Patents by Inventor Won-Young Song
Won-Young Song has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240169871Abstract: A display device includes a substrate including a display area and a non-display area disposed near the display area, a plurality of pixels disposed in the display area, a plurality of signal lines disposed on the substrate and connected to the pixels, and a pad portion disposed in the non-display area and including a plurality of pads. The signal lines include a first crack detecting line connected to a first test voltage pad and a first pad at a first node, connected to a second pad at a second node, and extending around the non-display area between the first node and the second node, as well as a first data line including a first end connected to a first transistor connected to the first crack detecting line at the second node, and a second end connected to corresponding pixels from among the plurality of pixels.Type: ApplicationFiled: January 22, 2024Publication date: May 23, 2024Applicant: Samsung Display Co., LTD.Inventors: Kwang Sae LEE, Ji-Hyun KA, Won Kyu KWAK, Hwa Young SONG, Ki Myeong EOM
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Patent number: 11928994Abstract: A display device includes a substrate including a display area and a non-display area disposed near the display area, a plurality of pixels disposed in the display area, a plurality of signal lines disposed on the substrate and connected to the pixels, and a pad portion disposed in the non-display area and including a plurality of pads. The signal lines include a first crack detecting line connected to a first test voltage pad and a first pad at a first node, connected to a second pad at a second node, and extending around the non-display area between the first node and the second node, as well as a first data line including a first end connected to a first transistor connected to the first crack detecting line at the second node, and a second end connected to corresponding pixels from among the plurality of pixels.Type: GrantFiled: June 4, 2019Date of Patent: March 12, 2024Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Kwang Sae Lee, Ji-Hyun Ka, Won Kyu Kwak, Hwa Young Song, Ki Myeong Eom
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Publication number: 20230324446Abstract: A method of focusing radio wave energy at a focusing target point, which is performed by a processor, may comprise: generating an electromagnetic numerical model of an object including the focusing target point; predicting radio wave focusing points inside the object using radio wave characteristic information of a radio wave radiation module and the electromagnetic numerical model; optimizing one or more focusing parameters such that radio wave energy reaching one or more unnecessary focusing points other than the focusing target point among the radio wave focusing points inside the object is reduced; and radiating radio waves based on the optimized focusing parameters.Type: ApplicationFiled: October 31, 2022Publication date: October 12, 2023Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTEInventors: Won Young SONG, Kwang Jae LEE, Soon Ik JEON
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Publication number: 20230299476Abstract: A method of focusing radio waves, which is performed by a processor, may comprise: generating an anatomic numerical model for electromagnetic analysis inside a living body including a focusing target; calculating a current distribution, in which radio waves are focusable at a target depth inside the living body, based on the anatomic numerical model; and extracting a pattern combination of antenna modules in which the calculated current distribution is implementable, wherein the pattern combination is formed by controlling one or more antenna elements configured to radiate radio waves through switches individually coupled to two or more antenna elements.Type: ApplicationFiled: November 7, 2022Publication date: September 21, 2023Applicant: Electronics and Telecommunications Research InstituteInventors: Kwang Jae LEE, Won Young SONG, Soon Ik JEON
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Publication number: 20160021959Abstract: According to an embodiment of the present invention, a hat comprises a hat body put on a user's head and a visor externally projecting from the hat body. The visor comprises a pair of upper and lower external layers and a core material formed between the pair of upper and lower external layers. The core material includes a base material formed of polyethylene terephthalate (PET) fabric and a variable resin layer formed by applying a thermoplastic resin having a low melting point onto the base material, The variable resin layer is formed of a low melting point thermoplastic polyester resin with a softening point of 80° C. to 110° C.Type: ApplicationFiled: July 7, 2015Publication date: January 28, 2016Inventor: WON YOUNG SONG
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Phosphor, light emitting device, surface light source device, display device and illumination device
Patent number: 9200200Abstract: There are provided a phosphor, a light emitting device, a surface light source device, a display device and an illumination device. The phosphor includes an ?-type Si3N4 crystal structure and includes oxynitride represented by an empirical formula CaxEuyMzSi12-(m+n)Aln+mOnN16-n, wherein M is at least one selected from a group consisting of Sr, Lu, La and Ba, and satisfies 0.5?x?1.1, 0.00005?y?0.09, 1.0?m?3.6, 0.001?n?0.2, and 0.00001?z?0.1.Type: GrantFiled: May 18, 2012Date of Patent: December 1, 2015Assignee: Samsung Electronics Co., Ltd.Inventors: Woo-Jung Park, Bong-Goo Yun, Won-Young Song, Jeong-Eun Yun, Tae-Min Ahn, Chul-Soo Yoon -
Patent number: 9127204Abstract: Disclosed is a method for preparing a fluorescent substance, which is represented by the formula M1-zEuzSiaObNc (M=Sr1-x-yBaxCay, 0 x 0.5, 0 y 0.2, 0<z 0.3, 2 a 2.5, 1.5 b 2, and 2 c 2.5), and the present invention provides the method for preparing a nitride-based fluorescent substance comprising the following steps: a preliminary firing step further comprising a first firing step of creating a first firing product by mixing and firing a first precursor group including an M precursor and a first silicon precursor, and a second firing step of creating a second firing product by mixing and firing a second precursor group including an Eu precursor and a second silicon precursor; and a secondary firing step of mixing and firing the first firing product and the second firing product.Type: GrantFiled: September 27, 2011Date of Patent: September 8, 2015Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Bong Goo Yun, Woo Jung Park, Won Young Song, Jeong Eun Yun, Tae Min Ahn, Chul Soo Yoon, Young Il Kim
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Patent number: 9009861Abstract: Provided is a fusion measurement apparatus which increases or maximizes the reliability of a measurement. The fusion measurement apparatus includes an atomic microscope for measuring a surface of a substrate at an atomic level, an electron microscope for measuring the atomic microscope and the substrate, and at least one electrode which distorts the path of a secondary electron on the substrate covered by a cantilever of the atomic microscope so that the secondary electron proceeds to an electron detector of the electron microscope.Type: GrantFiled: June 24, 2011Date of Patent: April 14, 2015Assignee: Korea Research Institute of Standards and ScienceInventors: Byong Chon Park, Ju Youb Lee, Woon Song, Jin Ho Choi, Sang Jung Ahn, Joon Lyou, Won Young Song, Jae Wan Hong, Seung Hun Baek
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Publication number: 20140130212Abstract: Provided is a fusion measurement apparatus which increases or maximizes the reliability of a measurement. The fusion measurement apparatus includes an atomic microscope for measuring a surface of a substrate at an atomic level, an electron microscope for measuring the atomic microscope and the substrate, and at least one electrode which distorts the path of a secondary electron on the substrate covered by a cantilever of the atomic microscope so that the secondary electron proceeds to an electron detector of the electron microscope.Type: ApplicationFiled: June 24, 2011Publication date: May 8, 2014Inventors: Byong Chon Park, Ju Youb Lee, Woon Song, Jin Ho Choi, Sang Jung Ahn, Joon Lyou, Won Young Song, Jae Wan Hong, Seung Hun Baek
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PHOSPHOR, LIGHT EMITTING DEVICE, SURFACE LIGHT SOURCE DEVICE, DISPLAY DEVICE AND ILLUMINATION DEVICE
Publication number: 20140104874Abstract: There are provided a phosphor, a light emitting device, a surface light source device, a display device and an illumination device. The phosphor includes an ?-type Si3N4 crystal structure and includes oxynitride represented by an empirical formula CaxEuyMzSi12?(m+n)Aln+mOnN16?n, wherein M is at least one selected from a group consisting of Sr, Lu, La and Ba, and satisfies 0.5?x?1.1, 0.00005?y?0.09, 1.0?m?3.6, 0.001?n?0.2, and 0.00001?z?0.1.Type: ApplicationFiled: May 18, 2012Publication date: April 17, 2014Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Woo-Jung Park, Bong-Goo Yun, Won-Young Song, Jeong-Eun Yun, Tae-Min Ahn, Chul-Soo Yoon -
Patent number: 8592235Abstract: A method for preparing a phosphor includes: dissolving at least one metal as a raw material of a desired phosphor in liquid ammonia to form a metal-amide type precursor; gathering the metal-amide type precursor; and firing the precursor to form a desired phosphor.Type: GrantFiled: December 2, 2011Date of Patent: November 26, 2013Assignee: Samsung Electronics Co., Ltd.Inventors: Youn Gon Park, Chul Soo Yoon, Won Young Song, Sang Hyun Kim, Hyong Sik Won
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Publication number: 20130264597Abstract: Disclosed is a method for preparing a fluorescent substance, which is represented by the formula M1-zEuzSiaObNc (M=Sr1-x-yBaxCay, 0 x 0.5, 0 y 0.2, 0<z 0.3, 2 a 2.5, 1.5 b 2, and 2 c 2.5), and the present invention provides the method for preparing a nitride-based fluorescent substance comprising the following steps: a preliminary firing step further comprising a first firing step of creating a first firing product by mixing and firing a first precursor group including an M precursor and a first silicon precursor, and a second firing step of creating a second firing product by mixing and firing a second precursor group including an Eu precursor and a second silicon precursor; and a secondary firing step of mixing and firing the first firing product and the second firing product.Type: ApplicationFiled: September 27, 2011Publication date: October 10, 2013Inventors: Bong Goo Yun, Woo Jung Park, Won Young Song, Jeong Eun Yun, Tae Min Ahn, Chul Soo Yoon, Young II Kim
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Patent number: 8434159Abstract: Provided are an AFM measuring method and a system thereof. The tip of a cantilever is provided to a plurality of points on a substrate, to which incident light is radiated from a light source. Scattered light is generated between the tip of the cantilever and the substrate by the incident light and the intensity of the scattered light is measured. The measured intensity of the scattered light is input to a data processing unit so as to find a point where the intensity of the incident is highest. The tip of the cantilever is moved to the point where the intensity of the incident light is highest.Type: GrantFiled: April 5, 2010Date of Patent: April 30, 2013Assignee: Nanofocus, Inc.Inventors: Jae Wan Hong, Won Young Song
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Publication number: 20120138992Abstract: A method for preparing a phosphor includes: dissolving at least one metal as a raw material of a desired phosphor in liquid ammonia to form a metal-amide type precursor; gathering the metal-amide type precursor; and firing the precursor to form a desired phosphor.Type: ApplicationFiled: December 2, 2011Publication date: June 7, 2012Inventors: Youn Gon PARK, Chul Soo Yoon, Won Young Song, Sang Hyun Kim, Hyong Sik Won
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Publication number: 20120117695Abstract: Provided are an AFM measuring method and a system thereof. The tip of a cantilever is provided to a plurality of points on a substrate, to which incident light is radiated from a light source. Scattered light is generated between the tip of the cantilever and the substrate by the incident light and the intensity of the scattered light is measured. The measured intensity of the scattered light is input to a data processing unit so as to find a point where the intensity of the incident is highest. The tip of the cantilever is moved to the point where the intensity of the incident light is highest.Type: ApplicationFiled: April 5, 2010Publication date: May 10, 2012Applicant: NANOFOCUS INC.Inventors: Jae Wan Hong, Won Young Song
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Patent number: 8153338Abstract: An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron microscope configured to navigate the repairing atomic electron microscope to the defective portion of the photo mask and to observe the photo mask repair process, and an imaging atomic microscope configured to image in-situ a shape of a repaired photo mask.Type: GrantFiled: July 29, 2010Date of Patent: April 10, 2012Assignees: Nanofocus Inc., Korea Research Institute of Standards and ScienceInventors: Byong Chon Park, Sang Jung Ahn, Jin Ho Choi, Joon Lyou, Jae Wan Hong, Won Young Song, Ki Young Jung
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Publication number: 20110116529Abstract: A label for indicating a history of high-temperature exposure includes an internal substance and an external substance surrounding the internal substance. The internal substance and the external substance may be separated into respective frozen solid bodies at low temperatures, the internal and external substances having colors that are different from each other, and at least one of the internal substance and the external substance may convert to a liquid phase and the internal and external substances may be naturally mixed when the substances are exposed to high temperatures higher than the low temperatures for a predetermined amount time, and indicate the history of high temperature exposure without being restored to the initial forms of their frozen solid bodies even when refrozen or re-cold stored.Type: ApplicationFiled: January 21, 2011Publication date: May 19, 2011Inventors: Won Young SONG, Deukyou YOON
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Publication number: 20110027698Abstract: An apparatus for repairing a photo mask, including a repairing atomic force microscope configured to repair a defective portion of the photo mask in a photo mask repair process, an electron microscope configured to navigate the repairing atomic electron microscope to the defective portion of the photo mask and to observe the photo mask repair process, and an imaging atomic microscope configured to image in-situ a shape of a repaired photo mask.Type: ApplicationFiled: July 29, 2010Publication date: February 3, 2011Inventors: Byong Chon Park, Sang Jung Ahn, Jin Ho Choi, Joon Lyou, Jae Wan Hong, Won Young Song, Ki-Young Jung
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Patent number: 7703147Abstract: The present disclosure relates to a method for fabricating a scanning probe microscope (SPM) nanoneedle probe using an ion beam, a SPM nanoneedle probe, a method of fabricating a critical dimension scanning probe microscope (CD-SPM) nanoneedle probe using an ion beam, a CD-SPM nanoneedle probe, and uses thereof. A disclosed method can comprise: positioning the probe so that a tip of the probe on which the nanoneedle is attached faces toward a direction in which the ion beam is irradiated; and aligning the nanoneedle attached on the tip of the probe with the ion beam in parallel by irradiating the ion beam toward the tip of the probe on which the nanoneedle is attached.Type: GrantFiled: July 1, 2005Date of Patent: April 20, 2010Assignee: Korea Research Institute of Standards and ScienceInventors: Byong-Cheon Park, Ki-Young Jung, Won-Young Song, Jae-Wan Hong, Beom-Hoan O, Sang-Jung Ahn
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Publication number: 20090106869Abstract: The present invention relates to a method for fabricating a scanning probe microscope (SPM) nanoneedle probe using ion beam which is preferably focused ion beam and a nanoneedle probe thereby. More particularly, the present invention relates to a method for fabricating a SPM nanoneedle probe capable of being easily adjusted with an intended pointing direction of a nanoneedle attached on a tip of the SPM nanoneedle probe and of being easily straightened with the nanoneedle attached on the tip of the SPM nanoneedle probe along the intended pointing direction, and to a SPM nanoneedle probe thereby. Also, the present invention relates to a method for fabricating a critical dimension SPM (CD-SPM) nanoneedle probe capable of precisely scanning the sidewall of an sample object in nanoscale using ion beam which is preferably focused ion beam, and to a CD-SPM nanoneedle probe thereby.Type: ApplicationFiled: July 1, 2005Publication date: April 23, 2009Applicant: KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCEInventors: Byong-Cheon Park, Ki-Young Jung, Won-Young Song, Jae-Wan Hong, Beom-Hoan O, Sang-Jung Ahn