Patents by Inventor Won-hyung Lee

Won-hyung Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040082171
    Abstract: Disclosed are PEALD (plasma-enhanced atomic layer deposition) apparatus and PEALD method for manufacturing a semiconductor device, the PEALD apparatus comprising: a housing including a reaction chamber in which a deposition reaction is performed; a rotary disk unit installed in the housing and provided with a plurality of susceptors for receiving wafers thereon so as to move the wafers; a gas spray unit mounted on the upper end of the housing above the rotary disk unit, and provided with first reactive gas sprayers, second reactive gas sprayers and inert gas sprayers on a lower surface of a circular disk for spraying respective gases into the housing; a gas feed unit connected to the gas spray unit for supplying first and second reactive gases and a purge gas into the housing; a gas exhaust port formed around the rotary disk unit; and a plasma generator for generating plasma to excite the second reactive gas.
    Type: Application
    Filed: September 11, 2003
    Publication date: April 29, 2004
    Inventors: Cheol Ho Shin, Byoung Ha Cho, Sang Tae Sim, Jung Soo Kim, Won Hyung Lee, Deo Sik Kim
  • Patent number: 6656282
    Abstract: Disclosed are an apparatus for and a process of atomic layer deposition using remote plasma. A thin film is deposited to a desired thickness on a wafer by use of the apparatus, which comprises a plurality of transfer pipes for individually transferring the first and the second reactive gas and the carrier gas to the vacuum chamber; an energy supplier, provided inside the transfer pipe for transferring the first and the second reactive gas, for supplying excitation energy to generate excited plasma to ionize the first reactive gas; and a valve controller, established in the transfer pipes, for alternately feeding into the vacuum chamber the second reactive gas and the first reactive gas ionized by the plasma excited in the energy supplier, at predetermined time intervals.
    Type: Grant
    Filed: October 11, 2001
    Date of Patent: December 2, 2003
    Assignee: Moohan Co., Ltd.
    Inventors: Yong-Il Kim, Won-Hyung Lee, Byung-Ha Cho
  • Publication number: 20030203113
    Abstract: The present invention relates to a method for forming silicon oxide films on substrates using an atomic layer deposition process. Specifically, the silicon oxide films are formed at low temperature and high deposition rate via the atomic layer deposition process using a Si2Cl6 source unlike a conventional atomic layer deposition process using a SiCl4 source. The atomic layer deposition apparatus used in the above process can be in-situ cleaned effectively at low temperature using a HF gas or a mixture gas of HF gas and gas containing —OH group.
    Type: Application
    Filed: April 23, 2003
    Publication date: October 30, 2003
    Inventors: Byoung Ha Cho, Yong Il Kim, Cheol Ho Shin, Won Hyung Lee, Jung Soo Kim, Sang Tae Sim
  • Publication number: 20030070617
    Abstract: Disclosed are an apparatus for and a process of atomic layer deposition using remote plasma. A thin film is deposited to a desired thickness on a wafer by use of the apparatus, which comprises a plurality of transfer pipes for individually transferring the first and the second reactive gas and the carrier gas to the vacuum chamber; an energy supplier, provided inside the transfer pipe for transferring the first and the second reactive gas, for supplying excitation energy to generate excited plasma to ionize the first reactive gas; and a valve controller, established in the transfer pipes, for alternately feeding into the vacuum chamber the second reactive gas and the first reactive gas ionized by the plasma excited in the energy supplier, at predetermined time intervals.
    Type: Application
    Filed: October 11, 2001
    Publication date: April 17, 2003
    Inventors: Yong-Il Kim, Won-Hyung Lee, Byung-Ha Cho
  • Patent number: 6385424
    Abstract: An electrophotographic printing apparatus having a structure so that differences between surface energies of components of the electrophotographic printing apparatus contributing to image transfer are maintained within predetermined ranges, and an image transferring method thereof. The electrophotographic printing apparatus includes a photosensitive medium, developing units, a drying roller and a transfer unit having a transfer roller, whereby the peeling force (PFD) of the drying roller is in a range of 0 gram force per inch (gf/inch)≦PFD≦300 gram force per inch (gf/inch), the peeling force (PFO) of the photosensitive medium is in a range of 0 gram force per inch (gf/inch)≦PFO≦80 gram force per inch (gf/inch), and the peeling force (PFT) of the transfer roller is in a range of 200 gram force per inch (gf/inch)≦PFT≦500 gram force per inch (gf/inch), respectively, when the peeling forces are measured.
    Type: Grant
    Filed: September 21, 2000
    Date of Patent: May 7, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Won-hyung Lee, Kyu-cheol Shin, Hyung-jin Ahn
  • Patent number: 6352807
    Abstract: A photoreceptor web for an image forming apparatus includes a base layer, a conductive ground layer formed on the base layer, and a photosensitive layer formed on the ground layer, where an electrostatic latent image is formed by scanned light. A first protective layer is formed on the photosensitive layer for protecting the photosensitive layer, and a heating layer is formed on a rear surface of the base layer in a predetermined pattern for receiving electric power and generating resistance heat. The photoreceptor web is maintained at a constant temperature by the resistance heat generated by the heating layer.
    Type: Grant
    Filed: September 29, 2000
    Date of Patent: March 5, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Won-hyung Lee, Wan-ha Kim, Seung-deog An
  • Patent number: 6292278
    Abstract: A beam scanning system including: a light source; a deflection disc rotatably installed over the light sources and having a hologram pattern on each of the upper and lower surfaces thereof, for diffracting beams emitted from the light source; and a plurality of mirrors for reflecting beams that have been diffracted by the deflection disc, to change the diffracted paths of the beams. Each of the upper and lower hologram patterns is formed with a low density relative to a one-sided hologram pattern.
    Type: Grant
    Filed: November 9, 1999
    Date of Patent: September 18, 2001
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung-min Cho, Won-hyung Lee, Hwan-young Choi, Moon-gyu Lee, Jee-hong Min, Young-il Kim, Jin-seung Choi, Jae-yong Eum
  • Patent number: 6195517
    Abstract: An apparatus and a method of removing a photoreceptor belt from an electrophotographic printer are provided. The apparatus includes at least one pair of rollers for pressing and transferring the photoreceptor belt circulating in a predetermined traveling track, a cutting blade capable of cutting the photoreceptor belt while moving across the photoreceptor belt, a cylindrical member rotatably installed in a filter housing disposed near the photoreceptor belt, the filter housing having a filter cartridge for filtering foreign material of the inner air of the printer, and a driver for rotating the cylindrical member such that the photoreceptor belt is wound around the cylindrical member. The photoreceptor belt is cut and automatically drawn from the traveling track into the filter housing. The cut photoreceptor belt is removed together with the filter cartridge installed in the filter housing.
    Type: Grant
    Filed: December 27, 1999
    Date of Patent: February 27, 2001
    Assignee: Samsung Electronics, Co., Ltd.
    Inventors: Woo-yong Park, Won-hyung Lee, Kwang-ho No
  • Patent number: 6185017
    Abstract: A diffractive deflection beam scanning system including: a plurality of light sources; a deflection disc rotatably mounted over the light sources, having patterns capable of diffracting and deflecting beams emitted from the light sources; a plurality of first reflecting mirrors for changing the traveling paths of beams diffracted and deflected by the deflection disc; a plurality of second reflecting mirrors for reflecting the beams reflected by the first reflecting mirrors in a beam scan direction, wherein the light sources are disposed in a straight line along a bisecting line of the deflection disc, perpendicular to the beam scan direction, and the second reflecting mirrors are arranged over the center of the deflection disc at different heights.
    Type: Grant
    Filed: November 9, 1999
    Date of Patent: February 6, 2001
    Assignee: Samsung Electronics., Ltd.
    Inventors: Sung-min Cho, Won-hyung Lee, Hwan-young Choi, Moon-gyu Lee, Jee-hong Min, Young-il Kim, Jin-seung Choi, Jae-yong Eum
  • Patent number: 6181448
    Abstract: A multi-laser scanning unit (LSU) in which scanning lines incident parallel onto a photoreceptor have the same scanning direction. The multi-laser scanning unit includes: a driving source for providing a rotatory force; a deflection disk installed around a rotary shaft of the driving source having a plurality of sectors each with a hologram pattern for diffracting and deflecting incident light, for scanning light through rotation; a plurality of light sources installed facing one surface of the deflection disk for irradiating a plurality of light lines onto predetermined points of the deflection disk; and a light path changing portion for changing traveling paths of the plurality of scanning lines formed by the rotation of the deflection disk, wherein the plurality of light sources are arranged such that two incident points which are the farthest from each other among the plurality of incident points formed on the deflection disk form 180° with the center point of the deflection disk.
    Type: Grant
    Filed: October 26, 1999
    Date of Patent: January 30, 2001
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hwan-young Choi, Won-hyung Lee, Sung-min Cho, Moon-gyu Lee, Jee-hong Min, Young-il Kim, Jin-seung Choi, Jae-yong Eum
  • Patent number: 6101342
    Abstract: A developer contamination measuring apparatus of a printer includes a first pipe portion having a first gap and a second pipe portion having a second gap, a light emitting unit radiating light to the first pipe portion and the second pipe portion, a light detecting unit detecting light reflected or transmitted from the first pipe portion and the second pipe portion to output first and second light receiving signals, respectively, and a developer contamination measuring unit controlling the light emitting unit, and calculating the degree of a contamination due to mixing of other developing materials with the developer from the first and the second light receiving signals. Thus, the degree of contamination of a developer mixed with other developing materials can be precisely calculated, and the developer can be replaced, when the calculated amount of contamination exceeds a predetermined allowable contamination level, to thereby prevent deterioration of print quality.
    Type: Grant
    Filed: October 27, 1999
    Date of Patent: August 8, 2000
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yoon-seop Eom, Won-hyung Lee, Yong-baek Yoo
  • Patent number: 6032010
    Abstract: An ink supply apparatus for a wet electrophotographic printer. The ink supply apparatus includes a housing having an installation portion, an ink cartridge installed in the housing, for supplying ink to a developing unit, a detachable refill cartridge loaded in the installation portion, for supplying ink to the ink cartridge, and an ink supply device for supplying ink to the ink cartridge from the refill cartridge.
    Type: Grant
    Filed: June 16, 1998
    Date of Patent: February 29, 2000
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jong-woo Kim, Chung-guk Baek, Won-hyung Lee
  • Patent number: 6018409
    Abstract: A multi-beam scanning apparatus includes at least two optical sources, a beam deflector having a deflection disc with a plurality of sectors for diffracting and transmitting incident beams, and a driving source for rotating the deflection disc, for deflecting and projecting beams emitted from the optical sources. A beam corrector installed along a light path, for correcting the beams deflected by the beam deflector.
    Type: Grant
    Filed: June 2, 1998
    Date of Patent: January 25, 2000
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jae-yong Eum, Won-hyung Lee, Cheol-young Han, Gary H. Conners