Abstract: A transparent display panel, including a substrate, a first electrode layer disposed on the substrate, a light-emitting structure layer disposed on the first electrode layer, and a second electrode layer disposed on the light-emitting structure layer; the first electrode layer includes a plurality of first electrode groups arranged along a first direction; each of the first electrode groups includes at least one first electrode extending along a second direction, the second direction intersects with the first direction; each of the at least one first electrode includes at least two first electrode blocks and at least one connecting part, and two adjacent first electrode blocks are electrically connected with each other by a corresponding connecting part.

Abstract: Display panel and display device are provided. The display panel includes a substrate, a light-emitting layer on a first side of the substrate, and a light-shielding layer on a side of the light-emitting layer away from the substrate. A first area of the light-shielding layer includes a plurality of first light-transmitting holes, and a second area of the light-shielding layer includes a plurality of second light-transmitting holes. The display panel includes a first display area and a second display area, the first display area is a light collection area, the first area of the light-shielding layer is in a non-opening area of the first display area, and the second area of the light-shielding layer is in a non-opening area of the second display area.

Abstract: Embodiments of the present disclosure provide a display panel and a display device. The display panel includes multiple light-emitting elements located at the display region. The display panel also includes a light-shielding unit and a reflection adjusting unit. Along the thickness direction of the display panel, a light-shielding unit of the multiple light-shielding units at least partially overlaps a gap between two adjacent ones of the plurality of light-emitting elements. The reflection adjusting unit overlaps at least part of the light-shielding unit.

Abstract: The present application provides a display panel comprising a substrate and a plurality of film layers disposed on the substrate in sequence, and at least one of the film layers having a patterned structure, wherein the display panel has at least a first location and a second location different from the first location, and the film layers arranged in a thickness direction of the display panel at the first location are different from the film layers arranged in a thickness direction of the display panel at the second location, a first optical length L1 at the first location and a second optical length L2 at the second location meet the following conditions: L1=d1*n1+d2*n2+ . . . +di*ni, L2=D1*N1+D2*N2+ . . . +Dj*Nj, (m??)??L1?L2?(m+?)?, wherein ? is a constant between 380 nm and 780 nm; m is a natural number; and ? is a constant between 0 and 0.2.

Abstract: The present disclosure provides a transparent OLED substrate, a display panel, and an OLED substrate. The transparent OLED substrate includes: a base substrate; a first electrode layer formed over the base substrate; a pixel defining layer formed over the first electrode layer, the pixel defining layer including a plurality of pixel defining holes penetrating the pixel defining layer to the first electrode layer, and an exposed area of the first electrode layer is equal to an area of the pixel defining hole; a light emitting layer formed over the pixel defining layer and including organic light emitting blocks; a second electrode layer formed over the light emitting layer; wherein each of the pixel defining holes corresponds to a plurality of the organic light emitting blocks.

Abstract: A transparent display panel, including a substrate, a first electrode layer disposed on the substrate, a light-emitting structure layer disposed on the first electrode layer, and a second electrode layer disposed on the light-emitting structure layer; the first electrode layer includes a plurality of first electrode groups arranged along a first direction; each of the first electrode groups includes at least one first electrode extending along a second direction, the second direction intersects with the first direction; each of the at least one first electrode includes at least two first electrode blocks and at least one connecting part, and two adjacent first electrode blocks are electrically connected with each other by a corresponding connecting part.

Abstract: The present disclosure provides a transparent OLED substrate, a display panel, and an OLED substrate. The transparent OLED substrate includes: a base substrate; a first electrode layer formed over the base substrate; a pixel defining layer formed over the first electrode layer, the pixel defining layer including a plurality of pixel defining holes penetrating the pixel defining layer to the first electrode layer, and an exposed area of the first electrode layer is equal to an area of the pixel defining hole; a light emitting layer formed over the pixel defining layer and including organic light emitting blocks; a second electrode layer formed over the light emitting layer; wherein each of the pixel defining holes corresponds to a plurality of the organic light emitting blocks.

Abstract: The application relates to a display panel, a display screen and a display terminal. A first electrode in the display panel has a one-to-one correspondence with a pixel circuit, the second electrode is a full-surface electrode, and a scan line and a data line are connected to the pixel circuit, and the scan line controls the turning on and turning off of the pixel circuit. When the pixel circuit is turned on, the data line provides a driving current for the first electrode to control the sub-pixel to emit light. The pillar on the pixel defining layer at least partially covers the active layer in the pixel circuit. The pillar is made of a non-specular reflective material; and the reflectivity of the material of the pillar is less than the reflectivity of a metal, and/or the material of the pillar is a low light transmittance material.

Abstract: The present application provides a display panel comprising a substrate and a plurality of film layers disposed on the substrate in sequence, and at least one of the film layers having a patterned structure, wherein the display panel has at least a first location and a second location different from the first location, and the film layers arranged in a thickness direction of the display panel at the first location are different from the film layers arranged in a thickness direction of the display panel at the second location, a first optical length L1 at the first location and a second optical length L2 at the second location meet the following conditions: L1=d1*n1+d2*n2+ . . .+di*ni, L2=D1*N1+D2*N2+ . . . +Dj*Nj, (m??)??L1-L2?(m+?)?, wherein ? is a constant between 380 nm and 780 nm; m is a natural number; and ? is a constant between 0 and 0.2.

Abstract: A method for manufacturing an array substrate, and an array substrate, a display panel and a display device are provided. The method may include: forming, on one side of a substrate, a gate electrode layer, a gate insulation layer and a semiconductor layer, wherein the gate electrode layer has a same pattern as the semiconductor layer; forming an etching stop layer on the semiconductor layer; forming a first, second hole and third through holes by patterning the etching stop layer; forming a source electrode layer and a drain electrode layer on the etching stop layer, wherein the source electrode layer is electrically connected with the semiconductor layer via the first through hole, and the drain electrode layer is electrically connected with the semiconductor layer via the second through hole; forming an active layer by etching the semiconductor layer at the location corresponding to the third through hole.

Abstract: A method for manufacturing an array substrate, and an array substrate, a display panel and a display device are provided. The method may include: forming, on one side of a substrate, a gate electrode layer, a gate insulation layer and a semiconductor layer, wherein the gate electrode layer has a same pattern as the semiconductor layer; forming an etching stop layer on the semiconductor layer; forming a first, second hole and third through holes by patterning the etching stop layer; forming a source electrode layer and a drain electrode layer on the etching stop layer, wherein the source electrode layer is electrically connected with the semiconductor layer via the first through hole, and the drain electrode layer is electrically connected with the semiconductor layer via the second through hole; forming an active layer by etching the semiconductor layer at the location corresponding to the third through hole.

Abstract: A method for manufacturing an array substrate, and an array substrate, a display panel and a display device are provided. The method may include: forming, on one side of a substrate, a gate electrode layer, a gate insulation layer and a semiconductor layer, wherein the gate electrode layer has a same pattern as the semiconductor layer; forming an etching stop layer on the semiconductor layer; forming a first, second hole and third through holes by patterning the etching stop layer; forming a source electrode layer and a drain electrode layer on the etching stop layer, wherein the source electrode layer is electrically connected with the semiconductor layer via the first through hole, and the drain electrode layer is electrically connected with the semiconductor layer via the second through hole; forming an active layer by etching the semiconductor layer at the location corresponding to the third through hole.

Abstract: Embodiments of the invention provide an array substrate and a fabrication method thereof and a display device. The fabrication method of an array substrate includes: forming a semiconductor active layer, a gate insulating layer and a gate electrode on a substrate; forming a light-shielding layer; forming a first color filter layer, forming a second color filter layer and forming a third color filter layer; and forming via holes that respectively penetrate through the first color filter layer, the second color filter layer and the third color filter layers; and forming a pixel electrode and source and drain electrodes.

Abstract: A method for manufacturing an array substrate, and an array substrate, a display panel and a display device are provided. The method may include: forming, on one side of a substrate, a gate electrode layer, a gate insulation layer and a semiconductor layer, wherein the gate electrode layer has a same pattern as the semiconductor layer; forming an etching stop layer on the semiconductor layer; forming a first, second hole and third through holes by patterning the etching stop layer; forming a source electrode layer and a drain electrode layer on the etching stop layer, wherein the source electrode layer is electrically connected with the semiconductor layer via the first through hole, and the drain electrode layer is electrically connected with the semiconductor layer via the second through hole; forming an active layer by etching the semiconductor layer at the location corresponding to the third through hole.

Abstract: Embodiments of the present application relate to an array substrate, the manufacturing method thereof and a display device. The array substrate comprises: a substrate, of gate lines and of data lines, a plurality of pixel units, defined by the gate lines and the data lines, each of the pixel units comprising a thin film transistor and a pixel electrode, wherein the thin film transistor comprises a source electrode, a drain electrode, an active layer, a gate insulating layer and a gate electrode, and the source electrode and the drain electrode are provided on the substrate opposing to each other with a channel of the thin film transistor provided therebetween, and the pixel electrode is positioned in a region outside the thin film transistor within the pixel unit, and is extended to a position above the drain electrode to be partly lapped over and directly connected to the drain electrode.

Abstract: Embodiments of the invention provide an array substrate and a fabrication method thereof and a display device. The fabrication method of an array substrate includes: forming a semiconductor active layer, a gate insulating layer and a gate electrode on a substrate; forming a light-shielding layer; forming a first color filter layer, forming a second color filter layer and forming a third color filter layer; and forming via holes that respectively penetrate through the first color filter layer, the second color filter layer and the third color filter layers; and forming a pixel electrode and source and drain electrodes.

Abstract: Embodiments of the present invention provide an array substrate, a method for manufacturing the same and a display device. The method for manufacturing a thin film transistor array substrate comprises: forming a passivation layer and a resin layer on a substrate in sequence; removing a part of the resin layer through a patterning process, so as to form a resin-layer via hole passing through the resin layer; etching the passivation layer under the resin-layer via hole, so as to form a via hole passing through the resin layer and the passivation layer; treating the via hole with an etching process, so that a sidewall at the resin layer and a sidewall at the passivation layer for the via hole smoothly adjoin.

Abstract: Embodiments of the present invention provide a thin film transistor, an array substrate and a display device. The thin film transistor comprises a gate layer, a first insulating layer, an active layer, an etch stop layer and a source/drain electrode layer, wherein the active layer is made of a metal oxide material, the first insulating layer, the active layer, the etch stop layer and the source/drain electrode layer are sequentially stacked from bottom to top, the source/drain electrode layer contains an interval separating a source electrode and a drain electrode therein, the etch stop layer is located below the interval, and the etch stop layer has a width greater than that of the interval, and the first insulating layer comprises a laminate of a first sub-insulation layer and a second sub-insulation layer, the second sub-insulation layer is in contact with the active layer and made of an oxygen-rich insulating material.

Abstract: Embodiments of the present application relate to an array substrate, the manufacturing method thereof and a display device. The array substrate comprises: a substrate, of gate lines and of data lines, a plurality of pixel units, defined by the gate lines and the data lines, each of the pixel units comprising a thin film transistor and a pixel electrode, wherein the thin film transistor comprises a source electrode, a drain electrode, an active layer, a gate insulating layer and a gate electrode, and the source electrode and the drain electrode are provided on the substrate opposing to each other with a channel of the thin film transistor provided therebetween, and the pixel electrode is positioned in a region outside the thin film transistor within the pixel unit, and is extended to a position above the drain electrode to be partly lapped over and directly connected to the drain electrode.

Abstract: Embodiments of the present invention provide a thin film transistor, an array substrate and a display device. The thin film transistor comprises a gate layer, a first insulating layer, an active layer, an etch stop layer and a source/drain electrode layer, wherein the active layer is made of a metal oxide material, the first insulating layer, the active layer, the etch stop layer and the source/drain electrode layer are sequentially stacked from bottom to top, the source/drain electrode layer contains an interval separating a source electrode and a drain electrode therein, the etch stop layer is located below the interval, and the etch stop layer has a width greater than that of the interval, and the first insulating layer comprises a laminate of a first sub-insulation layer and a second sub-insulation layer, the second sub-insulation layer is in contact with the active layer and made of an oxygen-rich insulating material.