Patents by Inventor Won Jin BAN

Won Jin BAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for generating plasma uniformly on dielectric material
    Patent number: 10184181
    Abstract: The present invention relates to a method for checking a discharge inception voltage of a dielectric material, a method for forming a displacement field on the dielectric materials comprising applying a voltage the same as or higher than the discharge inception voltage generated by an external field obtained from the above to the dielectric material to which electrodes are connected, a method for forming plasma on the surfaces of the dielectric material comprising injecting reaction gases and applying a voltage the same as or higher than the discharge inception voltage obtained above to the dielectric material to which electrodes are connected, a method for forming a displacement field on the entire surface of the dielectric material comprising applying a voltage the same as or higher than the discharge inception voltage obtained above to the dielectric material to which electrodes are connected, and a dielectric material which is modified, in which the surfaces thereof are treated with plasma by the methods
    Type: Grant
    Filed: September 4, 2015
    Date of Patent: January 22, 2019
    Assignee: Research & Business Foundation SUNGKYUNKWAN UNIVERSITY
    Inventors: Dong Geun Jung, Yong Ki Cho, Won Jin Ban
  • METHOD FOR GENERATING PLASMA UNIFORMLY ON DIELECTRIC MATERIAL
    Publication number: 20160068960
    Abstract: The present invention relates to a method for checking a discharge inception voltage of a dielectric material, a method for forming a displacement field on the dielectric materials comprising applying a voltage the same as or higher than the discharge inception voltage generated by an external field obtained from the above to the dielectric material to which electrodes are connected, a method for forming plasma on the surfaces of the dielectric material comprising injecting reaction gases and applying a voltage the same as or higher than the discharge inception voltage obtained above to the dielectric material to which electrodes are connected, a method for forming a displacement field on the entire surface of the dielectric material comprising applying a voltage the same as or higher than the discharge inception voltage obtained above to the dielectric material to which electrodes are connected, and a dielectric material which is modified, in which the surfaces thereof are treated with plasma by the methods
    Type: Application
    Filed: September 4, 2015
    Publication date: March 10, 2016
    Applicant: Research & Business Foundation Sungkyunkwan University
    Inventors: Dong Geun JUNG, Yong Ki CHO, Won Jin BAN