Abstract: A copper-tin brazing wire and a preparation method and use thereof are provided. A copper-tin brazing wire includes a plurality of copper wires each having a composite metal layer on a surface thereof; the copper-tin brazing wire includes, in parts by weight, 75-84 parts of Cu, 20-25 parts of Sn, and 0.4-0.5 parts of P; and the composite metal layer includes Cu, Sn, and P, in which a mass ratio of Cu, Sn, and P is (45-55):(46-56):(0.5-1.5).

Abstract: Embodiments of this application provide a method for transmitting a video picture, a device for sending a video picture, and a video call method and device, where the video picture includes a plurality of video frames. According to the method for transmitting a video picture, the plurality of video frames are encoded to obtain an encoded bitstream, where the bitstream includes at least information indicating inter-frame reference relationships. In this application, each of N frames preceding to a current frame references a forward LTR frame that has a shortest temporal distance to each of the preceding N frames, and the forward LTR frame is an encoded video frame marked by a transmit end device as an LTR frame.

Abstract: A plasma confinement apparatus, and method for confining a plasma are described and which includes, in one form of the invention, a plurality of electrically insulated components which are disposed in predetermined spaced relation, one relative to the others, and surrounding a processing region of a plasma processing apparatus, and wherein a plurality of passageways are defined between the respective insulated components; and at least one electrically conductive and grounded component forms an electrical field shielding for the processing region.

Abstract: A plasma confinement apparatus, and method for confining a plasma are described and which includes, in one form of the invention, a plurality of electrically insulated components which are disposed in predetermined spaced relation, one relative to the others, and surrounding a processing region of a plasma processing apparatus, and wherein a plurality of passageways are defined between the respective insulated components; and at least one electrically conductive and grounded component forms an electrical field shielding for the processing region.

Abstract: A plasma confinement apparatus, and method for confining a plasma are described and which includes, in one form of the invention, a plurality of electrically insulated components which are disposed in predetermined spaced relation, one relative to the others, and surrounding a processing region of a plasma processing apparatus, and wherein a plurality of passageways are defined between the respective insulated components; and at least one electrically conductive and grounded component forms an electrical field shielding for the processing region.

Abstract: A plasma confinement apparatus, and method for confining a plasma are described and which includes, in one form of the invention, a plurality of electrically insulated components which are disposed in predetermined spaced relation, one relative to the others, and surrounding a processing region of a plasma processing apparatus, and wherein a plurality of passageways are defined between the respective insulated components; and at least one electrically conductive and grounded component forms an electrical field shielding for the processing region.