Patents by Inventor Xuelong Cao

Xuelong Cao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Global shape definition method for scatterometry
    Patent number: 7613598
    Abstract: A method for modeling samples includes the use of control points to define lines profiles and other geometric shapes. Each control point used within a model influences a shape within the model. Typically, the control points are used in a connect-the-dots fashion where a set of dots defines the outline or profile of a shape. The layers within the sample are typically modeled independently of the shape defined using the control points. The overall result is to minimize the number of parameters used to model shapes while maintaining the accuracy of the resulting scatterometry models.
    Type: Grant
    Filed: October 4, 2006
    Date of Patent: November 3, 2009
    Assignee: KLA-Tencor Corp.
    Inventors: Jon Opsal, Hanyou Chu, Xuelong Cao, Youxian Wen
  • Method of compensating photomask data for the effects of etch and lithography processes
    Patent number: 7600212
    Abstract: A method for synthesizing a photomask data set from a given target layout, including the following steps: (a) providing a set of target polygons for the target layout; (b) fitting a smooth curve to a target polygon of the set of target polygons, the curve having a set of etch-target points; (c) moving the etch target points according to a model of an etch process to produce a set of lithography-target points; and (d) synthesizing a photomask data set based on a model of a lithography process and the set of lithography-target points.
    Type: Grant
    Filed: October 2, 2006
    Date of Patent: October 6, 2009
    Assignee: Cadence Design Systems, Inc.
    Inventors: Franz X. Zach, Jesus Carrero, Bayram Yenikaya, Gokhan Percin, Xuelong Cao, Abdurrahman Sezginer
  • Method of compensating photomask data for the effects of etch and lithography processes
    Publication number: 20070143733
    Abstract: A method for synthesizing a photomask data set from a given target layout, including the following steps: (a) providing a set of target polygons for the target layout; (b) fitting a smooth curve to a target polygon of the set of target polygons, the curve having a set of etch-target points; (c) moving the etch target points according to a model of an etch process to produce a set of lithography-target points; and (d) synthesizing a photomask data set based on a model of a lithography process and the set of lithography-target points.
    Type: Application
    Filed: October 2, 2006
    Publication date: June 21, 2007
    Inventors: Franz Zach, Jesus Carrero, Bayram Yenikaya, Gokhan Percin, Xuelong Cao, Abdurrahman Sezginer
  • Global shape definition method for scatterometry
    Publication number: 20070040852
    Abstract: A method for modeling samples includes the use of control points to define lines profiles and other geometric shapes. Each control point used within a model influences a shape within the model. Typically, the control points are used in a connect-the-dots fashion where a set of dots defines the outline or profile of a shape. The layers within the sample are typically modeled independently of the shape defined using the control points. The overall result is to minimize the number of parameters used to model shapes while maintaining the accuracy of the resulting scatterometry models.
    Type: Application
    Filed: October 4, 2006
    Publication date: February 22, 2007
    Inventors: Jon Opsal, Hanyou Chu, Xuelong Cao, Youxian Wen
  • Global shape definition method for scatterometry
    Patent number: 7145664
    Abstract: A method for modeling samples includes the use of control points to define lines profiles and other geometric shapes. Each control point used within a model influences a shape within the model. Typically, the control points are used in a connect-the-dots fashion where a set of dots defines the outline or profile of a shape. The layers within the sample are typically modeled independently of the shape defined using the control points. The overall result is to minimize the number of parameters used to model shapes while maintaining the accuracy of the resulting scatterometry models.
    Type: Grant
    Filed: February 23, 2004
    Date of Patent: December 5, 2006
    Assignee: Therma-Wave, Inc.
    Inventors: Jon Opsal, Hanyou Chu, Xuelong Cao, Youxian Wen
  • Global shape definition method for scatterometry
    Publication number: 20040210402
    Abstract: A method for modeling samples includes the use of control points to define lines profiles and other geometric shapes. Each control point used within a model influences a shape within the model. Typically, the control points are used in a connect-the-dots fashion where a set of dots defines the outline or profile of a shape. The layers within the sample are typically modeled independently of the shape defined using the control points. The overall result is to minimize the number of parameters used to model shapes while maintaining the accuracy of the resulting scatterometry models.
    Type: Application
    Filed: February 23, 2004
    Publication date: October 21, 2004
    Inventors: Jon Opsal, Hanyou Chu, Xuelong Cao, Youxian Wen