Abstract: The present invention provides a device for blocking plasma backflow in a process chamber to protect an air inlet structure, comprising an air inlet nozzle tightly connected to an air inlet flange. The inner cavity of the air inlet nozzle is provided with an air inlet guide body, wherein the air inlet guide body has an upper structure, a middle structure, and a lower structure, the upper, middle, and lower structures are an integrated structure, the upper, middle, and lower structures are all cylindrical, the cross-sectional diameter of the upper structure is smaller than that of the middle structure, a gas gathering area is arranged between the middle structure and the lower structure, and the middle structure and the lower structure are connected by the gas gathering area.

Abstract: In some embodiments, a method selects a first template of pixels that is outside of a first block and a second template of pixels that is outside of the first block. Then, the method selects a first region of pixels that are inside the first block and a second region of pixels that are inside the first block. A first weight is calculated based on the first template of pixels and the first region of pixels and a second weight is calculated based on the second template of pixels and the second region of pixels. The first weight and the second weight are used in a motion prediction search for a second block.

Abstract: In one aspect, compositions and therapeutic use thereof are provided that can inhibit ?-synuclein cell-to-cell transmission. In embodiment, methods are provided to treat a mammal such as a human that is suffering from or susceptible to an ?-synucleinopathy that include administering to the mammal an effective amount of one or more metal nanozymes.

Abstract: A method for determining a productivity of a coalbed methane well without shutting down the well includes steps of: obtaining coalbed methane basic data; based on PVT experimental data, determining a relationship table between a pressure and a coalbed methane deviation factor, and a relationship table between the pressure and a pseudo-pressure; recording daily gas production rates, bottomhole flow pressures, and cumulative gas productions at each stabilized flow pressure test moment in at least three different production stages; determining formation pressures corresponding to each stabilized flow pressure test moment based on a material balance equation; according to the formation pressures, the bottomhole flow pressures and the production rates, determining coefficients in a deliverability equation of the coalbed methane well for determining the deliverability equation; substituting the formation pressures and the bottomhole flow pressures into the deliverability equation for obtaining corresponding product

Abstract: The present disclosure provides a method and device used in communication node for wireless communication. The communication node first receives first information on a first carrier, the first information being used for determining a first time interval; then receives a first reference signal in a first time window on a second carrier; the first time window is one of X time windows; each of the X time windows belongs to the first time interval, X being a positive integer greater than 1; at least one of a physical-cell identifier to which a transmitter of the first reference signal belongs, a position of frequency-domain resources occupied by the first reference signal in frequency domain or a position of the first time interval in time domain is used for determining the first time window out of the X time windows. The present disclosure reduces interference and overhead.

Abstract: Embodiments include semiconductor processing methods to form low-K films on semiconductor substrates are described. The processing methods may include flowing one or more deposition precursors to a semiconductor processing system, wherein the one or more deposition precursors include a silicon-containing precursor. The silicon-containing precursor may include a carbon chain. The methods may include generating a deposition plasma from the one or more deposition precursors. The methods may include depositing a silicon-and-carbon-containing material on the substrate from plasma effluents of the deposition plasma. The silicon-and-carbon-containing material as-deposited may be characterized by a dielectric constant less than or about 3.0.

Abstract: Embodiments include semiconductor processing methods to form low-? films on semiconductor substrates are described. The processing methods may include flowing one or more deposition precursors to a semiconductor processing system. The one or more deposition precursors may include a silicon-containing precursor that may be a cyclic compound. The methods may include generating a deposition plasma from the one or more deposition precursors. The methods may include depositing a silicon-and-carbon-containing material on the substrate from plasma effluents of the deposition plasma. The silicon-and-carbon-containing material as-deposited may be characterized by a dielectric constant less than or about 3.0.

Abstract: The present disclosure provides a method and a device in a node for wireless communications. A first node receives a first signaling; transmits a second signaling; and transmits a first signal in a second time-frequency resource set; the second time-frequency resource set belongs to a target resource sub-pool; the first signaling is used to determine a first identifier, a first priority and a reference time-frequency resource set; a first time-frequency resource set is related to the reference time-frequency resource set; the second signaling is used to indicate a second identifier, a second priority and the second time-frequency resource set; a relationship between a first transmission node identified by the first identifier and a second transmission node identified by the second identifier. The present disclosure offers an effective way of addressing the resource wastes and transmission delay resulting from PSFCH conflicts in the NR V2X system.

Abstract: Exemplary semiconductor processing methods may include providing one or more deposition precursors to a processing region of a semiconductor processing chamber. A semiconductor substrate may be positioned within the processing region. The methods may include forming a layer of low dielectric constant material on the semiconductor substrate. The methods may include purging the processing region of the one or more deposition precursors. A plasma power may be maintained at less than or about 750 W while purging the processing region. The methods may include forming an interface layer on the layer of low dielectric constant material. The methods may include forming a cap layer on the interface layer.

Abstract: Disclosed in the present application is an inductively coupled plasma treatment system. Said system switches the connection between a radio frequency coil and a faraday shielding device by means of a switch switching radio frequency power. When a radio frequency power supply is connected to the radio frequency coil by means of a matched network, the radio frequency power is coupled into the radio frequency coil to perform plasma treatment process. When a radio frequency power supply is connected to a faraday shielding device by means of a matched network, the radio frequency power is coupled into the faraday shielding device to perform cleaning process on a dielectric window and an inner wall of a plasma treatment cavity.

Abstract: A double-wall multi-structure quartz cylinder device, belonging to the technical field of ion beam etching. The device specifically includes a quartz cylinder outer wall, at least one quartz cylinder inner liner being provided inside the quartz cylinder outer wall, axes of the two coinciding with each other, and a quartz cylinder inner liner support being connected between the quartz cylinder inner liner and the quartz cylinder outer wall. The quartz cylinder outer wall and the bottom of the quartz cylinder inner liner are connected to a grid mesh, most of etching by-products will be sputtered onto an inner surface of the quartz cylinder inner liner through voids of the grid mesh, and less etching by-products will be attached to an inner wall of the quartz cylinder outer wall, such that the whole radio frequency circuit is less affected by contamination.

Abstract: The present invention relates to a device, a system and a method for monitoring river flow velocity based on differential pressure measurement, comprising: a hull floating on a water surface with an aspect ratio of the hull being greater than one, characterized in that pressure sensors are respectively provided on an upstream face of a front end and a downstream face of a rear end below the floatation line of a ship; an electronic instrument is provided in the hull, and the electronic instrument comprises an acquisition module connected to the two pressure sensors, the acquisition module being connected to a data processing module with a memory, and the data processing module being connected to a satellite positioning module and a wireless communication module.

Abstract: The present invention relates to the field of petroleum industry phase oilfield chemistry, and specifically relates to a bionic and dual-phobic drilling fluid. The drilling fluid contains a bionic wall-fixing agent, a bionic lubricant, a super dual-phobic agent, a scrap-carrying agent and a bionic shale inhibitor. The present invention uses the theory of bionics and the theory of a downhole rock surface being double phobic as a basis. By means of using the bionic wall-fixing agent, the bionic lubricant, the super dual-phobic agent, the scrap-carrying agent and the bionic shale inhibitor, which have special properties of imitating animals and plants in nature, and using a series of bionic treatment agents, a set of bionic and dual-phobic drilling fluid systems, which corresponds to an unconventional, complex oil and gas well, is formed.

Abstract: A lifting and rotating platform device includes a closed housing, a rotary shaft, a rotation driving unit, and a lifting driving unit. The closed housing includes an upper housing, a lower housing, and a middle corrugated pipe connected therebetween. The rotary shaft passes through a shaft hole at an upper end of the upper housing. A dynamic seal is between the rotary shaft and the shaft hole. An object bearing platform is at an upper end of the rotary shaft located outside the closed housing. The rotation driving unit is mounted in the upper housing; and is used to drive the rotary shaft to rotate within the shaft hole. The lifting driving unit is mounted in the lower housing; and is used to drive the rotary shaft to ascend or descend in an axial direction.

Abstract: The present invention relates to a device, a system and a method for monitoring river flow velocity based on differential pressure measurement, comprising: a hull floating on a water surface with an aspect ratio of the hull being greater than one, characterized in that pressure sensors are respectively provided on an upstream face of a front end and a downstream face of a rear end below the floatation line of a ship; an electronic instrument is provided in the hull, and the electronic instrument comprises an acquisition module connected to the two pressure sensors, the acquisition module being connected to a data processing module with a memory, and the data processing module being connected to a satellite positioning module and a wireless communication module.

Abstract: A treatment method for a river system in a reservoir area, comprising: S1. determining whether a time from a current date to the rainy season is less than a preset duration; S2. moving a pressure sensor upward; S3. determining whether the pressure data meets corresponding conditions; S4. determining whether a duration of the pressure data is less than the preset duration; S5. determining whether an interval between the current time and the time for collecting pressure/nitrogen and phosphorus is greater than a preset number of days; S6. acquiring an image information of a river bottom, and sending it to neural network model for identification to obtain a depth of a sludge; S7. determining whether the depth of a sludge has reached a dredging depth, if so, starting a sludge pump to clean up; S8. collecting nitrogen and phosphorus concentration, and removing nitrogen and phosphorus when the concentration exceeds a standard.

Abstract: A Faraday shielding device includes an electrically conductive ring and a plurality of electrically conductive petal-shaped assemblies radially and symmetrically on the periphery of the electrically conductive ring. Each electrically conductive petal-shaped assembly includes a plurality of electrically conductive plates and connecting capacitors; the electrically conductive plate are at intervals along the radial direction; a connecting capacitor is between every two adjacent electrically conductive plates.

Abstract: Provided are a faraday cleaning device and a plasma processing system, the device comprising a reaction chamber, a bias electrode, a wafer, a chamber cover, a coupling window, an air inlet nozzle, a vertical coil, and a faraday layer, wherein the coupling window is installed at the upper end face of the chamber cover, the chamber cover is installed at the upper end face of the reaction chamber, the bias electrode is assembled inside the reaction chamber, the wafer is installed at the upper end face of the bias electrode, the air inlet nozzle is assembled inside the coupling window, the faraday layer is installed at the upper end face of the coupling window, and the vertical coil is assembled at the upper end face of the faraday layer.

Abstract: A separated gas inlet structure for blocking plasma backflow includes a gas inlet flange and an upper gas inlet nozzle and a lower gas inlet nozzle made of ceramic materials. The upper gas inlet nozzle is coaxially nested or stacked at the top of the lower gas inlet nozzle; a broken line type gas inlet channel is in the upper gas inlet nozzle and the lower gas inlet nozzle and the gas inlet channel includes an upper axial channel, a radial channel, a lower axial channel and a gas outlet; the radial channel or the lower axial channel is at a mounting matching part of the upper gas inlet nozzle and the lower gas inlet nozzle; and the top of the lower axial channel points to a bottom wall surface of the upper gas inlet nozzle.

Abstract: A star rating management method for deployment and implementation of gas field development wells first establishes the expression for estimating the gas well initial production rate and the dimensionless production curve; then determines the annual production of the new well for every year during the evaluation period and determines the internal rate of return of the new gas well. If the internal rate of return fails to meet the requirement, the deployment location and construction technology of the new well are re-optimized. Corresponding stars rating are determined according to the internal rate of return of the gas wells. The new well is drilled according to the deployment location that can meet the economic benefit requirements. After the gas well is drilled, a more detailed fracturing design is carried out, and the internal rate of return of the gas well and the star rating of development benefit are redetermined.