Patents by Inventor Xi DENG
Xi DENG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11928017Abstract: A method includes receiving a point data anomaly detection query from a user. The query requests the data processing hardware to determine a quantity of anomalous point data values in a set of point data values. The method includes training a model using the set of point data values. For at least one respective point data value in the set of point data values, the method includes determining, using the trained model, a variance value for the respective point data value and determining that the variance value satisfies a threshold value. Based on the variance value satisfying the threshold value, the method includes determining that the respective point data value is an anomalous point data value. The method includes reporting the determined anomalous point data value to the user.Type: GrantFiled: May 21, 2022Date of Patent: March 12, 2024Assignee: Google LLCInventors: Zichuan Ye, Jiashang Liu, Forest Elliott, Amir Hormati, Xi Cheng, Mingge Deng
-
Publication number: 20230325738Abstract: A system and method for allocating a recurring resource is described. The system receives a request to allocate the recurring resource of an application to computing devices associated with one or more users. The system identifies a cadence of the recurring resource and a range based on the cadence. A period is determines based on the cadence and the range. The system accesses user resource data of the application for each period and iteratively computes a resource availability score for the period based on the corresponding user resource data. The system determines that the resource availability score of an instance of the period is less than a threshold value and allocates the recurring resource to instances of the period where the corresponding resource availability score exceeds the threshold value.Type: ApplicationFiled: August 31, 2021Publication date: October 12, 2023Inventors: Warren David Johnson III, Charles Yin-Che LEE, Xi DENG
-
Patent number: 11593352Abstract: Systems and methods include determination of a first logical page number of a first database page to be persisted, identification of a first blockmap page associated with the first logical page number, determination, from the first blockmap page, of a block number associated with the first logical page number, determination that the block number is an object key, determination, in response to the determination, that the block number is an object key, determination of a first object key to associate with the first logical page number, and writing of the first database page to the object store using the first object key.Type: GrantFiled: March 10, 2021Date of Patent: February 28, 2023Assignee: SAP SEInventors: Mohammed Abouzour, Gunes Aluc, Ivan Bowman, Xi Deng, Nandan Marathe, Sagar Ranadive, Muhammed Sharique, John Smirnios
-
Publication number: 20220164335Abstract: Systems and methods include determination of a first logical page number of a first database page to be persisted, identification of a first blockmap page associated with the first logical page number, determination, from the first blockmap page, of a block number associated with the first logical page number, determination that the block number is an object key, determination, in response to the determination, that the block number is an object key, determination of a first object key to associate with the first logical page number, and writing of the first database page to the object store using the first object key.Type: ApplicationFiled: March 10, 2021Publication date: May 26, 2022Inventors: Mohammed ABOUZOUR, Gunes ALUC, Ivan BOWMAN, Xi DENG, Nandan MARATHE, Sagar RANADIVE, Muhammed SHARIQUE, John SMIRNIOS
-
Patent number: 9699016Abstract: Disclosed are a sign-in method and system. The method includes: obtaining, by using a location-based service (LBS) of a mobile terminal, geographical information of a current location of a person who signs in; binding the geographical information of the current location with identity information of the person who signs in and time information, using the geographical information of the current location, the identity information of the person who signs in, and the time information as sign-in information, and sending the sign-in information to a sign-in server; verifying, by the sign-in server, the sent sign-in information; and recording the sign-in information if the verification succeeds. The present disclosure not only can save costs of labor, material, and money, but also can enable several people to sign in simultaneously, thereby greatly improving sign-in efficiency.Type: GrantFiled: May 12, 2015Date of Patent: July 4, 2017Assignee: TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITEDInventor: Xi Deng
-
Publication number: 20150244557Abstract: Disclosed are a sign-in method and system. The method includes: obtaining, by using a location-based service (LBS) of a mobile terminal, geographical information of a current location of a person who signs in; binding the geographical information of the current location with identity information of the person who signs in and time information, using the geographical information of the current location, the identity information of the person who signs in, and the time information as sign-in information, and sending the sign-in information to a sign-in server; verifying, by the sign-in server, the sent sign-in information; and recording the sign-in information if the verification succeeds. The present disclosure not only can save costs of labor, material, and money, but also can enable several people to sign in simultaneously, thereby greatly improving sign-in efficiency.Type: ApplicationFiled: May 12, 2015Publication date: August 27, 2015Inventor: Xi DENG
-
Patent number: 8921013Abstract: A lithographic mask reticle includes a first mask region having a first mask pattern configured for use in fabrication of electronic circuit structures, and a second mask region having a second mask pattern configured for use in fabrication of test structures. The second mask pattern includes all categories of structural patterns containing in the first mask pattern.Type: GrantFiled: July 12, 2013Date of Patent: December 30, 2014Assignee: Semiconductor Manufacturing International (Shanghai) CorporationInventors: Chi-Yuan Hung, Bin Zhang, Ze Xi Deng, Li Guo Zhang
-
Publication number: 20130302725Abstract: A lithographic mask reticle includes a first mask region having a first mask pattern configured for use in fabrication of electronic circuit structures, and a second mask region having a second mask pattern configured for use in fabrication of test structures. The second mask pattern includes all categories of structural patterns containing in the first mask pattern.Type: ApplicationFiled: July 12, 2013Publication date: November 14, 2013Inventors: CHI-YUAN HUNG, Bin Zhang, Ze Xi Deng, Li Guo Zhang
-
Patent number: 8501376Abstract: A method for performing a photolithography process includes providing a reticle on a projection apparatus, the reticle having a test pattern defined thereon, the test pattern including a plurality of one-dimensional structures and a plurality of two-dimensional structures. The test pattern defined on the reticle is transferred to at least one area on a wafer. The projection apparatus is focused on the test pattern transferred on the wafer during a photolithography process to perform a process monitoring.Type: GrantFiled: March 12, 2011Date of Patent: August 6, 2013Assignee: Semiconductor Manufacturing International (Shanghai) CorporationInventors: Chi Yuan Hung, Bin Zhang, Ze Xi Deng, Li Guo Zhang
-
Publication number: 20110318673Abstract: A method for performing a photolithography process includes providing a reticle on a projection apparatus, the reticle having a test pattern defined thereon, the test pattern including a plurality of one-dimensional structures and a plurality of two-dimensional structures. The test pattern defined on the reticle is transferred to at least one area on a wafer. The projection apparatus is focused on the test pattern transferred on the wafer during a photolithography process to perform a process monitoring.Type: ApplicationFiled: March 12, 2011Publication date: December 29, 2011Applicant: Semiconductor Manufacturing International (Shanghai) CorporationInventors: CHI YUAN HUNG, Bin Zhang, Ze Xi Deng, Li Guo Zhang