Patents by Inventor Xiao-Chun Mu

Xiao-Chun Mu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7078240
    Abstract: A polymer memory device include two organic adhesion layers that facilitate an integral package comprising a lower and an upper electrode and the ferroelectric polymer memory structure. The ferroelectric polymer memory structure includes crystalline ferroelectric polymer layers such as single and co-polymer compositions. The structure includes spin-on and/or Langmuir-Blodgett deposited compositions. A memory system allows the polymer memory device to interface with various existing hosts.
    Type: Grant
    Filed: January 20, 2004
    Date of Patent: July 18, 2006
    Assignee: Intel Corporation
    Inventors: Jian Li, Xiao-Chun Mu
  • Patent number: 7018853
    Abstract: The present invention relates to a ferroelectric polymer storage device including at least two stacked ferroelectric polymer memory structures that are arrayed next to at least two respective stacked topologies that are a pre-fabricated silicon substrate cavity that includes interlayer dielectric layers and via structures.
    Type: Grant
    Filed: August 29, 2003
    Date of Patent: March 28, 2006
    Assignee: Intel Corporation
    Inventors: Jian Li, Xiao-Chun Mu
  • Patent number: 6964889
    Abstract: A microelectronic package including a microelectronic die having an active surface and at least one side. An encapsulation material is disposed adjacent the microelectronic die side(s). A portion of the encapsulation material is removed to expose a back surface of the microelectronic die which has a metallization layer disposed thereon. A protective layer is disposed on the metallization layer prior to encapsulation, such that when the portion of the encapsulation material is removed, the protective layer prevents the metallization layer from being damaged. After the portion of the encapsulation material is removed, the protective layer is removed and the metallization layer is exposed. A heat spreader may then be attached to the microelectronic die by abutting the heat spreader against the metallization layer and reflowing the metallization layer.
    Type: Grant
    Filed: May 1, 2002
    Date of Patent: November 15, 2005
    Assignee: Intel Corporation
    Inventors: Qing Ma, Xiao-Chun Mu, Quat T. Vu
  • Patent number: 6960479
    Abstract: The present invention relates to a ferroelectric polymer storage device including at least two stacked ferroelectric polymer memory structures that are arrayed next to at least two respective stacked topologies that are a pre-fabricated silicon substrate cavity that includes interlayer dielectric layers and via structures. Combining ferroelectric polymer and ferroelectric oxide layers on the pre-fabricated silicon substrate cavity forms a multi-rank structure.
    Type: Grant
    Filed: September 21, 2001
    Date of Patent: November 1, 2005
    Assignee: Intel Corporation
    Inventors: Jian Li, Xiao-Chun Mu
  • Patent number: 6952017
    Abstract: One embodiment of the invention relates to a polymer memory device and a method of making it. The polymer memory device may include a composite or single layer of a ferroelectric polymer memory that addresses surface engineering needs according to various embodiments. The ferroelectric polymer memory structure may include crystalline ferroelectric polymer layers such as single and co-polymer compositions. The structure may include spin-on and/or Langmuir-Blodgett deposited compositions. One embodiment of the invention relates to a method making embodiments of the polymer memory device. One embodiment of the invention relates to a memory system that allows the polymer memory device to interface with various existing hosts.
    Type: Grant
    Filed: January 21, 2004
    Date of Patent: October 4, 2005
    Assignee: Intel Corporation
    Inventors: Jian Li, Xiao-Chun Mu, Mark Isenberger
  • Patent number: 6902950
    Abstract: A microelectronic package including a microelectronic die having an active surface and at least one side. An encapsulation material is disposed adjacent the microelectronic die side(s). A portion of the encapsulation material is removed to expose a back surface of the microelectronic die which has a metallization layer disposed thereon. A protective layer is disposed on the metallization layer prior to encapsulation, such that when the portion of the encapsulation material is removed, the protective layer prevents the metallization layer from being damaged. After the portion of the encapsulation material is removed, the protective layer is removed and the metallization layer is exposed. A heat spreader may then be attached to the microelectronic die by abutting the heat spreader against the metallization layer and reflowing the metallization layer.
    Type: Grant
    Filed: May 10, 2002
    Date of Patent: June 7, 2005
    Assignee: Intel Corporation
    Inventors: Qing Ma, Xiao-Chun Mu, Quat T. Vu
  • Patent number: 6858862
    Abstract: The invention relates to discrete, spaced-apart ferroelectric polymer memory device embodiments. The ferroelectric polymer memory device is fabricated by spin-on polymer processing and etching using photolithographic technology. The size of the discrete, spaced-apart ferroelectric polymer structures may be tied to a specific photolithography minimum feature dimension. The invention also relates to a process for making embodiments of a polymer memory device that includes discrete, spaced-apart ferroelectric polymer structures. The discrete, spaced-apart ferroelectric polymer structures may have a minimum feature that is tied to the current photolithography that may reduce the voltage and increase the switching speed.
    Type: Grant
    Filed: June 29, 2001
    Date of Patent: February 22, 2005
    Assignee: Intel Corporation
    Inventors: Jian Li, Xiao-Chun Mu
  • Patent number: 6798003
    Abstract: A polymer memory device includes two organic adhesion layers that facilitate an integral package comprising a lower and an upper electrode and the ferroelectric polymer memory structure. The ferroelectric polymer memory structure includes crystalline ferroelectric polymer layers such as single and co-polymer compositions. The structure includes spin-on and/or Langmuir-Blodgett deposited compositions. A memory system allows the polymer memory device to interface with various existing hosts.
    Type: Grant
    Filed: July 20, 2001
    Date of Patent: September 28, 2004
    Assignee: Intel Corporation
    Inventors: Jian Li, Xiao-Chun Mu
  • Publication number: 20040152231
    Abstract: A polymer memory device include two organic adhesion layers that facilitate an integral package comprising a lower and an upper electrode and the ferroelectric polymer memory structure. The ferroelectric polymer memory structure includes crystalline ferroelectric polymer layers such as single and co-polymer compositions. The structure includes spin-on and/or Langmuir-Blodgett deposited compositions.
    Type: Application
    Filed: January 20, 2004
    Publication date: August 5, 2004
    Inventors: Jian Li, Xiao-Chun Mu
  • Publication number: 20040150023
    Abstract: One embodiment of the invention relates to a polymer memory device and a method of making it. The polymer memory device may include a composite or single layer of a ferroelectric polymer memory that addresses surface engineering needs according to various embodiments. The ferroelectric polymer memory structure may include crystalline ferroelectric polymer layers such as single and co-polymer compositions. The structure may include spin-on and/or Langmuir-Blodgett deposited compositions.
    Type: Application
    Filed: January 21, 2004
    Publication date: August 5, 2004
    Inventors: Jian Li, Xiao-Chun Mu, Mark Isenberger
  • Patent number: 6756620
    Abstract: One embodiment of the invention relates to a polymer memory device and a method of making it. The polymer memory device may include a composite or single layer of a ferroelectric polymer memory that addresses surface engineering needs according to various embodiments. The ferroelectric polymer memory structure may include crystalline ferroelectric polymer layers such as single and co-polymer compositions. The structure may include spin-on and/or Langmuir-Blodgett deposited compositions. One embodiment of the invention relates to a method making embodiments of the polymer memory device. One embodiment of the invention relates to a memory system that allows the polymer memory device to interface with various existing hosts.
    Type: Grant
    Filed: June 29, 2001
    Date of Patent: June 29, 2004
    Assignee: Intel Corporation
    Inventors: Jian Li, Xiao-Chun Mu, Mark Isenberger
  • Publication number: 20040094830
    Abstract: A microelectronic package including a microelectronic die disposed within an opening in a microelectronic packaging core, wherein an encapsulation material is disposed within portions of the opening not occupied by the microelectronic die. Build-up layers of dielectric materials and conductive traces are then fabricated on the microelectronic die, the encapsulant material, and the microelectronic package core to form the microelectronic package.
    Type: Application
    Filed: June 30, 2003
    Publication date: May 20, 2004
    Applicant: Intel Corporation
    Inventors: Quat T. Vu, Jian Li, Qing Ma, Maria V. Henao, Xiao-Chun Mu
  • Patent number: 6624457
    Abstract: The present invention relates to a ferroelectric polymer storage device including at least two stacked ferroelectric polymer memory structures that are arrayed next to at least two respective stacked topologies that are a pre-fabricated silicon substrate cavity that includes interlayer dielectric layers and via structures.
    Type: Grant
    Filed: July 20, 2001
    Date of Patent: September 23, 2003
    Assignee: Intel Corporation
    Inventors: Jian Li, Xiao-Chun Mu
  • Patent number: 6600364
    Abstract: An integrated circuit assembly that includes an integrated circuit which is connected to an interposer. The integrated circuit may include a logic circuit which generates an output signal. The interposer may include a driver circuit that regenerates the output signal. The interposer may also contain a clock signal that is connected to the logic circuit. Separating the driver circuit from the integrated circuit may provide an assembly which reduces the amount of noise in the logic circuit created by the driver circuit switching states. Additionally, providing the clock circuit on the interposer allows the clock to be fabricated with a more robust process than the logic circuit of the integrated circuit.
    Type: Grant
    Filed: January 5, 1999
    Date of Patent: July 29, 2003
    Assignee: Intel Corporation
    Inventors: Chunlin Liang, Xiao-Chun Mu
  • Patent number: 6586836
    Abstract: A method of fabricating microelectronic dice by providing or forming a first encapsulated die assembly and a second encapsulated die assembly. Each of the encapsulated die assemblies includes at least one microelectronic die disposed in an encapsulation material. Each of the encapsulated die assemblies has an active surface and a back surface. The encapsulated die assemblies are attached together in a back surface-to-back surface arrangement. Build-up layers are then formed on the active surfaces of the first and second encapsulated assemblies, preferably, simultaneously. Thereafter, the microelectronic dice are singulated, if required, and the microelectronic dice of the first encapsulated die assembly are separated from the microelectronic dice of the second encapsulated die assembly.
    Type: Grant
    Filed: March 1, 2000
    Date of Patent: July 1, 2003
    Assignee: Intel Corporation
    Inventors: Qing Ma, Xiao-Chun Mu, Quat Vu, Steve Towle
  • Patent number: 6586822
    Abstract: A microelectronic package including a microelectronic die disposed within an opening in a microelectronic packaging core, wherein an encapsulation material is disposed within portions of the opening not occupied by the microelectronic die. Build-up layers of dielectric materials and conductive traces are then fabricated on the microelectronic die, the encapsulant material, and the microelectronic package core to form the microelectronic package.
    Type: Grant
    Filed: September 8, 2000
    Date of Patent: July 1, 2003
    Assignee: Intel Corporation
    Inventors: Quat T. Vu, Jian Li, Qing Ma, Maria V. Henao, Xiao-Chun Mu
  • Patent number: 6524887
    Abstract: The invention relates to packaging of a novel ferroelectric polymer memory device. Packaging is configured with a recess geometry into which the ferroelectric polymer memory device extends, that resists contact with the polymer portion of the ferroelectric polymer memory device. In one embodiment, an embedded recess geometry is used that resists thermal and mechanical stresses upon the polymer. Also disclosed is a method of forming the ferroelectric polymer memory device. The method may be applied to both inorganic and organic substrates.
    Type: Grant
    Filed: July 20, 2001
    Date of Patent: February 25, 2003
    Assignee: Intel Corporation
    Inventors: Jian Li, Xiao-Chun Mu
  • Publication number: 20030015740
    Abstract: The present invention relates to a ferroelectric polymer storage device including at least two stacked ferroelectric polymer memory structures that are arrayed next to at least two respective stacked topologies that are a pre-fabricated silicon substrate cavity that includes interlayer dielectric layers and via structures.
    Type: Application
    Filed: July 20, 2001
    Publication date: January 23, 2003
    Applicant: Intel Corporation
    Inventors: Jian Li, Xiao-Chun Mu
  • Publication number: 20030017623
    Abstract: A polymer memory device include two organic adhesion layers that facilitate an integral package comprising a lower and an upper electrode and the ferroelectric polymer memory structure. The ferroelectric polymer memory structure includes crystalline ferroelectric polymer layers such as single and co-polymer compositions. The structure includes spin-on and/or Langmuir-Blodgett deposited compositions.
    Type: Application
    Filed: July 20, 2001
    Publication date: January 23, 2003
    Applicant: Intel Corporation
    Inventors: Jian Li, Xiao-Chun Mu
  • Publication number: 20030017627
    Abstract: The present invention relates to a ferroelectric polymer storage device including at least two stacked ferroelectric polymer memory structures that are arrayed next to at least two respective stacked topologies that are a pre-fabricated silicon substrate cavity that includes interlayer dielectric layers and via structures. Combining ferroelectric polymer and ferroelectric oxide layers on the pre-fabricated silicon substrate cavity forms a multi-rank structure.
    Type: Application
    Filed: September 21, 2001
    Publication date: January 23, 2003
    Applicant: Intel Corporation
    Inventors: Jian Li, Xiao-Chun Mu