Patents by Inventor Xiaochun Qian

Xiaochun Qian has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11746085
    Abstract: The present invention discloses a triphenylsulfonium salt compound as shown in the general formula (I), wherein R1 represents an electron-withdrawing group and R2 represents an amplification group. Said compound shows significantly enhanced solubility and photosensitivity compared with unsubstituted triphenylsulfonium salts, and has significantly advantageous performance compared with prior art improved substitutes.
    Type: Grant
    Filed: September 27, 2019
    Date of Patent: September 5, 2023
    Assignees: Changzhou Tronly Advanced Electronic Materials Co., Ltd., Changzhou Tronly New Electronics Materials Co., Ltd.
    Inventor: Xiaochun Qian
  • Publication number: 20230167066
    Abstract: An ethoxy/propoxy modified pyrazoline organic matter, an application thereof, a photocurable composition, and a photoresist. The introduction of —CH2—CH2—O(EO) and/or —CH(CH3)—CH2—O(PO) enables an EO/PO modified pyrazoline organic matter to have excellent compatibility with other components in a photocuring system, and the organic matter is solid, and is easy to add and use. In addition, the ethoxy/propoxy modified pyrazoline organic matter has an absorption band of 360-400 nm, and is thus particularly suitable for use as a sensitizer in the photocuring system (such as a system containing a bisimidazole photoinitiator), thereby greatly improving the sensitivity of the photocuring system. On this basis, the EO/PO modified pyrazoline organic matter has high sensitivity enhancement, features low usage, is solid, and is easy to add and use.
    Type: Application
    Filed: March 16, 2021
    Publication date: June 1, 2023
    Inventor: Xiaochun QIAN
  • Publication number: 20230150961
    Abstract: A method is for synthesizing an oxetane compound by a microreactor. The synthesis method includes: introducing trimethylolpropane and carbonate into the microreactor in the presence of an alkaline catalyst, and synthesizing the oxetane compound by means of a micro-reaction continuous flow process under an inert solvent or a solvent-free condition. Compared with conventional reactors, the microreactor has the advantages of being high in heat transfer mass transfer coefficient, good in mixing performance, easy to control in temperature, safe and controllable in process.
    Type: Application
    Filed: March 16, 2021
    Publication date: May 18, 2023
    Inventor: Xiaochun QIAN
  • Publication number: 20230116611
    Abstract: The invention provides a synthesis method for synthesizing an oxetane derivative by a microreactor. The synthesis method comprises: delivering 3-ethyl-3-hydroxymethyloxetane, a raw material Ha, a catalyst, and an alkali into a microreactor, and performing an etherification reaction so as to obtain an etherification product system, the raw material Ha having a general formula of R-(X)n, and X being a halogen; and separating the etherification product system so as to obtain the oxetane derivative. The microreactor is used for greatly improving the mass and heat transfer properties of the reaction system, reducing the reaction time, improving the production efficiency, increasing the yield of the product, achieving the continuity and automation of the process, and improving the safety of the process. In addition, the reaction device required by the described synthesis process requires has a small size, requires less manpower and has high safety.
    Type: Application
    Filed: March 16, 2021
    Publication date: April 13, 2023
    Inventor: Xiaochun QIAN
  • Publication number: 20230016182
    Abstract: An EO/PO modified 9-phenylacridine photosensitizer having the structure as shown in general formula (I). When the photosensitizer is applied to a photosensitive resin composition, the composition has characteristics of high photosensitivity, high resolution, high solubility, excellent dispersion stability, and excellent developing property, and has good hydrophilicity during development, the amount of sludges in a developer during recycling can be significantly reduced, so that the developer can be used repeatedly and effectively.
    Type: Application
    Filed: November 24, 2020
    Publication date: January 19, 2023
    Inventor: Xiaochun QIAN
  • Patent number: 11555022
    Abstract: A group of polyfunctional oxetane-based compounds having a structure as represented by general formula (I) or a product obtained by a reaction between a compound of general formula (I) and epichlorohydrin, an ester compound, or an isocyanate compound. When these polyfunctional oxetane-based compounds are used as cation polymerizable monomers in combination with an epoxy compound, the curing speed is high, and the cured product has highly excellent hardness, flexibility, adherence, and heat resistance.
    Type: Grant
    Filed: November 5, 2020
    Date of Patent: January 17, 2023
    Assignees: CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO., LTD., CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD.
    Inventor: Xiaochun Qian
  • Patent number: 11535590
    Abstract: The present invention provides a sulfonium salt photoinitiator, a preparation method therefor, a photocurable composition comprising sulfonium salt photoinitiator, and use thereof. The sulfonium salt photoinitiator has a structure represented by formula (I). By modifying the structure of an existing sulfonium salt photoinitiator, a sulfonium salt photoinitiator having a new structure is obtained, which can exhibits a higher photosensitivity and an excellent as well as characteristics of low odor and low toxicity, when being used in a photocurable composition. This is significantly superior to existing similar photoinitiators.
    Type: Grant
    Filed: August 27, 2018
    Date of Patent: December 27, 2022
    Assignees: Changzhou Tronly New Electronic Materials Co., Ltd., Changzhou Tronly Advanced Electronic Materials Co., Ltd.
    Inventor: Xiaochun Qian
  • Publication number: 20210387948
    Abstract: The present invention discloses a triphenylsulfonium salt compound as shown in the general formula (I), wherein R1 represents an electron-withdrawing group and R2 represents an amplification group. Said compound shows significantly enhanced solubility and photosensitivity compared with unsubstituted triphenylsulfonium salts, and has significantly advantageous performance compared with prior art improved substitutes.
    Type: Application
    Filed: September 27, 2019
    Publication date: December 16, 2021
    Inventor: Xiaochun Qian
  • Publication number: 20210363102
    Abstract: The present invention provides a sulfonium salt photoinitiator, a preparation method therefor, a photocurable composition comprising sulfonium salt photoinitiator, and use thereof. The sulfonium salt photoinitiator has a structure represented by formula (I). By modifying the structure of an existing sulfonium salt photoinitiator, a sulfonium salt photoinitiator having a new structure is obtained, which can exhibits a higher photosensitivity and an excellent as well as characteristics of low odor and low toxicity, when being used in a photocurable composition. This is significantly superior to existing similar photoinitiators.
    Type: Application
    Filed: August 27, 2018
    Publication date: November 25, 2021
    Inventor: Xiaochun QIAN
  • Patent number: 11118065
    Abstract: A fluorenylaminoketone photoinitiator, a preparation method thereof, and a UV photocurable composition containing same. The photoinitiator has a compound having a structure as shown in general formula (I) or a derivative compound thereof. The fluorenylaminoketone photoinitiator may effectively improve the solubility of traditional photoinitiators and reduce the use of micromolecular active diluents, and may also have high sensitivity and good deep-layer curing. It has very good promotion effect on popularization and application of photocurable compositions, particularly colored ink systems, in the field of photocuring. A UV photocurable composition containing such a fluorenylaminoketone photoinitiator can have an advantage in terms of high sensitivity, no residue after development, good pattern integrity, no or little odor of coating layers after curing, or excellent yellowing resistance.
    Type: Grant
    Filed: February 11, 2018
    Date of Patent: September 14, 2021
    Assignee: CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD.
    Inventor: Xiaochun Qian
  • Patent number: 11054743
    Abstract: This invention discloses a fluorene polyfunctional photoinitiator as represented by general formula (I), a photosensitive resin composition containing the same, the preparation of the same, and uses of the two. This compound has the advantages of simple synthesis, low cost, and good solubility, and has good application effects in photocurable compositions. Compared with conventional small molecule photoinitiators, it is not only excellent in photoinitiation activity, but also has the advantages such as low mobility, low odor, and yellowing resistance. The composition has high photosensitivity and good developability, high resolution, and excellent adaptation to a substrate, and is very suitable for producing a black matrix having high light-shielding property, a high-precision and high quality color filter and a liquid crystal display device, and can also be used in optical spacers and ribs, photoresist, wet film, dry film and so on.
    Type: Grant
    Filed: September 28, 2016
    Date of Patent: July 6, 2021
    Assignees: CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD., CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO., LTD.
    Inventor: Xiaochun Qian
  • Patent number: 10995082
    Abstract: This invention discloses a novel cationic photoinitiator and a preparation method and use thereof. The cationic photoinitiator has a structure as represented by general formula (I) below. It can match a longer absorption wavelength in the process of application and has an outstanding photosensitive property, and has characteristics of no proneness to migration and good yellowing resistance.
    Type: Grant
    Filed: August 1, 2017
    Date of Patent: May 4, 2021
    Assignees: Changzhou Tronly New Electronic Materials Co., Ltd., Changzhou Tronly Advanced Electronic Materials Co., Ltd.
    Inventor: Xiaochun Qian
  • Patent number: 10976660
    Abstract: A fluorene-based photoinitiator, a preparation method thereof, a photocurable composition having the same, and use thereof in the field of photocuring are disclosed. In some embodiments, the fluorene-based photoinitiator has a structure represented by Formula I, wherein X is -A-(X?)n, wherein A is selected from a heteroatom which is selected from O, N, or S, X? is selected from a C1-C20 linear alkyl group, a C1-C20 branched alkyl group, a C3-C8 cycloalkyl group, a C1-C10 alkyl group substituted with a C3-C8 cycloalkyl group or one or more of carbon atoms in X? are substituted with a heteroatom, and n is 1 or 2; and R4 is a hydroxy group or a N-morpholinyl group. In some embodiments, the fluorene-based photoinitiator comprises a structure represented by Formula II.
    Type: Grant
    Filed: January 28, 2019
    Date of Patent: April 13, 2021
    Assignee: CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO , LTD.
    Inventor: Xiaochun Qian
  • Publication number: 20210053929
    Abstract: A group of polyfunctional oxetane-based compounds having a structure as represented by general formula (I) or a product obtained by a reaction between a compound of general formula (I) and epichlorohydrin, an ester compound, or an isocyanate compound. When these polyfunctional oxetane-based compounds are used as cation polymerizable monomers in combination with an epoxy compound, the curing speed is high, and the cured product has highly excellent hardness, flexibility, adherence, and heat resistance.
    Type: Application
    Filed: November 5, 2020
    Publication date: February 25, 2021
    Applicants: CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO., LTD., CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD.
    Inventor: Xiaochun Qian
  • Patent number: 10906882
    Abstract: A group of polyfunctional oxetane-based compounds having a structure as represented by general formula (I) or a product obtained by a reaction between a compound of general formula (I) and epichlorohydrin, an ester compound, or an isocyanate compound. When these polyfunctional oxetane-based compounds are used as cation polymerizable monomers in combination with an epoxy compound, the curing speed is high, and the cured product has highly excellent hardness, flexibility, adherence, and heat resistance.
    Type: Grant
    Filed: January 11, 2019
    Date of Patent: February 2, 2021
    Assignee: CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD.
    Inventor: Xiaochun Qian
  • Publication number: 20200264508
    Abstract: This invention discloses a fluorene polyfunctional photoinitiator as represented by general formula (I), a photosensitive resin composition containing the same, the preparation of the same, and uses of the two. This compound has the advantages of simple synthesis, low cost, and good solubility, and has good application effects in photocurable compositions. Compared with conventional small molecule photoinitiators, it is not only excellent in photoinitiation activity, but also has the advantages such as low mobility, low odor, and yellowing resistance. The composition has high photosensitivity and good developability, high resolution, and excellent adaptation to a substrate, and is very suitable for producing a black matrix having high light-shielding property, a high-precision and high quality color filter and a liquid crystal display device, and can also be used in optical spacers and ribs, photoresist, wet film, dry film and so on.
    Type: Application
    Filed: September 28, 2016
    Publication date: August 20, 2020
    Applicants: CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD., CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO., LTD.
    Inventor: Xiaochun Qian
  • Patent number: 10642155
    Abstract: A hybrid photosensitive resin having a structure represented by general formula (I) and contains an oxetanyl functional group and a (meth)acryloxy functional group. The functional groups are coordinated with each other and the functionality is adjustable and controllable. The hybrid photosensitive resin is highly suitable for radical-cation photocuring systems, there is no problem of polymerization inhibition by oxygen, and its cured film has high hardness, good flexibility, excellent adherence, and excellent heat resistance.
    Type: Grant
    Filed: January 11, 2019
    Date of Patent: May 5, 2020
    Assignees: Changzhou Tronly Advanced Electronic Materials Co., Ltd., Changzhou Tronly New Electronic Materials Co., Ltd.
    Inventor: Xiaochun Qian
  • Publication number: 20200002544
    Abstract: A fluorenylaminoketone photoinitiator, a preparation method thereof, and a UV photocurable composition containing same. The photoinitiator has a compound having a structure as shown in general formula (I) or a derivative compound thereof. The fluorenylaminoketone photoinitiator may effectively improve the solubility of traditional photoinitiators and reduce the use of micromolecular active diluents, and may also have high sensitivity and good deep-layer curing. It has very good promotion effect on popularization and application of photocurable compositions, particularly colored ink systems, in the field of photocuring. A UV photocurable composition containing such a fluorenylaminoketone photoinitiator can have an advantage in terms of high sensitivity, no residue after development, good pattern integrity, no or little odor of coating layers after curing, or excellent yellowing resistance.
    Type: Application
    Filed: February 11, 2018
    Publication date: January 2, 2020
    Inventor: Xiaochun QIAN
  • Publication number: 20190391491
    Abstract: A hybrid photosensitive resin having a structure represented by general formula (I) and contains an oxetanyl functional group and a (meth)acryloxy functional group. The functional groups are coordinated with each other and the functionality is adjustable and controllable. The hybrid photosensitive resin is highly suitable for radical-cation photocuring systems, there is no problem of polymerization inhibition by oxygen, and its cured film has high hardness, good flexibility, excellent adherence, and excellent heat resistance.
    Type: Application
    Filed: January 11, 2019
    Publication date: December 26, 2019
    Inventor: Xiaochun Qian
  • Patent number: 10421708
    Abstract: The present disclosure provides a sensitizer for UV-LED photocuring, having a chemical structure as represented by formula (I). This sensitizer has a very good adaptability to existing photoinitiators, can significantly improve the curing efficiency under the irradiation of a UV-LED light source when used in a photocurable composition, and has excellent application properties.
    Type: Grant
    Filed: June 23, 2016
    Date of Patent: September 24, 2019
    Assignee: Changzhou Tronly New Electronic Materials Co., Ltd.
    Inventor: Xiaochun Qian