow Tzeng, Chih-Lin Su, Kung-Lung Cheng
  • Publication number: 20060147652
    Abstract: Dichroic dyes, compositions thereof, and liquid crystal compositions, microencapsulated liquid crystal compositions and liquid-crystal display elements employing the same. The dichroic dyes have high photostability in addition to excellent solubility. Furthermore, the liquid crystal composition employing the above dichroic dyes can have an orientational order parameter more than 0.7.
    Type: Application
    Filed: December 29, 2005
    Publication date: July 6, 2006
    Inventors: Shih-Hsien Liu, Yang-Chu Lin, Woan-Shiow Tzeng, Chih-Lin Su, Kung-Lung Cheng
  • Patent number: 6861106
    Abstract: Dichroic dyes, dichroic dye compositions, and liquid crystal composition and liquid crystal display element containing the dichroic dyes. The dichroic dye has increased solubility and stability.
    Type: Grant
    Filed: May 23, 2003
    Date of Patent: March 1, 2005
    Assignee: Industrial Technology Research Institute
    Inventors: Shih-Hsien Liu, Yang-Chu Lin, Woan-Shiow Tzeng, Jie-Hwa Ma, Kung-Lung Cheng, Long-Li Lai
  • Publication number: 20040135117
    Abstract: Dichroic dyes, dichroic dye compositions, and liquid crystal composition and liquid crystal display element containing the dichroic dyes. The dichroic dye has increased solubility and stability.
    Type: Application
    Filed: May 23, 2003
    Publication date: July 15, 2004
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Shih-Hsien Liu, Yang-Chu Lin, Woan-Shiow Tzeng, Jie-Hwa Ma, Kung-Lung Cheng, Long-Li Lai
  • Patent number: 6498226
    Abstract: This invention provides cycloaliphatic polyimide having the following formula (I): wherein 1 and n are integers from 4 to 7; m is an integer from 0 to 2; p is an integer from 1 to 8; polycyclic aliphatic compound R reprents C1-8 cycloalkyl, cycloalkenyl, cycloalkynyl, norbornenyl, decalinyl, adamantanyl, or cubanyl. That cycloaliphatic polyimide can be a through transparent film, their thermal stability is over 430° C. and dielectric constant is about 2.7.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: December 24, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Kung-Lung Cheng, Shu-Chen Lin, Wen-Ling Lui, Chih-Hsiang Lin, Wei-Ling Lin, Woan-Shiow Tzeng
  • Publication number: 20020120090
    Abstract: This invention provides cycloaliphatic polyimide having the following formula (I): 1
    Type: Application
    Filed: May 3, 2001
    Publication date: August 29, 2002
    Applicant: Industrial Technology Research Institute
    Inventors: Kung-Lung Cheng, Shu-Chen Lin, Wen-Ling Lui, Chih-Hsiang Lin, Wei-Ling Lin, Woan-Shiow Tzeng
  • Patent number: 6313314
    Abstract: The present invention provides a novel method for the preparation of N-azidosulfonyl-arylimides, which are known as photo-initiators. At the outset, substitution reaction of 4-acetamidobenzenesulfonyl halide with MN3 (M denotes hydrogen or alkaline metal) provides the corresponding azide. After de-protection to remove the actyl group, aminoarylsulfonyl azide is extracted with organic solvent, and the extract is directly used for addition reaction with maleic anhydride without concentration. Finally, end products are obtained by dehydration of the addition products using acetic anhydride/metal acetate, followed by re-crystallization in alcohol solvent. The end products are obtained in purer form and greater yield than that in conventional methods.
    Type: Grant
    Filed: August 7, 2000
    Date of Patent: November 6, 2001
    Assignee: Industrial Technology Research Institute
    Inventors: Kung-Lung Cheng, Shu-Chen Lin, Woan-Shiow Tzeng, Se-Tsun Hong
  • Patent number: 5948923
    Abstract: A number of new phenolepoxy resins are prepared by reacting polyphenol, epihalohydrin and imidazole in a homogeneous reaction medium.
    Type: Grant
    Filed: October 30, 1998
    Date of Patent: September 7, 1999
    Assignee: Industrial Technology Research Institute
    Inventors: Kung-Lung Cheng, Woan-Shiow Tzeng, Shu-Chen Lin
  • Patent number: 5844062
    Abstract: A process for preparing phenolepoxy resin represented by the following formula: ##STR1## wherein: (a) R.sup.1, R.sup.2, R.sup.3, and R.sup.4, which can be the same or different, are hydrogen, C.sub.1 to C.sub.6 alkyl groups, C.sub.6 to C.sub.10 aromatic groups, or C.sub.1 to C.sub.6 alkyl group-substituted C.sub.6 to C.sub.10 aromatic groups; (b) R.sup.5 and R.sup.6, which can be the same or different, are hydrogen, C.sub.1 to C.sub.6 alkyl groups, C.sub.6 to C.sub.10 aromatic groups, or C.sub.1 to C.sub.6 alkyl group-substituted C.sub.6 to C.sub.10 aromatic groups; ##STR2## (c) R.sup.7 is hydrogen, C.sub.1 to C.sub.6 alkyl groups, C.sub.6 to C.sub.10 aromatic groups, or C.sub.1 to C.sub.6 alkyl group-substituted C.sub.6 to C.sub.10 aromatic groups; (d) R.sup.8 and R.sup.9, which can be the same of different, are hydrogen, C.sub.1 to C.sub.6 alkyl groups, C.sub.6 to C.sub.10 aromatic groups, or C.sub.1 to C.sub.6 alkyl group-substituted C.sub.6 to C.sub.10 aromatic groups; and (e) n is an integer of 0 or 1.
    Type: Grant
    Filed: April 29, 1997
    Date of Patent: December 1, 1998
    Assignee: Industrial Technology Research Institute
    Inventors: Kung-Lung Cheng, Woan-Shiow Tzeng, Shu-Chen Lin