Abstract: Described herein is a polyurethane having an isocyanate group and having C—C double bonds on a side chain, a process for preparing such a polyurethane, and an UV-moisture dual cure polyurethane reactive hotmelt including the polyurethane.

Abstract: Method as well as resulting electrode and capacitor. The method includes the following process steps: •. in a surface of a metal film substrate, etching microstructures with a predetermined roughness, •. depositing in said microstructures a metal or compound layer, •. converting said metal or compounds layer into metal nanoparticles, constituting a catalyst, •. growing cross linked nanotubes in said microstructures at said metal nanoparticle acting as catalysts.

Abstract: An on-chip supercapacitor has an electrode that includes one-dimensional silicon nano structures coated with a first layer of titanium nitride. The on-chip supercapacitor also includes a second layer of manganese dioxide deposited on the first layer. An associated method of providing an on-chip supercapacitor electrode on a silicon substrate includes providing a plurality of one-dimensional silicon nanostructures on a substrate, coating the one-dimensional silicon nanostructures with a first layer of titanium nitride, and coating a second layer of manganese dioxide onto the first layer.

Abstract: An on-chip supercapacitor having an electrode comprising one-dimensional silicon (Si) nanostructures (3) coated with a first layer (10) of titanium nitride (TiN). It further comprises a second layer (20) of manganese dioxide (MnO2) deposited on the first layer. An associated method is also disclosed.

Abstract: An on-chip supercapacitor constituted by a silicon substrate and a porous carbon layer positioned thereon, the carbon layer including pseudocapacitive materials. The invention also relates to the method for producing the supercapacitor and the porous material.

Abstract: A speckle reduction apparatus (300) based on Mie scattering and perturbation drive is disclosed. The speckle reduction apparatus (300) comprises an optical reflective chamber (302) having an incident-light coupling device (301) and an exiting face (303) disposed thereon, and an optical device (308) which faces the incident-light coupling device (301) of the optical reflective chamber (302). The inner walls of the optical reflective chamber (302), except for the wall of light transparent exiting face (303), are mirror surfaces. The optical reflective chamber (302) is fully filled with transparent material (401) having medium particles (402) dispersed therein, which are able to induce Mie scattering of the incident laser. Either or both of the optical reflective chamber (302) and the optical device (308) are provided with a perturbation-sensitive device.

Abstract: Speckle reduction apparatus includes a radiation path and a mask arranged within the radiation path. The mask includes an array of electrically controllable cells configured to form a pattern on the mask that varies with time. The speckle reduction mask includes a first linear array including first parallel lines arranged to change the phase of incident radiation, and a second linear array including second parallel lines arranged to change the phase of incident radiation and further arranged such that cells are formed at the intersections of the first parallel lines and the second parallel lines. The speckle reduction mask includes a N1×N2 array of cells, A, formed according to: ATA=??k,l, where AT is the transpose of A, ? is a real and positive constant, dk,l is Kronecker delta and N1?N2.

Abstract: A method of reducing speckle effects in a projected image which is displayed on a display surface, comprising the steps of splitting an incident beam into one reference beam and one modulation beam; modulating said modulation beam with a modulation unit so as to produce a modulated beam; recombining the modulated beam and the reference beam onto a diffuser; and deflecting the recombined beam so as to project said image onto said display surface.

Abstract: A speckle reduction apparatus (300) based on Mie scattering and perturbation drive is disclosed. The speckle reduction apparatus (300) comprises an optical reflective chamber (302) having an incident-light coupling device (301) and an exiting face (303) disposed thereon, and an optical device (308) which faces the incident-light coupling device (301) of the optical reflective chamber (302). The inner walls of the optical reflective chamber (302), except for the wall of light transparent exiting face (303), are mirror surfaces. The optical reflective chamber (302) is fully filled with transparent material (401) having medium particles (402) dispersed therein, which are able to induce Mie scattering of the incident laser. Either or both of the optical reflective chamber (302) and the optical device (308) are provided with a perturbation-sensitive device.

Abstract: Speckle reduction apparatus includes a radiation path and a mask arranged within the radiation path. The mask includes an array of electrically controllable cells configured to form a pattern on the mask that varies with time. The speckle reduction mask includes a first linear array including first parallel lines arranged to change the phase of incident radiation, and a second linear array including second parallel lines arranged to change the phase of incident radiation and further arranged such that cells are formed at the intersections of the first parallel lines and the second parallel lines. The speckle reduction mask includes a N1×N2 array of cells, A, formed according to: ATA=??k,l, where AT is the transpose of A, ? is a real and positive constant, dk,l is Kronecker delta and N1?N2.