Patents by Inventor Xuchu Zeng

Xuchu Zeng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for direct current plasma immersion ion implantation
    Publication number: 20030116090
    Abstract: An apparatus and method are disclosed for a low-pressure steady-state direct current or long-pulse mode of plasma immersion ion implantation. A conducting grid is located between the wafer stage and the supply of plasma. The supply of plasma may be controlled through a variable aperture in which is provided the conducting grid.
    Type: Application
    Filed: February 13, 2003
    Publication date: June 26, 2003
    Applicant: City University of Hong Kong
    Inventors: Paul K. Chu, Dixon T.K. Kwok, Xuchu Zeng
  • Apparatus and method for direct current plasma immersion ion implantation
    Publication number: 20010046566
    Abstract: An apparatus and method are disclosed for a low-pressure steady-state direct current or long-pulse mode of plasma immersion ion implantation. A conducting grid is located between the wafer stage and the supply of plasma. The supply of plasma may be controlled through a variable aperture in which is provided the conducting grid.
    Type: Application
    Filed: March 23, 2001
    Publication date: November 29, 2001
    Inventors: Paul K. Chu, Dixon T.K. Kwok, Xuchu Zeng