Patents by Inventor Woo-Jae CHUNG

Woo-Jae CHUNG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11957697
    Abstract: Disclosed is a viral receptor that contains a sialic acid compound at one side thereof to provide binding affinity to a virus, and contains a lipid at the other side thereof, and that can be widely used for the treatment of viral infections based on this characteristic.
    Type: Grant
    Filed: September 17, 2021
    Date of Patent: April 16, 2024
    Assignee: MVRIX CO., LTD.
    Inventors: Woo Jae Chung, Dae Hyuk Kweon, Jinhyo Chung, Caleb Hong
  • Patent number: 11541100
    Abstract: The present invention relates to a nanoperforator having a lipid-bilayer nanodisc and a membrane-structured protein surrounding the nanodisc and to a pharmaceutical composition having the nanoperforator as an active ingredient for preventing or treating viral infectious diseases. The use of the lipid-bilayer nanoperforator provided in the present invention can lead to the safe prevention or treatment of a disease caused by viral infection regardless of whether the virus is a variant or not, and thus the present invention can be widely used for the safe and effective treatment of viral infectious diseases.
    Type: Grant
    Filed: July 14, 2017
    Date of Patent: January 3, 2023
    Assignee: MVRIX CO., LTD.
    Inventors: Dae-Hyuk Kweon, Byoungjae Kong, Woo-Jae Chung, Baik Lin Seong, Sukchan Lee
  • Publication number: 20220088046
    Abstract: Disclosed is a viral receptor that contains a sialic acid compound at one side thereof to provide binding affinity to a virus, and contains a lipid at the other side thereof, and that can be widely used for the treatment of viral infections based on this characteristic.
    Type: Application
    Filed: September 17, 2021
    Publication date: March 24, 2022
    Applicant: MVRIX Co., Ltd.
    Inventors: Woo Jae Chung, Dae Hyuk Kweon, Jinhyo Chung, Caleb Hong
  • Patent number: 10801054
    Abstract: The present invention provides, inter alia, a device comprising a colorimetric detection layer configured to undergo a color change upon interaction with a first analyte of interest. The detection layer comprises a first plurality of self-assembled fiber bundles. At least a fraction of the fiber bundles undergo a change from a first conformation to a second conformation upon interaction with the first analyte of interest, thereby undergoing a color change. The invention also provides a method for using the system to detect an analyte of interest.
    Type: Grant
    Filed: June 4, 2019
    Date of Patent: October 13, 2020
    Assignee: The Regents of the University of California
    Inventors: Seung-Wuk Lee, Woo-Jae Chung, Jin-Woo Oh
  • Patent number: 10756112
    Abstract: Provided herein is a semiconductor device and a method of manufacturing the same. The method includes alternately forming sacrificial layers and interlayer insulating layers on a semiconductor substrate. The method further includes forming a slit to expose the sacrificial layers by etching through the sacrificial layers and the interlayer insulating layers and forming interlayer openings by removing the exposed sacrificial layers. The method also includes depositing a conductive material in the interlayer openings and forming seams in which core patterns are deposited. The method additionally includes oxidizing a portion of the conductive material in the interlayer openings using a wet etching process and forming conductive patterns by removing the oxidized portion of the conductive material from the interlayer openings while leaving the seams intact.
    Type: Grant
    Filed: January 3, 2020
    Date of Patent: August 25, 2020
    Assignee: SK hynix Inc.
    Inventors: Seung Cheol Lee, Woo Jae Chung, Choung Sik Song
  • Patent number: 10714499
    Abstract: The method of manufacturing a semiconductor device include: forming conductive patterns in interlayer spaces between interlayer insulating layers, the conductive patterns being separated from each other by a slit passing through the interlayer insulating layers, wherein the conductive patterns include a first by-product; generating a second by-product of a gas phase by reacting the first by-product remaining in the conductive patterns with source gas; and performing an out-gassing process to remove the second by-product.
    Type: Grant
    Filed: June 25, 2019
    Date of Patent: July 14, 2020
    Assignee: SK hynix Inc.
    Inventors: Won Joon Choi, Min Sung Ko, Kyeong Bae Kim, Jong Gi Kim, Dong Sun Sheen, Jung Myoung Shim, Young Ho Yang, Hyeng Woo Eom, Kwang Wook Lee, Woo Jae Chung
  • Patent number: 10682333
    Abstract: The present invention relates to a composition for inhibiting the formation of a SNARE complex, containing myricetin derivatives, and having novel structures and obtained by the acylation of myricetin, laricitrin, combretol, or syringetin. The myricetin derivatives are considered to exhibit an effect of being bioconverted into myricetin in a cell. The myricetin derivatives lost the dark color of conventional myricetin and properties thereof were changed such that the myricetin derivatives have properties of photostability and fat solubility. Therefore, since stable form myricetin derivatives are absorbed into a cell such that an activity, possessed by normal myricetin, of inhibiting the formation of a SNARE complex are exhibited, the present invention can exhibit an excellent function as a SNARE targeting prodrug, and as a composition for inhibiting the formation of a SNARE complex, containing the same.
    Type: Grant
    Filed: July 29, 2016
    Date of Patent: June 16, 2020
    Assignee: Research & Business Foundation Sungkyunkwan University
    Inventors: Dae Hyuk Kweon, Joon Bum Park, Young Hun Jung, Woo Jae Chung, Pa Ul Heo
  • Publication number: 20200144289
    Abstract: Provided herein is a semiconductor device and a method of manufacturing the same. The method includes alternately forming sacrificial layers and interlayer insulating layers on a semiconductor substrate. The method further includes forming a slit to expose the sacrificial layers by etching through the sacrificial layers and the interlayer insulating layers and forming interlayer openings by removing the exposed sacrificial layers. The method also includes depositing a conductive material in the interlayer openings and forming seams in which core patterns are deposited. The method additionally includes oxidizing a portion of the conductive material in the interlayer openings using a wet etching process and forming conductive patterns by removing the oxidized portion of the conductive material from the interlayer openings while leaving the seams intact.
    Type: Application
    Filed: January 3, 2020
    Publication date: May 7, 2020
    Applicant: SK hynix Inc.
    Inventors: Seung Cheol LEE, Woo Jae CHUNG, Choung Sik SONG
  • Patent number: 10590459
    Abstract: The present invention provides, inter alia, a device comprising a colorimetric detection layer configured to undergo a color change upon interaction with a first analyte of interest. The detection layer comprises a first plurality of self-assembled fiber bundles. At least a fraction of the fiber bundles undergo a change from a first conformation to a second conformation upon interaction with the first analyte of interest, thereby undergoing a color change. The invention also provides a method for using the system to detect an analyte of interest.
    Type: Grant
    Filed: December 22, 2014
    Date of Patent: March 17, 2020
    Assignee: The Regents of the University of California
    Inventors: Seung-Wuk Lee, Woo-Jae Chung, Jin-woo Oh
  • Patent number: 10573663
    Abstract: Provided herein is a semiconductor device and a method of manufacturing the same. The method includes alternately forming sacrificial layers and interlayer insulating layers on a semiconductor substrate. The method further includes forming a slit to expose the sacrificial layers by etching through the sacrificial layers and the interlayer insulating layers and forming interlayer openings by removing the exposed sacrificial layers. The method also includes depositing a conductive material in the interlayer openings and forming seams in which core patterns are deposited. The method additionally includes oxidizing a portion of the conductive material in the interlayer openings using a wet etching process and forming conductive patterns by removing the oxidized portion of the conductive material from the interlayer openings while leaving the seams intact.
    Type: Grant
    Filed: May 13, 2019
    Date of Patent: February 25, 2020
    Assignee: SK hynix Inc.
    Inventors: Seung Cheol Lee, Woo Jae Chung, Choung sik Song
  • Publication number: 20190390243
    Abstract: The present invention provides, inter alia, a device comprising a colorimetric detection layer configured to undergo a color change upon interaction with a first analyte of interest. The detection layer comprises a first plurality of self-assembled fiber bundles. At least a fraction of the fiber bundles undergo a change from a first conformation to a second conformation upon interaction with the first analyte of interest, thereby undergoing a color change. The invention also provides a method for using the system to detect an analyte of interest.
    Type: Application
    Filed: June 4, 2019
    Publication date: December 26, 2019
    Inventors: SEUNG-WUK LEE, Woo-Jae CHUNG, Jin-Woo OH
  • Publication number: 20190319045
    Abstract: The method of manufacturing a semiconductor device include: forming conductive patterns in interlayer spaces between interlayer insulating layers, the conductive patterns being separated from each other by a slit passing through the interlayer insulating layers, wherein the conductive patterns include a first by-product; generating a second by-product of a gas phase by reacting the first by-product remaining in the conductive patterns with source gas; and performing an out-gassing process to remove the second by-product.
    Type: Application
    Filed: June 25, 2019
    Publication date: October 17, 2019
    Inventors: Won Joon CHOI, Min Sung KO, Kyeong Bae KIM, Jong Gi KIM, Dong Sun SHEEN, Jung Myoung SHIM, Young Ho YANG, Hyeng Woo EOM, Kwang Wook LEE, Woo Jae CHUNG
  • Publication number: 20190267395
    Abstract: Provided herein is a semiconductor device and a method of manufacturing the same. The method includes alternately forming sacrificial layers and interlayer insulating layers on a semiconductor substrate. The method further includes forming a slit to expose the sacrificial layers by etching through the sacrificial layers and the interlayer insulating layers and forming interlayer openings by removing the exposed sacrificial layers. The method also includes depositing a conductive material in the interlayer openings and forming seams in which core patterns are deposited. The method additionally includes oxidizing a portion of the conductive material in the interlayer openings using a wet etching process and forming conductive patterns by removing the oxidized portion of the conductive material from the interlayer openings while leaving the seams intact.
    Type: Application
    Filed: May 13, 2019
    Publication date: August 29, 2019
    Applicant: SK hynix Inc.
    Inventors: Seung Cheol LEE, Woo Jae CHUNG, Choung Sik SONG
  • Publication number: 20190255145
    Abstract: The present invention relates to a nanoperforator having a lipid-bilayer nanodisc and a membrane-structured protein surrounding the nanodisc and to a pharmaceutical composition having the nanoperforator as an active ingredient for preventing or treating viral infectious diseases. The use of the lipid-bilayer nanoperforator provided in the present invention can lead to the safe prevention or treatment of a disease caused by viral infection regardless of whether the virus is a variant or not, and thus the present invention can be widely used for the safe and effective treatment of viral infectious diseases.
    Type: Application
    Filed: July 14, 2017
    Publication date: August 22, 2019
    Applicants: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY, YONSEI UNIVERSITY, UNIVERSITY-INDUSTRY FOUNDATION (UIF)
    Inventors: Dae-Hyuk KWEON, Byoungjae Kong, Woo-Jae Chung, Baik Lin Seong, Sukchan Lee
  • Patent number: 10373973
    Abstract: The method of manufacturing a semiconductor device include: forming conductive patterns in interlayer spaces between interlayer insulating layers, the conductive patterns being separated from each other by a slit passing through the interlayer insulating layers, wherein the conductive patterns include a first by-product; generating a second by-product of a gas phase by reacting the first by-product remaining in the conductive patterns with source gas; and performing an out-gassing process to remove the second by-product.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: August 6, 2019
    Assignee: SK hynix Inc.
    Inventors: Won Joon Choi, Min Sung Ko, Kyeong Bae Kim, Jong Gi Kim, Dong Sun Sheen, Jung Myoung Shim, Young Ho Yang, Hyeng Woo Eom, Kwang Wook Lee, Woo Jae Chung
  • Patent number: 10332909
    Abstract: Provided herein is a semiconductor device and a method of manufacturing the same. The method includes alternately forming sacrificial layers and interlayer insulating layers on a semiconductor substrate. The method further includes forming a slit to expose the sacrificial layers by etching through the sacrificial layers and the interlayer insulating layers and forming interlayer openings by removing the exposed sacrificial layers. The method also includes depositing a conductive material in the interlayer openings and forming seams in which core patterns are deposited. The method additionally includes oxidizing a portion of the conductive material in the interlayer openings using a wet etching process and forming conductive patterns by removing the oxidized portion of the conductive material from the interlayer openings while leaving the seams intact.
    Type: Grant
    Filed: May 22, 2018
    Date of Patent: June 25, 2019
    Assignee: SK hynix Inc.
    Inventors: Seung Cheol Lee, Woo Jae Chung, Choung Sik Song
  • Publication number: 20190115360
    Abstract: Provided herein is a semiconductor device and a method of manufacturing the same. The method includes alternately forming sacrificial layers and interlayer insulating layers on a semiconductor substrate. The method further includes forming a slit to expose the sacrificial layers by etching through the sacrificial layers and the interlayer insulating layers and forming interlayer openings by removing the exposed sacrificial layers. The method also includes depositing a conductive material in the interlayer openings and forming seams in which core patterns are deposited. The method additionally includes oxidizing a portion of the conductive material in the interlayer openings using a wet etching process and forming conductive patterns by removing the oxidized portion of the conductive material from the interlayer openings while leaving the seams intact.
    Type: Application
    Filed: May 22, 2018
    Publication date: April 18, 2019
    Applicant: SK hynix Inc.
    Inventors: Seung Cheol LEE, Woo Jae CHUNG, Choung Sik SONG
  • Publication number: 20190081066
    Abstract: The method of manufacturing a semiconductor device include: forming conductive patterns in interlayer spaces between interlayer insulating layers, the conductive patterns being separated from each other by a slit passing through the interlayer insulating layers, wherein the conductive patterns include a first by-product; generating a second by-product of a gas phase by reacting the first by-product remaining in the conductive patterns with source gas; and performing an out-gassing process to remove the second by-product.
    Type: Application
    Filed: April 24, 2018
    Publication date: March 14, 2019
    Inventors: Won Joon CHOI, Min Sung KO, Kyeong Bae KIM, Jong Gi KIM, Dong Sun SHEEN, Jung Myoung SHIM, Young Ho YANG, Hyeng Woo EOM, Kwang Wook LEE, Woo Jae CHUNG
  • Publication number: 20180222878
    Abstract: The present invention relates to a composition for inhibiting the formation of a SNARE complex, containing myricetin derivatives, and having novel structures and obtained by the acylation of myricetin, laricitrin, combretol, or syringetin. The myricetin derivatives are considered to exhibit an effect of being bioconverted into myricetin in a cell. The myricetin derivatives lost the dark color of conventional myricetin and properties thereof were changed such that the myricetin derivatives have properties of photostability and fat solubility. Therefore, since stable form myricetin derivatives are absorbed into a cell such that an activity, possessed by normal myricetin, of inhibiting the formation of a SNARE complex are exhibited, the present invention can exhibit an excellent function as a SNARE targeting prodrug, and as a composition for inhibiting the formation of a SNARE complex, containing the same.
    Type: Application
    Filed: July 29, 2016
    Publication date: August 9, 2018
    Applicant: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Dae Hyuk KWEON, Joon Bum PARK, Young Hun JUNG, Woo Jae CHUNG, Pa Ul HEO
  • Publication number: 20160312262
    Abstract: The present invention provides, inter alia, a device comprising a colorimetric detection layer configured to undergo a color change upon interaction with a first analyte of interest. The detection layer comprises a first plurality of self-assembled fiber bundles. At least a fraction of the fiber bundles undergo a change from a first conformation to a second conformation upon interaction with the first analyte of interest, thereby undergoing a color change. The invention also provides a method for using the system to detect an analyte of interest.
    Type: Application
    Filed: December 22, 2014
    Publication date: October 27, 2016
    Inventors: Seung-Wuk LEE, Woo-Jae CHUNG, Jin-woo OH