Patents by Inventor Xinbing Liu

Xinbing Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7204911
    Abstract: A microcavity-forming system for making microcavities in a wire (especially a tungsten filament wire). The system has a coating station receiving the wire and applying a polymer coating to the wire. A mask-forming station receives the polymer-coated wire and blows moist air over it to form air bubbles which result in holes in the polymer coating, thereby creating a mask. An etching station receives the wire, as coated with the polymer mask, from the mask-forming station and etches the wire through the holes in the polymer mask to form microcavities in the wire. A stripping station receives the wire from the etching station and removes the polymer mask from the wire, leaving the wire with microcavities. Processes of forming microcavities in a wire and, more generally, of making an etching mask having arrays of holes and conforming to substantially any surface, including an arbitrary curved surface, are provided.
    Type: Grant
    Filed: March 19, 2004
    Date of Patent: April 17, 2007
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Xinbing Liu
  • Publication number: 20070052326
    Abstract: A vibration machining apparatus and method of use. The vibration machining apparatus includes a cutting tool and a motion stage coupled to one of the cutting tool or the workpiece to move the cutting tool relative to the workpiece. A tangent to a machine path and a normal to the surface of the workpiece define a vibration plane. The vibration machining apparatus further includes a first vibrating unit coupled to one of the cutting tool or the workpiece to vibrate it along a first vibrational direction, substantially in the vibration plane, and a second vibrating unit coupled with one of the cutting tool or the workpiece to vibrate the one of the cutting tool or the workpiece coupled to the second vibrating unit along a second vibrational direction, different from the first direction and substantially in the vibration plane.
    Type: Application
    Filed: September 7, 2005
    Publication date: March 8, 2007
    Inventor: Xinbing Liu
  • Publication number: 20070026676
    Abstract: A method for forming a via in a sapphire substrate with a laser machining system that includes an ultrafast pulsed laser source. The sapphire substrate is provided. Pulses of laser light are substantially focused to a beam spot on the first surface of the sapphire substrate such that each focused pulse of laser light ablates a volume of the sapphire substrate having a depth less than the substrate thickness. The beam spot of the focused laser light pulses is scanned over a via portion of the first surface of the sapphire substrate. The sapphire substrate is moved in a direction substantially normal to the first surface to control the volume of the sapphire substrate ablated by each pulse of laser light to be substantially constant. The pulsing and scanning steps are repeated until the via is formed extending from the first surface to the second surface of the sapphire substrate.
    Type: Application
    Filed: August 1, 2005
    Publication date: February 1, 2007
    Inventors: Ming Li, Xinbing Liu, Hiroyuki Sakai, Masaaki Nishijima, Daisuke Ueda
  • Publication number: 20060267211
    Abstract: A patterned, multi-layered thin film structure is patterned using ultra-fast lasers and absorption spectroscopy without damaging underlying layers of the layered structure. The structure is made by selecting ablatable layers based on their thermal, strength and absorption spectra and by using an ultra-fast laser programmed with the appropriate wavelength (?), pulse width (?), spectral width (??), spot size, bite size and fluence. The end structure may have features (such as vias, insulating areas, or inkjet printed areas) patterned in the last (top) layer applied or at deeper layers within the layered structure, and can be used as components of organic light emitting didoes (OLEDs) and organic thin film transistors (OTFTs). The method of the present invention includes determining the product's specifications, providing a substrate, selecting a layer, applying the layer, patterning the layer and determining if more layers need to be added to the multi-layered thin film structure.
    Type: Application
    Filed: August 9, 2006
    Publication date: November 30, 2006
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventors: Chen-Hsiung Cheng, Xinbing Liu, Atsushi Sogami, Kazuo Nishimura
  • Publication number: 20060263698
    Abstract: An apparatus and method for making a grayscale photo mask and a three-dimensional grayscale diffractive optical element operate as follows. A grayscale photo mask is obtained by exposing a laser direct write (LDW) glass material to laser beam radiation from a first laser beam of modulated power moved over a grid of discrete locations on the LDW material, the modulated power being in accordance with grayscale pattern data, and, while the first laser beam is moved over the discrete locations of the grid, exposing the grid to a second laser beam, the power of the second laser beam being less than the bleach threshold of the glass material, to provide each of the discrete locations with a gray scale level to provide a predetermined gray scale pattern of varying optical transmissivity on the LDW material to produce a grayscale mask.
    Type: Application
    Filed: May 23, 2005
    Publication date: November 23, 2006
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Yosuke Mizuyama, Xinbing Liu
  • Patent number: 7122489
    Abstract: A patterned, multi-layered thin film structure is patterned using ultra-fast lasers and absorption spectroscopy without damaging underlying layers of the layered structure. The structure is made by selecting ablatable layers based on their thermal, strength and absorption spectra and by using an ultra-fast laser programmed with the appropriate wavelength (?), pulse width (?), spectral width (??), spot size, bite size and fluence. The end structure may have features (such as vias, insulating areas, or inkjet printed areas) patterned in the last (top) layer applied or at deeper layers within the layered structure, and can be used as components of organic light emitting didoes (OLEDs) and organic thin film transistors (OTFTs). The method of the present invention includes determining the product's specifications, providing a substrate, selecting a layer, applying the layer, patterning the layer and determining if more layers need to be added to the multi-layered thin film structure.
    Type: Grant
    Filed: May 12, 2004
    Date of Patent: October 17, 2006
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Chen-Hsiung Cheng, Xinbing Liu, Atsushi Sogami, Kazuo Nishimura
  • Publication number: 20060215976
    Abstract: A multicore optical fiber with an integral diffractive element. The multicore optical fiber includes: a first optical fiber core formed of a non-photosensitive material having an initial index of refraction; and a second optical fiber core including a second longitudinal core axis substantially parallel to the first longitudinal axis. The first optical fiber core includes: a first longitudinal core axis; and a number of index-altered portions having an altered index of refraction which is different from the initial index of refraction. The index-altered portions are arranged within the non-photosensitive material of the first optical fiber core to form a diffractive structure of the integral diffractive element.
    Type: Application
    Filed: March 22, 2005
    Publication date: September 28, 2006
    Inventors: Rajminder Singh, Satoshi Yamauchi, Ming Li, Jimmy Yi-Jie Jia, Tetsuo Ohara, Xinbing Liu
  • Publication number: 20060215138
    Abstract: An optical pattern generator for use in grayscale photolithography is provided with an optical source to generate a light beam, an optical modulator optically coupled to the optical source to modulate the power of the light beam, a two dimensional scanning mirror optically coupled to the optical modulator to reflect the light beam, a lens optically coupled to the two dimensional scanning mirror for focusing the reflected light beam to a beam spot on a surface of a substrate coated with photoresist, and control means electrically coupled to the two dimensional scanning mirror to control a tilt of the two dimensional scanning mirror about two substantially orthogonal axes to scan the beam spot over a surface of the substrate in two substantially orthogonal dimensions with sub-micron accuracy.
    Type: Application
    Filed: March 22, 2005
    Publication date: September 28, 2006
    Inventor: Xinbing Liu
  • Publication number: 20060210886
    Abstract: A positive photo resist is provided on a surface of a photo mask blank. Light is then exposed onto the photo resist to form a predetermined pattern of unexposed and exposed portions in the photo-resist. After development, the exposed portions are removed and ions are implanted to obtain a modulated ion density in the photo mask blank. The implanted ions become color centers which absorb a specific wavelength of light and the modulated distribution of the color substrates create the grayscale photo mask. The photo resist structure is finally removed to produce a grayscale photo mask.
    Type: Application
    Filed: March 18, 2005
    Publication date: September 21, 2006
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Yosuke Mizuyama, Xinbing Liu
  • Publication number: 20060126685
    Abstract: A slab laser amplifier with parasitic oscillation suppression has a plurality of angled pump faces related to one another in order to decrease likelihood of parasitic oscillations, with internal beam incidence angles at total internal reflection that alleviate need for reflective coatings. No polished surfaces of gain material comprising the amplifier are parallel to one another. A beam path within the gain material is such that all incident angles of the beam path upon the two main faces and the common end face are greater than a critical angle required for total internal reflection, thereby alleviating need for reflective coatings. Based on an index of refraction of the gain material, and based on a diameter of the laser beam, dimensions of the gain material are selected to maximize beam overlap in a pumped volume of the gain material.
    Type: Application
    Filed: December 15, 2004
    Publication date: June 15, 2006
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventors: Craig First, Xinbing Liu
  • Patent number: 7040130
    Abstract: A microcavity forming device is provided for making microcavities in a tungsten wire. The microcavity forming device includes a source of particles; a housing for receiving a heated tungsten wire; and a plurality of jet nozzles disposed in the housing for spraying the particles toward the heated tungsten wire. The particles are 0.35–0.75 micron in diameter. The heated tungsten wire is received in the housing and the jet nozzles spray the particles toward the tungsten wire to form the microcavities in the tungsten wire.
    Type: Grant
    Filed: October 14, 2003
    Date of Patent: May 9, 2006
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Xinbing Liu, Ming Li, Makoto Ishizuka, Daniel Hogan, Kazuaki Ohkubo, Mitsuhiko Kimoto
  • Publication number: 20060093265
    Abstract: An ultrafast laser machining system and method to form diffractive structures in optical fibers. The fiber is mounted with its longitudinal axis perpendicular to the beam path of the laser pulses. A region of the fiber is illuminated and then imaged with two cameras. These cameras are aligned substantially orthogonally. A position of the beam spot is determined. The beam spot is aligned to a starting position within the region. This position is within a portion of the fiber to be machined for which the beam path passes through the greatest length of material. The beam spot is scanned along a path designed to pass the beam spot through all of the portion to be machined such that the beam path does not pass through previously machined material. The laser pulses, which have a duration of less than about ins, are generated as the beam spot is scanned.
    Type: Application
    Filed: August 26, 2005
    Publication date: May 4, 2006
    Inventors: Jimmy Jia, Ming Li, Rajminder Singh, Xinbing Liu, Tetsuo Ohara
  • Publication number: 20060093012
    Abstract: A multimode long period fiber Bragg grating (LPFBG) for a predetermined wavelength band. The LPFBG formed of a non-photosensitive material having an initial index of refraction. The multimode optical fiber core includes a substantially cylindrical surface, a longitudinal core axis, a core radius, and a number of index-altered portions having an altered index of refraction different from the initial cladding index of refraction. Each of the index-altered multimode optical fiber core has a first transmission surface and second transmission surface that is substantially parallel to the first transmission surface. Also, these index-altered portions are arranged within the non-photosensitive material of the multimode optical fiber core such that the first transmission surface of one portion of the plurality of index-altered portions is substantially parallel to the second transmission surface of a neighboring portion to form a long period Bragg grating structure.
    Type: Application
    Filed: October 29, 2004
    Publication date: May 4, 2006
    Inventors: Rajminder Singh, Ming Li, Jimmy Yi-Jie Jia, Xinbing Liu, Tetsuo Ohara
  • Publication number: 20060000811
    Abstract: A DOE array apparatus includes a plurality of different interchangeable DOEs for use with lasers in manufacturing for versatile tasks such as drilling holes or vias of various sizes and shapes and multiple ablation or material transformation patterns in a surface of an object. A method of using the apparatus in laser processing systems includes: determining a specification for the number of patterns and/or the number of layers to be patterned, designing the appropriate number of DOEs according to the product specification, assembling the DOEs into an array to be used in a laser processing system, ablating the layer on the object through laser processing, determining whether more patterns on the layer are to be processed, determining whether more layers are to be patterned, and changing and aligning the DOE for the next laser ablation or material transformation pattern to be processed.
    Type: Application
    Filed: June 30, 2004
    Publication date: January 5, 2006
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Daniel Hogan, Xinbing Liu
  • Publication number: 20050287445
    Abstract: The present invention relates to manufacturing grayscale masks that are used for mass-producing grayscale DOEs. More specifically, the present invention provides a method whereby a grayscale mask is fabricated by using an absorber layer and a photoresist with a laser writer. The method of the present invention includes the steps of providing a substrate with a known layer of absorber and a layer of photoresist, exposing the photoresist to a grayscale pattern from a laser writer, developing the photoresist into variable thickness, and transferring the surface relief pattern from the photoresist layer onto the absorber layer by etching.
    Type: Application
    Filed: June 29, 2004
    Publication date: December 29, 2005
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventor: Xinbing Liu
  • Patent number: 6979521
    Abstract: The present invention relates to manufacturing grayscale masks that are used for mass-producing grayscale DOEs. More specifically, the present invention provides a method whereby a grayscale mask is fabricated by using an absorber layer and a photoresist with a laser writer. The method of the present invention includes the steps of providing a substrate with a known layer of absorber and a layer of photoresist, exposing the photoresist to a grayscale pattern from a laser writer, developing the photoresist into variable thickness, and transferring the surface relief pattern from the photoresist layer onto the absorber layer by etching.
    Type: Grant
    Filed: June 29, 2004
    Date of Patent: December 27, 2005
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Xinbing Liu
  • Publication number: 20050265202
    Abstract: The present invention is an optical pick-up system for use in an optical disk device including more efficient beam diffraction for tracking purposes. The system may be used for one or more types of optical disks (e.g., DVDs, CDs, CD-ROMs). The invention includes a system for use in a DVD player; however, the present invention is applicable to any optical disk device. The system invention includes a gray-scale grating, which provides more efficient diffraction of tracking and processing portions of the laser(s) used in optical disk devices.
    Type: Application
    Filed: June 1, 2004
    Publication date: December 1, 2005
    Inventor: Xinbing Liu
  • Publication number: 20050255715
    Abstract: A patterned, multi-layered thin film structure is patterned using ultra-fast lasers and absorption spectroscopy without damaging underlying layers of the layered structure. The structure is made by selecting ablatable layers based on their thermal, strength and absorption spectra and by using an ultra-fast laser programmed with the appropriate wavelength (?), pulse width (?), spectral width (??), spot size, bite size and fluence. The end structure may have features (such as vias, insulating areas, or inkjet printed areas) patterned in the last (top) layer applied or at deeper layers within the layered structure, and can be used as components of organic light emitting didoes (OLEDs) and organic thin film transistors (OTFTs). The method of the present invention includes determining the product's specifications, providing a substrate, selecting a layer, applying the layer, patterning the layer and determining if more layers need to be added to the multi-layered thin film structure.
    Type: Application
    Filed: May 12, 2004
    Publication date: November 17, 2005
    Inventors: Chen-Hsiung Cheng, Xinbing Liu, Atsushi Sogami, Kazuo Nishimura
  • Publication number: 20050230369
    Abstract: A method of operating a laser drilling system to manufacture gravure printing plates without etching or the use of hazardous chemicals includes activating a laser drilling system, including a picosecond laser, light valves, and a mechanism adapted to rotate a gravure cylinder blank. Operation of the light valves, includes setting the light valves to block and/or allow pulses of laser energy propagating from the laser drilling system that can ablate a linear pattern of cells along a substantially entire length of the gravure cylinder blank. Drilling of cells includes targeting the laser drilling system on the gravure cylinder blank, such that ablation of materials occurs as sub-beams propagate along an optical path to the target area and impinge upon the gravure cylinder blank, wherein specific cells within the target area of the gravure cylinder blank are drilled or not drilled according to settings of the light valves.
    Type: Application
    Filed: March 3, 2005
    Publication date: October 20, 2005
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Chen-Hsiung Cheng, Xinbing Liu
  • Publication number: 20050230366
    Abstract: A method of operating a laser drilling system to manufacture gravure printing plates without etching or the use of hazardous chemicals includes activating a laser drilling system, including a picosecond laser, light valves, and a mechanism adapted to rotate a gravure cylinder blank. Operation of the light valves, includes setting the light valves to block and/or allow pulses of laser energy propagating from the laser drilling system that can ablate a linear pattern of cells along a substantially entire length of the gravure cylinder blank. Drilling of cells includes targeting the laser drilling system on the gravure cylinder blank, such that ablation of materials occurs as sub-beams propagate along an optical path to the target area and impinge upon the gravure cylinder blank, wherein specific cells within the target area of the gravure cylinder blank are drilled or not drilled according to settings of the light valves.
    Type: Application
    Filed: February 18, 2005
    Publication date: October 20, 2005
    Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
    Inventors: Chen-Hsiung Cheng, Xinbing Liu