Patents by Inventor Xiaoshuang Chen

Xiaoshuang Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240296218
    Abstract: A password resetting method includes a user entering first authentication content based on prompts of a first electronic device, and when the first authentication content on the first electronic device matches second authentication content on an associated second electronic device, the first electronic device may allow and prompt the user to reset a lock screen password. The second electronic device is a device that has an association relationship with the first electronic device. Therefore, when forgetting the lock screen password, the user may reset the lock screen password by authenticating the second electronic device.
    Type: Application
    Filed: December 14, 2021
    Publication date: September 5, 2024
    Inventors: Xiaodong Chen, Zhiren Xu, Xiaoshuang Ma
  • Publication number: 20240250093
    Abstract: A display panel includes: a display substrate, including a display region and a peripheral region located outside the display region. The peripheral region includes a bonding region; the display substrate specifically includes a base substrate, a plurality of fanout lines located on one side of the base substrate in the peripheral region and extending to the bonding region, and a plurality of first bonding electrodes electrically connected with the fanout lines in one-to-one correspondence in the bonding region; a drive chip, including a drive chip body and a plurality of pins located on a side of the drive chip body facing the display substrate; wherein the plurality of pins include a plurality of output pins bonded with the first bonding electrodes in one-to-one correspondence.
    Type: Application
    Filed: May 31, 2021
    Publication date: July 25, 2024
    Inventors: Bin WAN, Xiaoyuan WANG, Junhui WU, Junming CHEN, Guodong YANG, Xiaoshuang ZHENG, Zhicheng FAN
  • Publication number: 20240047598
    Abstract: The present disclosure relates to an infrared photodetector based on a van der waals heterostructure and a preparation method thereof. The infrared photodetector comprises a fully depleted van der waals heterostructure. The fully depleted van der waals heterostructure comprises a first n-type two-dimensional semiconductor layer, a p-type two-dimensional semiconductor layer, and a second n-type two-dimensional semiconductor layer which are sequentially provided from bottom to top. A fully depleted built-in electric field is formed by means of a sandwich structure including the first n-type two-dimensional semiconductor layer, the p-type two-dimensional semiconductor layer and the second n-type two-dimensional semiconductor layer, which can improve the light absorption efficiency while reducing the dark current of a device, and the separation rate and collection efficiency of photo-induced carriers are accelerated.
    Type: Application
    Filed: November 21, 2022
    Publication date: February 8, 2024
    Inventors: FANG WANG, FUXING DAI, WEIDA HU, XIAOSHUANG CHEN, WEI LU
  • Publication number: 20230420594
    Abstract: The present disclosure provides a momentum-matching and band-alignment van der Waals (vdW) infrared photodetector and a fabrication method thereof. The photodetector includes a substrate, a dielectric layer, a Bi2O2Se layer, a black phosphorus (BP) layer, a metal source and a metal drain. The fabrication method includes: transferring, in a wet manner, the Bi2O2Se layer grown on the mica substrate onto the substrate having the dielectric layer, transferring the mechanically exfoliated BP layer through a micro-region fixed-point transfer device onto the Bi2O2Se layer, and separately fabricating the metal source and the metal drain on the Bi2O2Se layer and the BP layer by processes such as electron beam exposure and electron beam evaporation, thereby forming the momentum-matching and band-alignment vdW infrared photodetector having a vertical structure.
    Type: Application
    Filed: June 24, 2022
    Publication date: December 28, 2023
    Inventors: Weida HU, Zhen WANG, Yunfeng CHEN, Jinshui MIAO, Peng WANG, Fang ZHONG, Ting HE, Runzhang XIE, Fang WANG, Xiaoshuang CHEN, Wei LU
  • Patent number: 11810988
    Abstract: The present disclosure provides an integrated infrared circular polarization detector with a high extinction ratio and a design method thereof. The detector structurally includes a metal reflective layer, a bottom electrode layer, a quantum well layer, a top electrode layer, and a two-dimensional chiral metamaterial layer. Under circularly polarized light with the selected handedness, surface plasmon polariton waves are generated at the interface between the two-dimensional chiral metamaterial layer and the semiconductor, and has a main electric field component aligned with the absorption direction of the quantum wells, thereby enhancing the absorption of the quantum wells. Under circularly polarized light with the opposite handedness, since most of the optical power is reflected, surface plasmon polariton waves cannot be effectively excited, and the absorption of the quantum wells is extremely low, thus realizing the capability of infrared circular polarization detection with a high extinction ratio.
    Type: Grant
    Filed: November 10, 2020
    Date of Patent: November 7, 2023
    Assignee: Shanghai Institute of Technical Physics, Chinese Academy of Sciences
    Inventors: Jing Zhou, Zeshi Chu, Xu Dai, Yu Yu, Mengke Lan, Shangkun Guo, Jie Deng, Xiaoshuang Chen, Qingyuan Cai, Fangzhe Li, Zhaoyu Ji
  • Publication number: 20220393049
    Abstract: The present disclosure provides an integrated infrared circular polarization detector with a high extinction ratio and a design method thereof. The detector structurally includes a metal reflective layer, a bottom electrode layer, a quantum well layer, a top electrode layer, and a two-dimensional chiral metamaterial layer. Under circularly polarized light with the selected handedness, surface plasmon polariton waves are generated at the interface between the two-dimensional chiral metamaterial layer and the semiconductor, and has a main electric field component aligned with the absorption direction of the quantum wells, thereby enhancing the absorption of the quantum wells. Under circularly polarized light with the opposite handedness, since most of the optical power is reflected, surface plasmon polariton waves cannot be effectively excited, and the absorption of the quantum wells is extremely low, thus realizing the capability of infrared circular polarization detection with a high extinction ratio.
    Type: Application
    Filed: November 10, 2020
    Publication date: December 8, 2022
    Applicant: SHANGHAI INSTITUTE OF TECHNICAL PHYSICS, CHINESE ACADEMY OF SCIENCES
    Inventors: Jing Zhou, Zeshi Chu, Xu Dai, Yu Yu, Mengke Lan, Shangkun Guo, Jie Deng, Xiaoshuang Chen, Qingyuan Cai, Fangzhe Li, Zhaoyu Ji
  • Publication number: 20220215296
    Abstract: This application discloses a feature effectiveness assessment method performed by an electronic device. The method including: constructing a feature combination set including a plurality of feature combinations, the feature combination being a combination of original features of to-be-recommended content; obtaining feature value sets respectively corresponding to the feature combinations, the feature value sets including feature values of combined features based on the corresponding feature combination; determining weight values corresponding to the combined features based on the feature values of the combined features in the corresponding feature value sets; constructing weight value sets corresponding to the feature combinations based on the weight values of the combined features; and respectively determining effectivenesses of the feature combinations based on the weight value sets of the feature combinations.
    Type: Application
    Filed: March 24, 2022
    Publication date: July 7, 2022
    Inventors: Xiaoshuang CHEN, Chungong YU
  • Publication number: 20220085228
    Abstract: The present disclosure provides a two-dimensional material detector with an asymmetrically integrated optical microstrip antenna, structurally including a metal reflecting surface, a dielectric spacer layer, a two-dimensional active material layer, a top source electrode, and a drain electrode integrated with a metal strip array. Self-driven photoresponse of a metal/two-dimensional material/metal structure is induced by a Schottky junction formed due to contact between the two-dimensional material and the metal. The asymmetrically integrated optical microstrip antennas break the symmetry between the two contact/two-dimensional material junctions. Light absorption in the contact/two-dimensional material junction integrated with optical patch antennas is significantly enhanced by efficient light in-coupling and intensified light localization; meanwhile, the extended boundary of the contact/two-dimensional material junction enlarges the photocurrent collection area.
    Type: Application
    Filed: September 15, 2021
    Publication date: March 17, 2022
    Applicant: Shanghai Institute of Technical Physics Chinese Academy of Sciences
    Inventors: Jing Zhou, Shangkun Guo, Yu Yu, Zhaoyu Ji, Xu Dai, Jie Deng, Xiaoshuang Chen, Qingyuan Cai, Zeshi Chu, Fangzhe Li, Mengke Lan
  • Patent number: 7907340
    Abstract: Taught herein is an integragted narrow bandpass filter array and a method of its fabrication. The filter array is a Fabry-Perot type of filter array, wherein the pass band changes with the thickness of the spacer layer. The integrated filter array comprises a substrate, a lower mirror stack, a spacer array, and an upper mirror stack. The spacer array is an array of varied thicknesses formed using a combinatorial deposition technique. The spacer array is used to control the pass band of each mini-size narrow bandpass filter and realizes the integration of narrow bandpass filters with different pass bands on a single substrate. The merit of this technique lies in its fabrication efficiency and finished product rate which are much higher than for conventional methods. The filter array is completely matched with detector arrays and functional in most of the important optical ranges.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: March 15, 2011
    Assignee: Shanghai Institute of Technical Physics, Chinese Academy of Sciences
    Inventors: Shaowei Wang, Wei Lu, Xiaoshuang Chen, Ning Li, Bo Zhang, Zhifeng Li, Pingping Chen
  • Publication number: 20080042782
    Abstract: Taught herein is an integragted narrow bandpass filter array and a method of its fabrication. The filter array is a Fabry-Perot type of filter array, wherein the pass band changes with the thickness of the spacer layer. The integrated filter array comprises a substrate, a lower mirror stack, a spacer array, and an upper mirror stack. The spacer array is an array of varied thicknesses formed using a combinatorial deposition technique. The spacer array is used to control the pass band of each mini-size narrow bandpass filter and realizes the integration of narrow bandpass filters with different pass bands on a single substrate. The merit of this technique lies in its fabrication efficiency and finished product rate which are much higher than for conventional methods. The filter array is completely matched with detector arrays and functional in most of the important optical ranges.
    Type: Application
    Filed: October 26, 2007
    Publication date: February 21, 2008
    Applicant: SHANGHAI INSTITUTE OF TECHNICAL PHYSICS, CHINESE ACADEMY OF SCIENCES
    Inventors: Shaowei WANG, Wei LU, Xiaoshuang CHEN, Ning LI, Bo ZHANG, Zhifeng LI, Pingping CHEN