Abstract: A color filter array substrate, a method for fabricating the same and a display device are provided. The color filter array substrate comprises an array substrate (310), and a black matrix (320), a color filter layer (341, 342, 343) and a reflection layer (330) formed on the array substrate (310); wherein the black matrix (320) comprising a plurality of openings defining sub-pixel regions; the color filter layer (341, 342, 343) and the reflection layer (330) are disposed in the plurality of openings and the reflection layer (330) is disposed on a side of the color filter layer (341, 342, 343) that is close to the array substrate (310).

Abstract: The present invention provides a dye compound and a method for preparing the same, a colorant, a photosensitive resin composition and an optical filter. As the dye compound of the present invention has an epoxy group, the dye compound can effectively prevent surface shrinkage of an optical filter while improving transmittance thereof.

Abstract: The present invention provides a display panel, a manufacturing method thereof, and a display device. The display panel comprises a base substrate, an opposite substrate, a first electrode, a second electrode, and a plurality of original sub-pixels on at least part of which conversion sub-pixels are provided, and an upper water layer is provided on each of the conversion sub-pixels. The conversion sub-pixel is configured to, when an electric field is generated between the first and second electrodes, shrink to one side of the original sub-pixel so that the upper water layer covers the original sub-pixel from above, and, when no electric field is generated between the first and second electrodes, cover the original sub-pixel located under the conversion sub-pixel from above.

Abstract: The present invention provides a photosensitive resin composition having good developing performance, which belongs to the technical field of polymer material, so as to solve the problem of the poor developing performance of the current photosensitive resin composition. The photosensitive resin composition comprising: based on the total mass of the photosensitive resin composition, 5% to 45% of an alkali-soluble resin, 5% to 40% of an unsaturated monomer having polyffunctional groups, 1% to 10% of a photoinitiator, 10% to 60% of a pigment dispersion, 0% to 5% of an addition, and 20% to 70% of a solvent. In the present invention, tetrahydrofuran groups (flexible functional group) is introduced into the alkali-soluble resin by highly reactive unsaturated monomer, which can improve the developing property of the alkali-soluble resin and can produce a photoresist film with a smooth surface and no corrosion on its side wall.

Abstract: The present invention relates to a modified epoxy acrylate and a method for producing the same, a photoresist composition and a method for producing the same, and a transparent photoresist formed from the photoresist composition. The modified epoxy acrylate is an epoxy acrylate modified with phosphate monomer which has a structure represented by Formula I wherein, n is an integer selected from 1˜21, R is a short-chain carboxylic acid ester group having the structural formula ?in which p is a bivalent saturated or unsaturated carbon chain having 1˜10 carbon atoms, and the carbon chain is optionally substituted by alkyl, alkenyl, hydroxy, nitro or halogen. Since the phosphate can react with the multi-valence metal in substrates so as to connect the polymer onto the substrates firmly through covalent bonds, therefore the adhesion force is improved significantly and the protective function of the tranparent photoresist is improved accordingly.

Abstract: A photoresist composition, comprising: from 0.1 to 1.0 parts of a polyether-modified organosilicon levelling agent 58; from 7 to 23 parts of a polyfunctional monomer; from 13 to 29 parts of a alkaline soluble resin; from 23 to 62.8 parts of a pigment dispersion; from 1.5 to 11.9 parts of a photo-initiator; and from 10 to 45 parts of a solvent, on the basis of parts by weight. The photoresist composition can solve the problem of poor levelling property of the coating film and shrinkage of the film surface after high temperature baking occurring in the existing photoresist composition.

Abstract: The present invention provides a photosensitive resin composition having good developing performance, which belongs to the technical field of polymer material, so as to solve the problem of the poor developing performance of the current photosensitive resin composition. The photosensitive resin composition comprising: based on the total mass of the photosensitive resin composition, 5% to 45% of an alkali-soluble resin, 5% to 40% of an unsaturated monomer having polyffunctional groups, 1% to 10% of a photoinitiator, 10% to 60% of a pigment dispersion, 0% to 5% of an addition, and 20% to 70% of a solvent. In the present invention, tetrahydrofuran groups (flexible functional group) is introduced into the alkali-soluble resin by highly reactive unsaturated monomer, which can improve the developing property of the alkali-soluble resin and can produce a photoresist film with a smooth surface and no corrosion on its side wall.

Abstract: The disclosure discloses a polyacrylate dispersant, a pigment dispersion, a color photoresist, a color filter substrate and a display device. The polyacrylate dispersant of the disclosure is a polyhedral oligomeric silsesquioxane-modified polyacrylate dispersant prepared by an esterification reaction of a polyacrylate dispersant and polyhedral oligomeric silsesquioxane. Due to a steric hindrance effect of the structure of polyhedral oligomeric silsesquioxane, the polyacrylate dispersant of the disclosure may significantly improve the stability of pigment dispersion when used for dispersing pigment powder. A color photoresist prepared based on the pigment dispersion has a prominent heat resistance, an excellent resolution and a surface smoothness, as well as a low dielectric constant.

Abstract: The present invention provides an alkali-soluble resin having good developing performance, which belongs to the technical field of polymer material, so as to solve the problem of the poor developing performance of the current alkali-soluble resin and the photosensitive composition made of the same; and a method for preparing the same. In the present invention, tetrahydrofuran groups (flexible functional group) is introduced into the alkali-soluble resin by highly reactive unsaturated monomer, which can improve the developing property of the alkali-soluble resin and can produce a photoresist film with a smooth surface and no corrosion on its side wall.

Abstract: A pigment dispersing agent, a pigment dispersion solution, a color photoresist, and a process for manufacturing the same, and use in the color film substrate and display device. The pigment dispersing agent is an amino-?-cyclodextrin modified polymethacrylate, the amino-?-cyclodextrin modified polymethacrylate being used to disperse a powdered pigment having an aromatic group, wherein the degree of modification by amino-?-cyclodextrin is 5.36%-35.40%. Because ?-cyclodextrin moiety is a group having affinity for pigments, it can bind to the aromatic group in the pigment molecular structure, thereby capable of dispersing the powdered pigment having an aromatic group. The pigment dispersion solution prepared from the pigment dispersing agent has small particle size, narrow particle size distribution range, and high storage stability, thereby improving the yield of the display product.

Abstract: A polyether compound which is as shown in Formula (I), wherein R1 is a polyether backbone of the polyether polyol; R2 is hydrogen or C1˜C5 alkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage.

Abstract: The disclosure discloses a polyacrylate dispersant, a pigment dispersion, a color photoresist, a color filter substrate and a display device. The polyacrylate dispersant of the disclosure is a polyhedral oligomeric silsesquioxane-modified polyacrylate dispersant prepared by an esterification reaction of a polyacrylate dispersant and polyhedral oligomeric silsesquioxane. Due to a steric hindrance effect of the structure of polyhedral oligomeric silsesquioxane, the polyacrylate dispersant of the disclosure may significantly improve the stability of pigment dispersion when used for dispersing pigment powder. A color photoresist prepared based on the pigment dispersion has a prominent heat resistance, an excellent resolution and a surface smoothness, as well as a low dielectric constant.

Abstract: A pigment dispersion and a method for preparing the same are provided. The pigment dispersion comprises the following components in the following mass percentage: 10%˜20% pigment, 1.5%˜12% dispersant, 0.75%˜7.5% binder resin, 58.5%˜87.3% solvent and 0.45%˜2% nonionic surfactant, based on the total mass of the pigment dispersion. The pigment dispersion is improved in stability, and is applicable to a colored filter.

Abstract: A photoresist monomer, a photoresist and a method for the preparation thereof, a color filter. The photoresist monomer has a structure represented by Formula I, wherein, R1 is hydrogen or methyl; R2 is hydrogen, methyl, ethyl, or propyl; R3 is hydrogen or C1-6 alkyl; and n is from 1 to 4. The resulting photoresist exhibits a compact and smooth surface and a gentle angle of slope.

Abstract: A polyether compound which is as shown in Formula (I), wherein R1 is a polyether backbone of the polyether polyol; R2 is hydrogen or C1˜C5 alkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage.

Abstract: The present invention relates to a cyclodextrin derivative, a method for preparing the same, a photoresist composition, a color photoresist and a display device. The cyclodextrin derivative particularly is a .alpha.-cyclodextrin modified polymerizable monomer represented by the following formula I or I?, wherein k is any integer selected from 2-6, n is any integer selected from 1-3, R is an aromatic ring having 5 to 30 carbon atoms, R? is a multivalent straight or branched carbon chain having 5 to 30 carbon atoms which may optionally be interrupted by an oxygen atom. The ?-cyclodextrin modified polymerizable monomer can be applied to a photoresist composition which has small aberration and high transmittance, thereby improving the display quality of the display apparatus.

Abstract: An alkaline soluble resin, a process for preparing the same, and a photoresist composition containing the same. The alkaline soluble resin is a polyether chain-containing acrylate alkaline soluble resin. A photoresist composition comprising said alkaline soluble resin can reduce the slope angle of the film layer and prevent gaps which cause light leakage from forming in the junction between the colored film layer and the black matrix. Moreover, the coating and the rubbing effect of the orientation layer can be improved.

Abstract: A white light quantum dot complex particle, comprising a seed particle (1) in the core, and a first shell layer (2), a second shell layer (3) and a third shell layer (4) wrapped around the seed particle (1) in order; in the first shell layer (2), the second shell layer (3) and the third shell layer (4) are one of a red light quantum dot layer, a green light quantum dot layer and a blue light quantum dot layer respectively, and are different from one another. Also disclosed is the process for preparing the white light quantum dot complex particle.

Abstract: A photoresist monomer, a photoresist and a method for the preparation thereof, a color filter. The photoresist monomer has a structure represented by Formula I, wherein, R1 is hydrogen or methyl; R2 is hydrogen, methyl, ethyl, or propyl; R3 is hydrogen or C1-6 alkyl; and n is from 1 to 4. The resulting photoresist exhibits a compact and smooth surface and a gentle angle of slope.

Abstract: The present invention provides an alkali-soluble resin having good developing performance, which belongs to the technical field of polymer material, so as to solve the problem of the poor developing performance of the current alkali-soluble resin and the photosensitive composition made of the same; and a method for preparing the same. In the present invention, tetrahydrofuran groups (flexible functional group) is introduced into the alkali-soluble resin by highly reactive unsaturated monomer, which can improve the developing property of the alkali-soluble resin and can produce a photoresist film with a smooth surface and no corrosion on its side wall.