Abstract: Disclosed is a three-dimensional adjustment mechanism for performing precise adjustment of an optical element in a high-resolution imaging system. The three-dimensional adjustment mechanism includes three elastic adjustment members uniformly distributed to conduct an axial displacement adjustment and a tilt adjustment of the optical element. The three elastic adjustment members are uniformly arranged at a bottom of the optical element, and configured to perform dynamic adjustment for the optical element with high precision on basis of deformations of the elastic adjustment members.

Abstract: A single-point driven axial adjustment mechanism for precision axial adjustment of an optical element of a high-resolution imaging system, includes a support base in a bottom layer for fixing and linking of the adjustment mechanisma, a driving mechanism in a middle layer, on which three elastic mechanisms are evenly distributed such that a single-point driving force applied to the driving mechanism is delivered to the three elastic mechanisms, and an element support seat in a top layer for fixedly supporting an optical element to be adjusted. The driving mechanism in the middle layer is configured to move in a horizontal direction in response to the driving mechanism being adjusted, and the three elastic mechanisms evenly distributed on the driving mechanism converts a horizontal movement of the driving mechanism into an axial movement of the optical element support seat.

Abstract: Disclosed is a three-dimensional adjustment mechanism for performing precise adjustment of an optical element in a high-resolution imaging system. The three-dimensional adjustment mechanism includes three elastic adjustment members uniformly distributed to conduct an axial displacement adjustment and a tilt adjustment of the optical element. The three elastic adjustment members are uniformly arranged at a bottom of the optical element, and configured to perform dynamic adjustment for the optical element with high precision on basis of deformations of the elastic adjustment members.

Abstract: A horizontal precision adjustment and locking device can be used for online fine adjustment and locking fixation of optical components in a precision optical system. A bilaterally symmetric parallelogram hinge is designed in the disclosure, in which the parallelogram hinge deforms under a driving force to realize the adjustment of the components to be adjusted. Two circles of identical adjustment devices are designed on the same pushing adjustment plate to achieve independent adjustments in horizontal directions, including X axis and Y axis, while simplifying the adjustment device. Each of the parallelogram hinges is adjusted by a thread pair at one end of the adjustment and locking device, and the adjustment and self-locking of the adjustment and locking device is obtained by a pushing force from the thread pair and a reaction force from the hinge.

Abstract: The present disclosure relates to a method for detecting focal plane based on a grating Talbot effect, the function of which is to detect position of a silicon wafer in a photolithography machine in real time so as to implement an adjustment of leveling and foal plane of the silicon wafer in a high resolution. The detection system utilizes a phase change of “self-image” generated by a grating Talbot effect caused by defocusing of the silicon wafer, so as to accomplish the detecting for focal plane of the silicon wafer in the photolithography machine in a high resolution: if the silicon wafer is at a focal plane, the imaged wavefront by the grating is a planar wavefront; and when the silicon wafer is defocused, the imaged wavefront is a spherical wavefront. Such a detection system has a simple structure, a higher anti-interference capability and a perfect adaption of the process.

Abstract: The present disclosure relates to a method for detecting focus plane based on Hartmann wavefront detection principle, the function of which is to detect the position of a silicon wafer in a photolithograph machine in real time so as to accomplish adjustment of the leveling and focus of the silicon wafer. By utilizing microlens array to detect the wavefront carrying information about the position of the silicon wafer based on the Hartmann wavefront detection principle, the spherical wavefront is divided by the respective subunits of the microlens array and is imaged on the respective focus planes of the subunits.

Abstract: The present disclosure relates to a method for detecting focal plane based on a grating Talbot effect, the function of which is to detect position of a silicon wafer in a photolithography machine in real time so as to implement an adjustment of leveling and foal plane of the silicon wafer in a high resolution. The detection system utilizes a phase change of “self-image” generated by a grating Talbot effect caused by defocusing of the silicon wafer, so as to accomplish the detecting for focal plane of the silicon wafer in the photolithography machine in a high resolution: if the silicon wafer is at a focal plane, the imaged wavefront by the grating is a planar wavefront; and when the silicon wafer is defocused, the imaged wavefront is a spherical wavefront. Such a detection system has a simple structure, a higher anti-interference capability and a perfect adaption of the process.

Abstract: The present disclosure relates to a method for detecting focus plane based on Hartmann wavefront detection principle, the function of which is to detect the position of a silicon wafer in a photolithograph machine in real time so as to accomplish adjustment of the leveling and focus of the silicon wafer. By utilizing microlens array to detect the wavefront carrying information about the position of the silicon wafer based on the Hartmann wavefront detection principle, the spherical wavefront is divided by the respective subunits of the microlens array and is imaged on the respective focus planes of the subunits.