Patents by Inventor Yan Rozenzon
Yan Rozenzon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11728141Abstract: A gas distribution hub for a plasma chamber. The hub has a nozzle including a plurality of inner gas injection passage and a plurality of outer gas injection passages. The first plurality of gas injection passages are angularly spaced-apart arcuate channels at a first radial distance from a center of the hub, and the second plurality of gas injection passages are angularly spaced apart arcuate channels at a different second radial distance from the center of the hub.Type: GrantFiled: February 1, 2022Date of Patent: August 15, 2023Assignee: Applied Materials, Inc.Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
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Publication number: 20220157562Abstract: A gas distribution hub for a plasma chamber. The hub has a nozzle including a plurality of inner gas injection passage and a plurality of outer gas injection passages.Type: ApplicationFiled: February 1, 2022Publication date: May 19, 2022Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
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Patent number: 11251067Abstract: Implementations described herein provide a pedestal lift assembly for a plasma processing chamber and a method for using the same. The pedestal lift assembly has a platen configured to couple a shaft of a pedestal disposed in the plasma processing chamber. An absolute linear encoder is coupled to a fixed frame wherein the absolute linear encoder is configured to detect incremental movement of the platen. A lift rod is attached to the platen. A motor rotor encoder brake module (MRBEM) is coupled to the fixed frame and moveably coupled to the lift rod, the motor encoder brake module configured to move the lift rod in a first direction and a second direction, wherein the movement of the lift rod results in the platen traveling vertically relative to the fixed frame.Type: GrantFiled: April 26, 2019Date of Patent: February 15, 2022Assignee: Applied Materials, Inc.Inventors: Brian T. West, Miroslav Gelo, Yan Rozenzon, Roger M. Johnson, Mark Covington, Soundarrajan Jembulingam, Simon Nicholas Binns, Vivek Vinit
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Patent number: 11244811Abstract: An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.Type: GrantFiled: December 19, 2018Date of Patent: February 8, 2022Assignee: Applied Materials, Inc.Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
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Patent number: 11139150Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.Type: GrantFiled: August 29, 2019Date of Patent: October 5, 2021Assignee: Applied Materials, Inc.Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
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Patent number: 11114285Abstract: Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes at least one cooling plate a device for introducing turbulence to the exhaust flowing within the exhaust cooling apparatus. The device may be a plurality of fins, a cylinder with a curved top portion, or a diffuser with angled blades. The turbulent flow of the exhaust within the exhaust cooling apparatus causes particles to drop out of the exhaust, minimizing particles forming in equipment downstream of the exhaust cooling apparatus.Type: GrantFiled: April 13, 2017Date of Patent: September 7, 2021Assignee: APPLIED MATERIALS, INC.Inventors: Michael S. Cox, Brian T. West, Roger M. Johnson, Yan Rozenzon, Dinkesh Somanna, Dustin W. Ho
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Patent number: 10861681Abstract: Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes a plate and a cooling plate disposed downstream of the plate. During operation, materials collected on the plate react with cleaning radicals to form a gas. The temperature of the plate is higher than the temperature of the cooling plate in order to improve the reaction rate of the reaction of the cleaning radicals and the materials on the plate.Type: GrantFiled: April 24, 2018Date of Patent: December 8, 2020Assignee: Applied Materials, Inc.Inventors: James L'Heureux, Ryan T. Downey, David Muquing Hou, Yan Rozenzon
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Publication number: 20200343126Abstract: Implementations described herein provide a pedestal lift assembly for a plasma processing chamber and a method for using the same. The pedestal lift assembly has a platen configured to couple a shaft of a pedestal disposed in the plasma processing chamber. An absolute linear encoder is coupled to a fixed frame wherein the absolute linear encoder is configured to detect incremental movement of the platen. A lift rod is attached to the platen. A motor rotor encoder brake module (MRBEM) is coupled to the fixed frame and moveably coupled to the lift rod, the motor encoder brake module configured to move the lift rod in a first direction and a second direction, wherein the movement of the lift rod results in the platen traveling vertically relative to the fixed frame.Type: ApplicationFiled: April 26, 2019Publication date: October 29, 2020Inventors: Brian T. WEST, Miroslav GELO, Yan ROZENZON, Roger M. JOHNSON, Mark COVINGTON, Soundarrajan JEMBULINGAM, Simon Nicholas BINNS, Vivek VINIT
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Publication number: 20190385824Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.Type: ApplicationFiled: August 29, 2019Publication date: December 19, 2019Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
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Patent number: 10410841Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.Type: GrantFiled: May 24, 2018Date of Patent: September 10, 2019Assignee: Applied Materials, Inc.Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
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Publication number: 20190122861Abstract: An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.Type: ApplicationFiled: December 19, 2018Publication date: April 25, 2019Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
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Patent number: 10163606Abstract: An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.Type: GrantFiled: February 3, 2014Date of Patent: December 25, 2018Assignee: Applied Materials, Inc.Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
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Publication number: 20180337027Abstract: Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes a plate and a cooling plate disposed downstream of the plate. During operation, materials collected on the plate react with cleaning radicals to form a gas. The temperature of the plate is higher than the temperature of the cooling plate in order to improve the reaction rate of the reaction of the cleaning radicals and the materials on the plate.Type: ApplicationFiled: April 24, 2018Publication date: November 22, 2018Inventors: James L'HEUREUX, Ryan T. DOWNEY, David Muquing HOU, Yan ROZENZON
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Publication number: 20180269038Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.Type: ApplicationFiled: May 24, 2018Publication date: September 20, 2018Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
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Patent number: 10008368Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.Type: GrantFiled: February 3, 2014Date of Patent: June 26, 2018Assignee: Applied Materials, Inc.Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna
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Publication number: 20170301524Abstract: Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes at least one cooling plate a device for introducing turbulence to the exhaust flowing within the exhaust cooling apparatus. The device may be a plurality of fins, a cylinder with a curved top portion, or a diffuser with angled blades. The turbulent flow of the exhaust within the exhaust cooling apparatus causes particles to drop out of the exhaust, minimizing particles forming in equipment downstream of the exhaust cooling apparatus.Type: ApplicationFiled: April 13, 2017Publication date: October 19, 2017Inventors: Michael S. COX, Brian T. WEST, Roger M. JOHNSON, Yan ROZENZON, Dinkesh SOMANNA, Dustin W. HO
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Patent number: 9441295Abstract: One embodiment of the present invention provides a gas-delivery system for delivering reaction gas to a reactor chamber. The gas-delivery system includes a main gas-inlet port for receiving reaction gases and a gas-delivery plate that includes a plurality of gas channels. A gas channel includes a plurality of gas holes for allowing the reaction gases to enter the reactor chamber from the gas channel. The gas-delivery system further includes a plurality of sub-gas lines coupling together the main gas-inlet port and the gas-delivery plate, and a respective sub-gas line is configured to deliver a portion of the received reaction gases to a corresponding gas channel.Type: GrantFiled: November 22, 2010Date of Patent: September 13, 2016Assignee: SolarCity CorporationInventors: Yan Rozenzon, Robert T. Trujillo, Steven C. Beese
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Publication number: 20160133778Abstract: One embodiment of the present invention provides a support system for providing dynamic support to a deposition reactor. The system includes a coupling mechanism configured to provide coupling between the deposition reactor and the support system, an attachment mechanism configured to attach the support system to an external frame, and at least one gas bellows situated between the coupling mechanism and the attachment mechanism.Type: ApplicationFiled: January 15, 2016Publication date: May 12, 2016Applicant: SolarCity CorporationInventors: Robert T. Trujillo, Steven C. Beese, Yan Rozenzon
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Patent number: 9240513Abstract: One embodiment of the present invention provides a support system for providing dynamic support to a deposition reactor. The system includes a coupling mechanism configured to provide coupling between the deposition reactor and the support system, an attachment mechanism configured to attach the support system to an external frame, and at least one gas bellows situated between the coupling mechanism and the attachment mechanism.Type: GrantFiled: April 4, 2011Date of Patent: January 19, 2016Assignee: SolarCity CorporationInventors: Robert T. Trujillo, Steven C. Beese, Yan Rozenzon
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Publication number: 20150371831Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.Type: ApplicationFiled: February 3, 2014Publication date: December 24, 2015Inventors: Yan Rozenzon, Kyle Tantiwong, Imad Yousif, Vladimir Knyazik, Bojenna Keating, Samer Banna